• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to previous page

Low Temperature Growth of Semiconductor Sic by Photo-Plasma Double Excitation

Research Project

Project/Area Number 01550016
Research Category

Grant-in-Aid for General Scientific Research (C)

Allocation TypeSingle-year Grants
Research Field Applied materials
Research InstitutionKyoto Institute of Technology

Principal Investigator

NISHINO Shigehiro  Kyoto Institute of Technology, 工芸学部, 助教授 (30089122)

Co-Investigator(Kenkyū-buntansha) MATSUMURA Nobuo  Kyoto Institute of Technology, 工芸学部, 助手 (60107357)
SARAIE Junnji  Kyoto Institute of Technology, 工芸学部, 教授 (90026154)
Project Period (FY) 1989 – 1990
Project Status Completed (Fiscal Year 1990)
Budget Amount *help
¥2,000,000 (Direct Cost: ¥2,000,000)
Fiscal Year 1990: ¥600,000 (Direct Cost: ¥600,000)
Fiscal Year 1989: ¥1,400,000 (Direct Cost: ¥1,400,000)
KeywordsPlsama CVD / Photo-CVD, / LPCVD / Cubic sic / 3C-SiC / Low Temperature Growth / Heteroepitaxy, / Crystal Growth, / 3C-SiC
Research Abstract

3C-SiC films were grown on Si substrates by plasma-assisted chemical vapor deposition (PCVD) and low pressure chemical vapor deposition (LPCVD) at 700-1500^゚C using Si_2H_6 and C_2H_2. Single crystalline SiC films were grown above 900^゚C. Polycrystalline SiCFilms were grown below 900^.C. The growth rate of PCVD was higher than LPCVD below 800^0C. The growth Kinetics was investigated by measuring the growth rate. The decomposition process of source gases was investigated by quadrapole mass spectroscopy (QMS). It was clarified that the radicals produced from Si_2H_6 played an important role below 800^゚C.
The growth rate in PCVD was higher than LPCVD below 800^゚C. In LPCVD, the activation energy was 13 Kcal/mol above 800^゚C, and 31 Kcal/mol below 800^゚C. In PCVD, the activation energy was equal to the value in LPCVD above 800^゚C, and the growth rate was almost constant.
The growth rate was constant, even if C_2H_2 or H_2 flow rate increased in the temperature range of 750-1000^゚C both with and without plasma-assistance. The fact that the growth rate was independent on H_2 flow rate indicates that the limiting process of the growth rate is not the diffusion of chemical species in In LPCVD, the reaction is first order in low temperature region, and second order in high temperature region, which indicates that bi-molecular reaction related to Si_2H_6 occurs in high temperature region.
Single crystalline SiC films were grown on Si (111) substrates above 900^゚C by PCVD and LPCVD. The growth rate in PCVD was higher than LPCVD below 800^゚C. Growth Kinetics was considered from growth rates and QMS.

Report

(3 results)
  • 1990 Annual Research Report   Final Research Report Summary
  • 1989 Annual Research Report
  • Research Products

    (10 results)

All Other

All Publications (10 results)

  • [Publications] 石田 秀俊: "プラズマCVD法による単結晶SiCの低温成長" 第37回応用物理学関係連合講演会講演予稿集 第1分冊,31aーTー8. 1. 314- (1990)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1990 Final Research Report Summary
  • [Publications] 狩野 隆司: "ECRプラズマCVD法による3CーSicの成長" 第37回応用物理学関係連合講演会講演予稿集 第1分冊 31aーTー9. 1. 314- (1990)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1990 Final Research Report Summary
  • [Publications] 石田 秀俊: "Crystal Growth and Surface Reaction of 3CーSiC by Plasmaーassisted Chemical Vapour Deposition" Proceedings of the 8th Symposium on Plasma Processing, Nagoya,Japan. 369-372 (1991)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1990 Final Research Report Summary
  • [Publications] 石田 秀俊: "SiF_4を用いたプラズマCVD法によるSiCの低温成長" 第38回応用物理学関係連合講演会講演予稿集. (1991)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1990 Final Research Report Summary
  • [Publications] 足立 光: "ラジカルCVD法による3CーSiCの成長" 第38回応用物理学関係連合講演会講演予稿集. (1991)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1990 Final Research Report Summary
  • [Publications] 石田 秀俊: "プラズマCVD法による単結晶SiCの低温成長" 第37回応用物理学関係連合講演会 講演予稿集 第1分冊,31aーTー8. 1. 314 (1990)

    • Related Report
      1990 Annual Research Report
  • [Publications] 狩野 隆司: "ECRプラズマCVD法による3CーSiCの成長" 第37回応用物理学関係連合講演会 講演予稿集 第1分冊 31aーTー9. 1. 314 (1990)

    • Related Report
      1990 Annual Research Report
  • [Publications] 石田 秀俊: "Crystal Growth and Surface Reaction of 3CーSiC by plasmaーassisted Chemical Vapour Deposition" Proceedings of the 8th Symposium on Plasma Processing,Nagoya,Japan.369-372 (1991)

    • Related Report
      1990 Annual Research Report
  • [Publications] 石田 秀俊: "SiF_4を用いたプラズマCVD法によるSiCの低温成長" 第38回応用物理学関係連合講演会 講演予稿集. (1991)

    • Related Report
      1990 Annual Research Report
  • [Publications] 足立 光: "ラジカルCVD法による3CーSiCの成長" 第38回応用物理学関係連合講演会 講演予稿集. (1991)

    • Related Report
      1990 Annual Research Report

URL: 

Published: 1989-04-01   Modified: 2016-04-21  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi