| Project/Area Number |
02640339
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| Research Category |
Grant-in-Aid for General Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Research Field |
物理化学一般
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| Research Institution | Toyohashi University of Technology |
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Principal Investigator |
NAMIKI Akira Toyohashi University of Technology Department of Engineering (Associate Professor), 工学部, 助教授 (40126941)
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| Project Period (FY) |
1990 – 1991
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| Project Status |
Completed (Fiscal Year 1991)
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| Budget Amount *help |
¥2,100,000 (Direct Cost: ¥2,100,000)
Fiscal Year 1991: ¥300,000 (Direct Cost: ¥300,000)
Fiscal Year 1990: ¥1,800,000 (Direct Cost: ¥1,800,000)
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| Keywords | REMPI / Electron Transfer / Alkali-Promotion / Molecular Beam / 電子移動 / 超音速分子線 / REMPI / K被覆表面 / 表面電子移動 |
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| Research Abstract |
Alkali-metal (K and Cs adatoms) promotion of NO sticking on Si (100) has been studied using a molecular beam method combined with AES and REMPI detection. The observed sticking probability S shows a good correlation with rheta_<alkali>, indicating that the alkali promotion is local in nature. The decay of S as a function of NO dose as observed with AES shows an anti-correlation with the evolution of the direct-inelastic scattering intensity as obtained with REMPI. This fact is understood as follows : since the direct-inelastic scattering occurs mostly in a single collision process with the surface, local alkali promotion is realized in a single collision of the incident NO molecule with the alkali-metal adsorbates. The decay of S as a function of NO dose is then simulated by introducing a reaction cross section. The evaluated reaction radii are almost eaual to but somewhat larger than the covalent radius of a K atom, with a increasing trend with rheta_K. The alkali promotion is explained in terms of electron charge transfer from the non-ionized alkali adatoms to the affinity level of NO molecules based on the adatom density of state around E_F.
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