| Project/Area Number |
02555002
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| Research Category |
Grant-in-Aid for Developmental Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Research Field |
Applied materials
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| Research Institution | Tohoku University |
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Principal Investigator |
SAKURAI Toshio Institute for Materials Research,Tohoku University Professor, 金属材料研究所, 教授 (20143539)
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| Co-Investigator(Kenkyū-buntansha) |
HAYASHI Chikara ULVAC Inc. President, 会長
HONO Kazuhiro Institute for Materials Research,Tohoku University Research Assoc., 金属材料研究所, 助手 (60229151)
HASHIZUME Tomihiro Institute for Materials Research,Tohoku University Assoc.Prof., 金属材料研究所, 助教授 (70198662)
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| Project Period (FY) |
1990 – 1991
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| Project Status |
Completed (Fiscal Year 1991)
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| Budget Amount *help |
¥16,000,000 (Direct Cost: ¥16,000,000)
Fiscal Year 1991: ¥3,600,000 (Direct Cost: ¥3,600,000)
Fiscal Year 1990: ¥12,400,000 (Direct Cost: ¥12,400,000)
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| Keywords | atom probe / FIM / APFIM / field ion microscopy / 針状試料 / アトム・プロ-ブ / FIM |
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| Research Abstract |
In order to apply the atom probe technique to the nanoscale analysis of atypical specimens such as thin film specimen and non-metallic materials, FIM tip preparation methods were developed. By a combination of photolithography and micro-electropolishing, we have established a routine method for preparing FIM tips from metallic thin films. At the same time, we have developed an ion milling aperatus, which can sharpen non-metallic wires to sharp FIM tips. By these methods, wide variety of specimens such as magnetic thin films, grain boundaries were successfully analyzed by the atom probe technique. The evaluation of the ion milling method for preparing semiconductor tips is now in progress.
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