| Project/Area Number |
03670271
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| Research Category |
Grant-in-Aid for General Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Research Field |
Hygiene
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| Research Institution | Keio University |
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Principal Investigator |
OMAE Kazuyuki Keio University, School of Medicine, Associate Professor, 医学部, 助教授 (60118924)
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| Co-Investigator(Kenkyū-buntansha) |
NAKASHIMA Hiroshi Keio University, School of Medicine, Instructor, 医学部, 助手 (80217710)
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| Project Period (FY) |
1991 – 1992
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| Project Status |
Completed (Fiscal Year 1992)
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| Budget Amount *help |
¥2,000,000 (Direct Cost: ¥2,000,000)
Fiscal Year 1992: ¥300,000 (Direct Cost: ¥300,000)
Fiscal Year 1991: ¥1,700,000 (Direct Cost: ¥1,700,000)
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| Keywords | compound semiconductor / gallium arsenide / cross-sectional study / exposure / health effect / biological monitoring / 半導体 / ガリウム砒素 |
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| Research Abstract |
1. Exposure assessment by working environment and personal exposure sampling : In a gallium arsenide wafers manufacturing plant, arsenic and gallium concentrations of area and personal samples were measured. Processes were Liquid Encapsulated Czochralski (LEC), ingot slicing, wafer lapping, wafer polishing, and Metal Organic Vapor Phase Epitaxy. Arsenic/gallium concentrations in most processes were extremely low. However, exposure levels to elemental arsenic of the LEC cleaning workers were relatively high. The ingot slicing workers could be exposed to high concentrations of gallium arsenide.
2. Exposure assessment by biological monitoring : Biological monitoring of arsenic exposure in gallium arsenide wafer manufacturers was performed by chemical species determination of arsenic in urine and hair. It was suggested that urinary inorganic arsenic concentrations of the ingot slicing workers elevated.
3. Health surveillance : Hematological, biochemical and immunological tests and determination of urinary porphyrin metabolites (coproporphyrins) were performed to assess the health status of the workers. There were no exposure-related change.
4. Conclusion : The LEC cleaning and the ingot slicing processes were relatively high exposure levels to elemental arsenic and gallium arsenide. However, the health status of the workers could keep good if the proper control technology was used.
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