High power high frequency window for reactive plasma.

Research Project

Project/Area Number	03680018
Research Category	Grant-in-Aid for General Scientific Research (C)
Allocation Type	Single-year Grants
Research Field	プラズマ理工学
Research Institution	Toyo University
Principal Investigator	SAKAMOTO.YUICHI Fac. Engin. Toyo Univ., 工学部, 教授 (70167427)
Co-Investigator(Kenkyū-buntansha)	KOKAI H. Fac. Engin. Toyo Univ., 工学部, 助教授 (80058099)
Project Period (FY)	1991 – 1992
Project Status	Completed (Fiscal Year 1992)
Budget Amount *help	¥1,700,000 (Direct Cost: ¥1,700,000) Fiscal Year 1992: ¥400,000 (Direct Cost: ¥400,000) Fiscal Year 1991: ¥1,300,000 (Direct Cost: ¥1,300,000)
Keywords	Microwave window / Reactive plasma / Chemical stability / 真空シール密 / 高電力高周波窓 / 耐腐蝕性窓
Research Abstract	By covering the surface of coaxial microwave tube windows (50 KW cw ) with Cr_2O_3 or TiN thin film, we succeeded to have windows which are chemically very stable against reactive plasma. The original window is made of oxygen free copper and alumina. The thin films are deposited as follows : (1) the Cr_2O_3 film is deposited by using the magnetron sputtering of chromium under an Ar-O_2 mixture plasma and (2) the TiN film is deposited by means of RF ion plating. The test of the stability of the window is done as follows : 1) we measure the VSWR and the transmission loss in 2.45 GHz range, 2) irradiate the window by oxygen plasma (density (] SY.simeq.[) 1x 10<@D110@>D1 cm<@D1-3@>D1, temperature (] SY.simeq.[) 3 eV ) and at last 3) measure again the VSWR and the transmission loss. We find no change of the characteristics after irradiation.