| Project/Area Number |
03452153
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| Research Category |
Grant-in-Aid for General Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Research Field |
電子材料工学
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| Research Institution | Toyama university |
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Principal Investigator |
TAKAHASHI Takakazu Toyama university, Research Associate, 工学部, 助手 (80019223)
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| Co-Investigator(Kenkyū-buntansha) |
HIRATA Toyoaki Osaka Vacuum Company, Manager, 開発本部, 開発課長代理
IKEDA Nagayasu Toyama university, Professor, 工学部, 教授 (10222895)
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| Project Period (FY) |
1991 – 1992
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| Project Status |
Completed (Fiscal Year 1992)
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| Budget Amount *help |
¥5,800,000 (Direct Cost: ¥5,800,000)
Fiscal Year 1992: ¥2,000,000 (Direct Cost: ¥2,000,000)
Fiscal Year 1991: ¥3,800,000 (Direct Cost: ¥3,800,000)
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| Keywords | Magnetic materials / Thin films / Magnetic recording / Recording media / Sputtering apparatus / Toroidal plasma / Plasma-free / Neutral particles / プラズマフリ- |
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| Research Abstract |
In the toroidal plasma (TP) sputtering method, the behavior of the high energy particles produced in the highly ionized plasma has been investigated in detail. The dependence of the structure and properties of NdFeB composite films on these high energy particles has been studied. The effectiveness of the NdFeB films as the novel magnetic recording media has also been discussed.
Sputtering was performed by using a Fe planar ring target of iron with a purity of 99.9 %. Ar gas was used as a sputtering gas. In the case of the permanent magnet attached behind the target, the applied voltage was lower to 350 V at low Ar gas pressure.
NdFeB films have been deposited at high rate of 0.19 mum/min and low substrate temperature of 60ﾟC. The target utilization efficiency in surface was about 90 %.
The time-of-flight method has been used to investigate the kind and kinetic energy of neutral particles ejected from the NdFeB planar ring target. It has been found from the time- of-flight spectra that the photons emitted from the plasma was only observed. This suggests that in TP sputtering method, the neutral particles with high energy were not bombarded to the substrates and have not direct affects on the structure and properties of as-deposited films.
The NdFeB films have both crystal and amorphous structures dependent of film composition. The direction of the easy magnetization is normal to the film plane. The saturation magnetization and the coercivity were about 1000 emu/cc and 1.5 kOe, respectively. This film may be very useful for using the perpendicular magnetic recording media.
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