| Budget Amount *help |
¥7,000,000 (Direct Cost: ¥7,000,000)
Fiscal Year 1991: ¥600,000 (Direct Cost: ¥600,000)
Fiscal Year 1990: ¥6,400,000 (Direct Cost: ¥6,400,000)
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| Research Abstract |
In the integrated optics, many kinds of functional optical devices as well asoptical wave guides are integrated onto single substrate. The investigators have proposed a novel integration technique named VSSD (Vertical Surface Selective Deposition) method, which can monolithically integrate thin films on a vertical surface of substrate, and have successfully demonstrated a monolithic demultiplexing/detecting integrated device consisting of multilayer filter and photodetector. Howver. the flatness of the bottot surface of substrate after the etching was not smooth enough to integrate an optical wave guide. and the measured demultiplexing characteristics did not coincide with the designed ones. In addition to these, when an RF sputtering apparatus is used to realize the VSSD method, the formed film includes a sharp peculiar angle on the top and the top part of the step on the substrate is deformed by an undesired etching.
In this study, first, we investigated the etching condition to form a step having very smooth bottom surface on a (110) Si substrate. and successfully integrated an optical wave guide in addition to the multilayer filter and photodetector. Next, in order to evaluate the controllability of the VSSD method, a simple two-layer filter was integrated on a vertical surface together with a photodetector and an optical wave guide. We successfully demonstrated the fundamental demultiplexing/detecting function, and evaluated the controllability of the deposition rate of VSSD method from the difference between the designed and measured demultipexing characteristics. Last, we introduced a new ion-beam sputtering apparatus to improve the problems which appears in the VSSD method using an RF sputtering apparatus, and successfully formed a thin film selectively on a vertical surface of substrate.
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