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Selective Reaction Control of CVD Process by a New Discharge Technique

Research Project

Project/Area Number 01460117
Research Category

Grant-in-Aid for General Scientific Research (B)

Allocation TypeSingle-year Grants
Research Field Thermal engineering
Research InstitutionToyohashi University of Technology

Principal Investigator

OKAZAKI Ken  Toyohashi Univ. of Tech., Dept. of Energy Eng., Associate Professor, 工学部, 助教授 (20124729)

Co-Investigator(Kenkyū-buntansha) MIZUNO Akira  Toyohashi Univ. of Tech., Dept. of Electrical and Electronic Eng., Associate Pro, 技術開発センター, 助教授 (20144199)
Project Period (FY) 1989 – 1991
Project Status Completed (Fiscal Year 1991)
Budget Amount *help
¥7,200,000 (Direct Cost: ¥7,200,000)
Fiscal Year 1991: ¥600,000 (Direct Cost: ¥600,000)
Fiscal Year 1990: ¥900,000 (Direct Cost: ¥900,000)
Fiscal Year 1989: ¥5,700,000 (Direct Cost: ¥5,700,000)
KeywordsPlasma CVD / Plasma Chemistry / Methane Plasma / Discharge Structure / Pulse Plasma / Radical Reaction / Reaction Control / プラズマ構造制御 / パルス放電 / ラジカル / 高エネルギ-プラズマ / 発光分光
Research Abstract

An ultra-short and high-voltage pulse discharge plasma has been studied focusing on the control of its structure as a promising technology for the active control of radical reactions in the plasma CVD processing, and the following conclusions have been obtained.
1. Stable and uniform plasmas have been successfully established by the ultra-short and high-voltage pulse discharge plasma at very high applied voltages up to several kilovolts without any plasma non-uniformity on the electrode or substrate surface.
2. The conditions or criteria to sustain the ultra-short pulse plasma have been clarified. The lag time of current rise from that of voltage increases with the decrease of applied voltage and if it reaches the value of pulse width the initiation of plasma becomes impossible.
3. Several peculiar features of the ultra-short and high-voltage pulse plasma have been clarified including voltage-current characteristics at very high power regions, lag times of current rise and effects of pressure and pulse width, and radical emission intensity profiles between anode and cathode.
4. The high-power and ultra-short pulse plasma has a well-defined stratified structure consisting of a luminous zone similar to a well-known positive column near the anode and a dark space near the cathode and this structure can be well controlled only by the parameters of pressure, applied voltage and distance between anode and cathode.
5. Active control of radical reactions and ion energies in the plasma CVD processing could be possible by applying the new technique developed in this study.

Report

(4 results)
  • 1991 Annual Research Report   Final Research Report Summary
  • 1990 Annual Research Report
  • 1989 Annual Research Report
  • Research Products

    (14 results)

All Other

All Publications (14 results)

  • [Publications] A.Mizuno,K.Okazaki,T.Takekoshi,R.Tobe: "Structure of Ultra-Short Pulsed Discharge Plasma" Conf.Rec.IEEE/IAS Annual Conference (Deaborn). 693-697 (1991)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] 竹腰 敬,戸部 了己,佐藤 圭,水野 彰,岡崎 健: "プラズマCVDにおける反応制御へのパルス放電の応用に関する検討" 第27回日本伝熱シンポジウム講演論文集. 184-186 (1990)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] 岡崎 健,竹腰 敬,戸部 了己,水野 彰: "極短パルス放電プラズマの構造とそのCVDプロセスへの応用" 日本機械学会熱工学部門講演論文集. 103-104 (1990)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] 戸部 了己,竹腰 敬,安田 真一,水野 彰,岡崎 健: "プロセシング用高電圧極短DCパルス放電プラズマの特徴と維持条件" 第52回応用物理学会学術講演会(要旨集). 1. 21 (1991)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] 岡崎 健,戸部 了己,安田 真一,水野 彰: "CVD用高電圧極短パルスプラズマ構造の能動的制御" 第29回日本伝熱シンポジウム講演論文集. (1992)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] K.Okazaki,A.Mizuno Y.Yamaguchi: "分担題目:Structure of UltraーShort Pulse Plasma for CVD Processing書名:Heat and Mass Transfer in Materials Processing(ed.I.Tanasawa and N.Lior)" Hemisphere, 690(16) (1991)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] K. Okazaki, A. Mizuno and Y. yamaguchi: "Structure of Ultra-Short Pulse Plasma for CVD Processing" Heat and Mass Transfer in Materials Processing. Hemisphere. 17-32 (1991)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] A. Mizuno, K. Okazaki, T. Takekoshi and R. Tobe: "Structure of Ultra-Short Pulsed Discharge Plasma" Conf. Rec. IEEE/IAS Annual Conference. Deaborn. 693-697 (1991)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] A.Mizuno,K.Okazaki,T.Takakoshi,R.tobe: "Structure of UltraーShort Pulsed Discharge Plasma" Conf.Rec.IEEE/IAS Annual Conference(Deaborn). 693-697 (1991)

    • Related Report
      1991 Annual Research Report
  • [Publications] 戸部 了己,竹腰 敬,安田 真一,水野 彰,岡崎 健: "プロセシング用高電圧極短DCパルス放電ブラズマの特徴と維持条件" 第52回応用物理学会学術講演会(要旨集). 1. 21 (1991)

    • Related Report
      1991 Annual Research Report
  • [Publications] 岡崎 健,戸部 了己,安田 真一,水野 彰: "CVD用高電圧極短パルスプラズマ構造の能動的制御" 第29回日本伝熱シンポジウム講演論文集. (1992)

    • Related Report
      1991 Annual Research Report
  • [Publications] Ken OKAZAKI,Akira MIZUNO,Yukio YAMAGUCHI(ed.I.Tanasawa,N.Lior): "Structure of UltraーShort Pulse Plasma for CVD Processing" Advanced Heat Transfer in Manufacturing and Processing of New Materials. (1991)

    • Related Report
      1990 Annual Research Report
  • [Publications] 岡崎 健,竹腰 敬,戸部 了己,水野 彰: "極短DCパルス放電プラズマの構造とそのCVDプロセスへの適用" 日本機械学会熱工学部門講演会講演論文集. 103-104 (1990)

    • Related Report
      1990 Annual Research Report
  • [Publications] 竹腰敬,戸部了己,佐藤圭,水野彰,岡崎健: "プラズマCVDにおける反応制御へのパルス放電の応用に関する検討" 第27回日本伝熱シンポジウム講演論文集. (1990)

    • Related Report
      1989 Annual Research Report

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Published: 1989-04-01   Modified: 2016-04-21  

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