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Crystal Growth of cBN and Diamond by a Plasma CVD Method

Research Project

Project/Area Number 02555148
Research Category

Grant-in-Aid for Developmental Scientific Research (B)

Allocation TypeSingle-year Grants
Research Field 金属材料(含表面処理・腐食防食)
Research InstitutionNagaoka University of Technology

Principal Investigator

ICHNOSE Yukio  Nagaoka University of Technology, Department of Electrical Engineering, Professor, 工学部, 教授 (00115099)

Co-Investigator(Kenkyū-buntansha) 佐藤 純一  昭和電工(株), セラミックス事業部, 部長
ISHIGURO Takashi  Nagaoka University of Technology, Department of Electrical Engineering, Associat, 工学部, 助教授 (10183162)
SATOH Junich  Showa Denkou Co., Ltd., Ceramic Section, Head of Ceramic Section
Project Period (FY) 1990 – 1991
Project Status Completed (Fiscal Year 1991)
Budget Amount *help
¥6,300,000 (Direct Cost: ¥6,300,000)
Fiscal Year 1991: ¥1,400,000 (Direct Cost: ¥1,400,000)
Fiscal Year 1990: ¥4,900,000 (Direct Cost: ¥4,900,000)
KeywordscBN / Diamond / Plasma CVD / Single Crystal / プラズマCVD法 / 気相合成
Research Abstract

Present research has been performed with the aim of forming large single crystals of diamond or especially cubic boron nitride (cBN) by means of the plasma CVD method. It was thought to be important to choose materials for substrate to make epitaxial crystal growth. When an ordinary silicon substrate was used, only polycrystal film could be obtained. Compared with this, on the silicon substrate scratched by diamond, the production rate of cBN was improved because of remaining of diamond fine seed crystals. For the next step, cBN or diamond with a mu m size were used as seed crystals, however, the deposited matter was polycrystallized due to the plasma irradiation. To avoid the degradation in cBN or diamond, a hot-filament CVD method, in which excitation level of raw material was lower than that of rf plasma CVD method, was adopted. In this method, the required conditions in formation of cBN, i. e., thermal stability of cBN and preferential etching effect, were confirmed, but the deposition of hexagonal BN was too fast to confirm cBN synthesis. As a final result, the methodological contradiction in a plasma CVD method to form large single crystals was cleared.

Report

(3 results)
  • 1991 Annual Research Report   Final Research Report Summary
  • 1990 Annual Research Report
  • Research Products

    (22 results)

All Other

All Publications (22 results)

