| Project/Area Number |
01460143
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| Research Category |
Grant-in-Aid for General Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Research Field |
電子材料工学
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| Research Institution | Waseda University |
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Principal Investigator |
OHKI Yoshimichi Waseda Univ., Dept. of E. E., Prof., 理工学部, 教授 (70103611)
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| Co-Investigator(Kenkyū-buntansha) |
NAGASAWA Kaya Shonan Inst. Tech. Dept. of Eng., Associate Prof., 工学部, 助教授 (20180474)
HAMA Yoshimasa Waseda Univ., Sci. Eng. Res. Lab., Prof., 理工学研究所, 教授 (40063680)
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| Project Period (FY) |
1989 – 1990
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| Project Status |
Completed (Fiscal Year 1990)
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| Budget Amount *help |
¥6,100,000 (Direct Cost: ¥6,100,000)
Fiscal Year 1990: ¥1,800,000 (Direct Cost: ¥1,800,000)
Fiscal Year 1989: ¥4,300,000 (Direct Cost: ¥4,300,000)
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| Keywords | Distribution / Defects / Impurities / Ionizing radiation / Ultraviolet light / Manufacturing process / 石英ガラス / 光ファイバ- / レ-リ-散乱 / 構造欠陥 |
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| Research Abstract |
The distribution of defects and impurities in a variety of high-purity silica glass manufactured by different methods are studied. The defects investigated include those found in the as-manufactured glass (oxygen vacancy and peroxy linkage), as well as those induced by ionizing radiation or ultraviolet light (E' center and oxygen hole centers). A significant difference is observed in the distribution between sillca manufactured by different methods. The distribution of defects (oxygen vacancy and peroxy linkage) and impurities (hydroxyl groups and chlorines) in as-manufactured silica glass is determined during the manufacturing process. Furthermore. the defects induced by ionizing radiation or ultraviolet light have a distribution, suggesting that these defects arise primarily from the breaking of pre-existing precursors.
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