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Dynamical study of surface photochemistry by VUV radiation

Research Project

Project/Area Number 03453024
Research Category

Grant-in-Aid for General Scientific Research (B)

Allocation TypeSingle-year Grants
Research Field 構造化学
Research InstitutionNational Laboratory for High Energy Physics

Principal Investigator

TANAKA Kenichiro  National Laboratory for High Energy Physics, Photon Factory, Associate Professor, 放射光実験施設, 助教授 (90106162)

Co-Investigator(Kenkyū-buntansha) UENO Nobuo  Chiba University, Department of Materials Science, Associate Professor, 工学部, 助教授 (40111413)
KITAJIMA Yoshinori  National Laboratory for High Energy Physics, Photon Factory, Research Associate, 放射光実験施設, 助手 (00204892)
Project Period (FY) 1991 – 1992
Project Status Completed (Fiscal Year 1992)
Budget Amount *help
¥1,000,000 (Direct Cost: ¥1,000,000)
Fiscal Year 1992: ¥1,000,000 (Direct Cost: ¥1,000,000)
KeywordsSynchrotron Radiation / Surface Photochemistry / Core excitation / Ion Desorption / Site Specific Reaction / 軟X線 / イオン分光 / 紫外光 / 反応動力学
Research Abstract

Photochemical reaction of the adsorbate molecules on the solid surface in a soft x-ray region is important for fundamental study of elementary chemical reactions as well as for application study of photochemical vapor deposition, etching catalysis and so on. Among these reactions, photon stimulated desorption (PSD) is a relatively simple reaction to investigate both theoretically and experimentally. From this point of view, in this project we have designed and constructed a new experimental apparatus involving an TOF ion specrtomater, Auger electron analyser and a mass spectrometer to elucidate the full mechanism of a soft x-ray photochemical reactions of the adsorbed molecules on the surfaces. Using this apparatus, we have succeeded in detecting both Auger electrons and ionic products of photon stimulated desorption in both H_2O/Si(100) and PMMA/Au/Si(100) systems. The results are summarized as follows.
(1) H^+ and O^+ ions were observed in the photon stimulated ion desorption (PSID) f … More rom H_2O/Si(100) system in the range 500-700 eV. PSID yields of these ions indicate characteristic behavior near O K-edge; H^+ exhibits sharp rise at 530 eV and two broad maxima below and above O K-edge, O^+ exhibits a delayed threshold at 570 eV. These results have been discussed with the formation of multiple charged ions followed by reneutralization of the excess of charge with strong interaction with the surface.
(2) Various ions involving the monomer ion were observed in PSD from PMMA/Au/Si(100) systems. Excitations of carbon 1s electron to pi^* and sigma^* resonance states at 287.9 eV show remarkable enhancement of CH^+ and CH_2^+ ions. In oxygen K-edge region, increase in COOCH_3^+ was not observed where as that in HCI^+ was observed. Some of fragment ions have been observed to occur specifically around the site of the atom where the core electron excitation takes place. Based on these observations, one might consider the use of tunable soft x-ray to stimulate chemical reactions or to selectively break large organic molecules, as one pleases. Less

Report

(3 results)
  • 1992 Annual Research Report   Final Research Report Summary
  • 1991 Annual Research Report
  • Research Products

    (28 results)

All Other

All Publications (28 results)

  • [Publications] N.Ueno: "Valence bands of PMMA and photo ion emission in VUV region." J.Appl.Phys.72. 5423-5428 (1992)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1992 Final Research Report Summary
  • [Publications] T.Goto: "An area selective and anisotropic etching of Si by synchrotrn radiatin exaitation:Effects of introducing O_2 molecules." Jpn.J.Appl.Phys.31. 4449-4453 (1992)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1992 Final Research Report Summary
  • [Publications] K.Kameta: "Photoabsorptior,photoinization,and neutral dissociation cross sections of dimethyl ether and ethyl methyl ether in the extreme-ultraviolot range." J.Chem.Phys.96. 4911-4917 (1992)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1992 Final Research Report Summary
  • [Publications] 田中 健一郎: "内殻電子励起による光刺激イオン脱離過程" 表面科学. 14. 153-158 (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1992 Final Research Report Summary
  • [Publications] N.Ueno: "Site specific photochemical reaction of PMMA by core electron excitation." Jpn,J.Appl.Phys.(Suppl). 32-2. 229-231 (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1992 Final Research Report Summary
  • [Publications] H.Ikeura: "The mechanism of Ion desorption from H_2O/Si(100) by O Is electiron excitation." Jpn.J.Appl.Phys.(Suppl.). 32-2. 246-248 (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1992 Final Research Report Summary
  • [Publications] K.Tanaka: "AIP Conference Proceedings No.258 Synchrotron Radiation and Dynamic Phenomena" Amer.Inst.Phys., 691 (1992)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1992 Final Research Report Summary
  • [Publications] N. Ueno, Y. Kobayashi, T. Sekiguchi, H. Ikeura, K. Sugita, K. Honma, K. Tanaka, E. Orti and R. Viruela: "Valence bands of PMMA and photoion emission in VUV region." J. Appl. Phys.72-11. 5423-5428 (1992)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1992 Final Research Report Summary
  • [Publications] T. Goto, O. Kitamura, S. Terakado, S. Suzuki and K. Tanaka: "An area selective and anisotropic etching of Si by synchrotron radiationexcitation: Effects of introducing O_2 molecules." Jpn. J. Appl.Phys.31-12B. 4449-4453 (1992)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1992 Final Research Report Summary
  • [Publications] K. Tanaka, H. Ikeura, N. Ueno, Y. Kobayashi, K. Obi, T. Sekiguchi, and K. Honma: "Ion desorption from Si(100)-H_2O/D_2O by core-electron excitation." AIP Conf. Proceed. (Amer. Inst. Phys.). No.258. 332-340 (1992)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1992 Final Research Report Summary
  • [Publications] N. Ueno, M. Komada, Y. Morimoto, M. C. K. Tinone, M. Kushida, K. Sugita,K. Honma and K. Tanaka: "Site specific photochemical reaction of PMMA by core electron excitation." Jpn. J. Appl. Phys. (Suppl.). 32-2. 229-231 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1992 Final Research Report Summary
  • [Publications] H. Ikeura, T. Sekiguchi, K. Tanaka, K. Obi, N. Ueno and K. Honma: "The mechanism of ion desorption from H_2O/Si(100) by O 1s electron excitation." Jpn. J. Appl. Phys. (Suppl.). 32-2. 246-248 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1992 Final Research Report Summary
  • [Publications] K. Tanaka: "Photon stimulated ion desorption by core electron excitation. (in Japanese)" Hoymen Kagaku. 14-3. 153-158 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1992 Final Research Report Summary
  • [Publications] N.Ueno: "Valence bands of PMMA and photoion emission in VUV region." J. Appl. Phys.72. 5423-5428 (1992)

