| Project/Area Number |
03452094
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| Research Category |
Grant-in-Aid for General Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Research Field |
応用物理学一般(含航海学)
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| Research Institution | KYUSHU UNIVERSITY |
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Principal Investigator |
WATANABE Yukio KYUSHU UNIVERSITY,FACULTY OF ENGINEERING,PROFESSOR, 工学部, 教授 (80037902)
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| Co-Investigator(Kenkyū-buntansha) |
FUKUZAWA Tsuyoshi KYUSHU UNIVERSITY,FACULTY OF ENGINEERING,ASSISTANT PROFESSOR, 工学部, 助手 (70243904)
SHIRATANI Masaharu KYUSHU UNIVERSITY,FACULTY OF ENGINEERING,ASSOCIATE PROFESSOR, 工学部, 助教授 (90206293)
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| Project Period (FY) |
1991 – 1992
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| Project Status |
Completed (Fiscal Year 1992)
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| Budget Amount *help |
¥6,700,000 (Direct Cost: ¥6,700,000)
Fiscal Year 1992: ¥3,100,000 (Direct Cost: ¥3,100,000)
Fiscal Year 1991: ¥3,600,000 (Direct Cost: ¥3,600,000)
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| Keywords | SILANE PLASMA / PARTICULATE / POWDER / PARTICLE / AMORPHOUS SILICON / RF DISCHARGE / DUSTY PLASMA / LASER SCATTERING METHOD / 水素化アモルファシスシリコン / 散乱比法 / ダスト / ミ-散乱 / rf放電 / ラジカル / 負イオン |
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| Research Abstract |
Growing process and behavior of particulates in a silane plasma are experimentally studied using a new method combined an rf discharge modulation technique with two laser light scattering techniques. The obtained results are summarized as follows: particulates tend to be sustained around plasma/sheath boundaries near electrodes, especially the rf electrode; larger particulates exist in a lower space potential region near the rf electrode; particulate size and density amount to 60-180 nm and 10^8-10^9 cm^<-3> in 1-2 s after the rf-power-on. The particulate growth rate, being very high compared to a film deposition rate, can be explained by taking into account the contribution of positive-ion and/or radical fluxes. The particulate-trapping around the boundary can be explained by balance between electrostatic force and ion drag force exerting on a particulate. An effect of viscous force on a particulate and a particulate suppression mechanism for rf modulated discharges are also revealed.
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