| Project/Area Number |
03650263
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| Research Category |
Grant-in-Aid for General Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Research Field |
電子材料工学
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| Research Institution | Tokyo Institute of Polytechnics |
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Principal Investigator |
AOKI Takeshi Tokyo Inst.of Polytech., Dept.of Elec.Eng.Prof., 工学部, 教授 (10023186)
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| Co-Investigator(Kenkyū-buntansha) |
NISHIKAWA Yasuo Tokyo Inst.of Polytech., Dept.of Elec.Eng.Assist, 工学部, 助手 (90228172)
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| Project Period (FY) |
1991 – 1992
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| Project Status |
Completed (Fiscal Year 1992)
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| Budget Amount *help |
¥1,800,000 (Direct Cost: ¥1,800,000)
Fiscal Year 1992: ¥900,000 (Direct Cost: ¥900,000)
Fiscal Year 1991: ¥900,000 (Direct Cost: ¥900,000)
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| Keywords | Hydrogenated amorphous Ge (a-Ge : H) / ECR PCVD / Optoelectronic properties / Atomic hydrogen irradiation / Electron irradiation / Ion irradiation / Hydrogen etching / Amorphous-microcrystalline transition / 水素化アモルファスゲルマニウム / イオン・電子照射 / 微結晶化 / 基板温度 / 水素希釈度 / 非晶質ゲルマニウム / 太陽電池 / 光電感度 / CPM / 局在準位密度 / フォトルミネッセンス |
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| Research Abstract |
During 1991-1992 academic years, the following results are obtained from the research on deposition of high-qualty a-Ge : H by ECR plasma.
1.Irradiation of atomic hydrogen together with adequate ion flux on growth surface in ECR PCVD with a low flow rate of germane improves optoelectronic properties of a-Ge : H.Any increase in atomic hydrogen irradiation does not cause microcrystallization of the films. The effect is attributable to hydrogen etching from decrease in growth rate.
2. Electron-irradiation onto the growth of films promotes an amorphous to microcrystalline phase transition. The transition is enhanced by electron-induced Ge etching. A moderate electron-irradiation together with ion-irradiation significantly improves optoelectronic properties of a-Ge : H films.
3. Microcrystallization in the three different conditions of silane PCVD ; high gydrogen-dilution, high power and positively biasing is also observed in ECR PCVD of a-Ge : H and attributed to the electron-induced microcrystallization.
4.Film quality of a-Ge : H produced by ECR PCVD depends on FWHM of frequency spectrum of microwave power source. A decrease in the FWHM by 1/30 increases optoelectronic properties by two and also improves photoluminesence properties.
5.CPM characterization developed for a-Ge : H films gives defects density of order of 10^<16>/cm^3 in a-Ge : H, being comparable to that of device-quality a-Si : H.
6.Further investigation should be made to clarify the presence of Staebler-Wronski effect in these high-quality a-Ge : H films.
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