    • Related Report
      1992 Annual Research Report
  • [Publications] T. Goto: "An area selective and anisotropic etching of Si by Synchrotron radiation excitation:Effects of introducing O_2 molecules." Jpn. J. Appl. Phys.31. 4449-4453 (1992)

    • Related Report
      1992 Annual Research Report
  • [Publications] K.Kameta: "Photoabsorption,photoionization,and neutral dissociation cross sections of dimethylether and ethyl methyl ether in the extreme-ultraviolot range." J. Chem. Phys.96. 4911-4917 (1992)

    • Related Report
      1992 Annual Research Report
  • [Publications] 田中 健一郎: "内殻電子励起による光刺激イオン脱離過程" 表面科学. 14. 153-158 (1993)

    • Related Report
      1992 Annual Research Report
  • [Publications] N.Ueno: "Site specific photochemical reaction of PMMA by core electron excitation." Jpn. J. Appl. Phys. 32-2. 229-231 (1993)

    • Related Report
      1992 Annual Research Report
  • [Publications] H.Ikeura: "The mechanism of Ion desorption from H_2O/Si(100) by O is electron excitation." Jpn. J. Appl.Phys.32-2. 246-249 (1993)

    • Related Report
      1992 Annual Research Report
  • [Publications] K.Tanaka: "AIP Conference Proceedings NO.258 Synchrotron Radiation and Dynamic Phenomena" Amer. Inst. Phys., 691 (1992)

    • Related Report
      1992 Annual Research Report
  • [Publications] S.Terakado: "Photochemical etching of GaAs using synchrotron radiation" Jpn.J.Appl Phys.29. L709-711 (1990)

    • Related Report
      1991 Annual Research Report
  • [Publications] 田中 健一郎: "放射光パルス利用実験" 放射光(日本放射光学会誌). 4. 29-35 (1991)

    • Related Report
      1991 Annual Research Report
  • [Publications] K.Kameta: "Absolute measurements of photo absprption cross sections,photo ionization cross sections,and photo ionization quantumyields of silane in the 13-40 ev region." J.Chem,Phys.95. 1456-1460 (1991)

    • Related Report
      1991 Annual Research Report
  • [Publications] M.Ukai: "Ionizing and non-ionizing decays of superexcited acetylene molecules in the extreme-ultraviolet region." J.Chem.Phys.95. 4142-4153 (1991)

    • Related Report
      1991 Annual Research Report
  • [Publications] K.Kameta: "Absolute measurements of photo absorption and photo ionization cross sections of disilane in the 13-40 ev region." J.Chem.Phys.95. 6188-6189 (1991)

    • Related Report
      1991 Annual Research Report
  • [Publications] M.Ukai: "Optical threshold excitation functions of Xe 5s,5p photo ionization satellites near the 5s^<-1> Cooper minimum." Phys.Rev.A. 45. R15-R18 (1991)

    • Related Report
      1991 Annual Research Report
  • [Publications] I.Koyano(共著分担執筆): "Stateーselected and stateーtoーstate IonーMolecule Reaction Dynamics Part1:Experimental" John Wiley & Sons,Inc., 686 (1992)

    • Related Report
      1991 Annual Research Report
  • [Publications] K.Tanaka: "Synchrotron Radiation and Dynamic Phenomena" Amer.Inst.Phys., (1992)

    • Related Report
      1991 Annual Research Report

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Published: 1992-04-01   Modified: 2016-04-21  

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