| Project/Area Number |
02555024
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| Research Category |
Grant-in-Aid for Developmental Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Research Field |
機械工作
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| Research Institution | Univ. of Tokyo |
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Principal Investigator |
TANI Yasuhiro University of Tokyo, Institute of Industrial Science Associate Professor, 生産技術研究所, 助教授 (80143527)
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| Co-Investigator(Kenkyū-buntansha) |
IKENO Junichi University of Tokyo, Institute of Industrial Science Research Associate, 生産技術研究所, 助手 (10184441)
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| Project Period (FY) |
1990 – 1991
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| Project Status |
Completed (Fiscal Year 1991)
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| Budget Amount *help |
¥8,700,000 (Direct Cost: ¥8,700,000)
Fiscal Year 1991: ¥3,700,000 (Direct Cost: ¥3,700,000)
Fiscal Year 1990: ¥5,000,000 (Direct Cost: ¥5,000,000)
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| Keywords | Ultrafine Abrasives / Abrasive Cutoff / Electrophoretic Deposition / Chipping / Brittle Materials / Grinding / Colloidal Silica / ダイシング / スライシング / 電着現象 / コロイダルシリカ / 外周刃 |
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| Research Abstract |
It Is very Important to decrease the amount of chipping in the dicing process of brittle materials for the reduction of material loss and the improvement of surface Integrity In the production of optical and electrical components. The use of ultrafine abrasives reduces the grain depth of cut. which results In the minimization of subsurface damage. Thus, a new dicing technology has been developed by applying electrophoretic deposition of ultrafine abrasives. During the process. the abrasives cohered around the thin conductive blade used as the anode in an electric field and polished the side surfaces of grooves. Consequently, chipping-free dicing was accomplished and an optically smooth surface was obtained on the side surfaces of the groove.
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