  • [Publications] Y.Ichinose,H.Saitoh and Y.Hirotsu: "Synthesis of Cubic BN from the Gas phase by a New Plasma Chemical Vapour Deposition Method Using R.F.Waves and a Tungsten Filament" Surface and Coatings Technology. 43/44. 116-127 (1990)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] 石黒 孝,斉藤 秀俊,広瀬 健,大塚 智雄,一ノ瀬 幸雄: "立方晶窒化硼素の気相合成" プレ-ティングとコ-ティング. 10. 133-139 (1990)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] 斉藤 秀俊,弘津 禎彦,一ノ瀬 幸雄: "BNの形成におよぼす原子状水素の影響" 日本金属学会誌. 54. 562-567 (1990)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] S.Enomoto,T.Hirose,H.Saitoh and Y.Ichinose: "Synthesis of Cubic Boron Nitride by Crucible-Type CVD Apparatus" Proc.Intl.Carbon Conference. 600-601 (1990)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] T.Otsuka,A.Simamoto,H.Saitoh and Y.Ichinose: "Effect of Scratched Substrate on Synthesis of cBN by Plasma CVD" Proc.Intl.Carbon Conference. 608-609 (1990)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] 斉藤 秀俊,弘津 禎彦,一ノ瀬 幸雄: "熱活性型RFプラズマCVD法によるBN膜の生成条件" 日本金属学会誌. 54. 186-192 (1990)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] M.Sakakihara and Y.Ichinose: "Residual Stress of Amorphous B-N-C Films Produced by Low-Pressure CVD" Proc.3rd Intl,Symposium on Trends and New Applications in ThinFilms. 233-235 (1991)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] 榊原 正彦,一ノ瀬 幸雄: "減圧CVD法により成膜したアモルファスBーNーCの残留応力および光透過率の評価" 日本金属学会誌. 55. 1249-1255 (1991)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] Y. Ichinose, H. Saitoh and Y. Hirotsu: "Synthesis of Cubic BN from the Gas Phase by a New Plasma Chemical Vapor Deposition Method Using R. F. Waves and a Tungsten Filament" Surface and Coatings Technology. 43/44. 116-127 (1990)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] T. Ishiguro, H. Saitoh, T. Hirose, T. Otsuka and Y. Ichinose: "Synthesis of Cubic BN Films by the RF Plasma CVD with Thermal Activation" Pureitingu to Kotingu. 10. 133-139 (1990)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] H. Saitoh, Y. Hirotsu and Y. Ichinose: "Influence of Atomic Hydrogen on the Formation of Boron Nitride Film" J. Japan Inst. Metals. 54. 562-567 (1990)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] S. Enomoto, T. Hirose, H. Saitoh and Y. Ichinose: "Synthesis of Cubic Boron Nitride by Crucible-Type CVD Apparatus" Proc. Intl. Carbon Conference. 600-601 (1990)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] T. Otsuka, A. Shimamoto, H. Saitoh and Y. Ichinose: "Effect of Scratched Substrate on Synthesis of cBN by Plasma CVD" Proc. Intl. Carbon Conference. 608-609 (1990)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] H. Saitoh, Y. Hirotsu and Y. Ichinose: "Conditions for Formation of BN Films by Thermally Assisted RF Plasma CVD" J. Japan Inst. Metals. 54. 186-192 (1990)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] M. Sakakihara and Y. Ichinose: "Residual Stress of Amorphous B-N-C Films Produced by Low-Pressure CVD" Proc. 3rd Intl. Symposium on Trends New Applications in Thin Films. 233-235 (1991)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] M. Sakakihara and Y. Ichinose: "Evaluation of Residual Stress and Optical Transmittance for Amorphous B-N-C Films Prepared by Low Pressure Chemical Vapor Deposition" J. Japan Inst. Metals. 55. 1249-1255 (1991)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] M.Sakakihara and Y.Ichinose: "Residual Stress of Amorphous B-N-C Films Produced by Low-Pressure CVD" Proc. 3rd Intl, Symposium on Trends and New Applications in ThinFilms. 233-235 (1991)

    • Related Report
      1991 Annual Research Report
  • [Publications] 榊原 正彦,一ノ瀬 幸雄: "減圧CVD法により成膜したアモルファスB-N-Cの残留応力および光透過率の評価" 日本金属学会誌. 55. 1249-1255 (1991)

    • Related Report
      1991 Annual Research Report
  • [Publications] 斉藤 秀俊、弘津 禎彦、一ノ瀬、幸雄、: "熱活性型RFプラズマCVD法によるBN膜の生成条件" 日本金属学会誌. 54. 186-192 (1990)

    • Related Report
      1990 Annual Research Report
  • [Publications] 斉藤 秀俊、弘津 禎彦、一ノ瀬、幸雄、: "BN膜の形成におよぼす原子状水素の影響" 日本金属学会誌. 54. 562-567 (1990)

    • Related Report
      1990 Annual Research Report
  • [Publications] Y.Ichinose,H.Saitho and Y.Hirotsu: "Synthesis of Cubic BN from the Gas Phase by a New Plasma Chemical Vapour Deposition Method Using R.F.Waves and a Tungsten Filament." Surface and Coatings Technology. 43/44. 116-127 (1990)

    • Related Report
      1990 Annual Research Report
  • [Publications] 石黒 孝、斉藤 秀俊、広瀬 健、大塚 智雄、一ノ瀬 幸雄、: "立方晶窒化硼素の気相合成" プレ-ティングとコ-ティング. 10. 133-139 (1990)

    • Related Report
      1990 Annual Research Report

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Published: 1990-04-01   Modified: 2016-04-21  

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