| Budget Amount *help |
¥2,000,000 (Direct Cost: ¥2,000,000)
Fiscal Year 1992: ¥400,000 (Direct Cost: ¥400,000)
Fiscal Year 1991: ¥1,600,000 (Direct Cost: ¥1,600,000)
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| Research Abstract |
A new microtechnique for synthesis of transplutonium compounds is desirable,because the scarcity,radioactivity,toxicity and chemical activity of actinide materials must be taken into account in their preparation and handling.For this purpose the synthesis of transplutonium arsenic compounds with a small quantity was investigated by chemical vapor deposition using beta-diketone chelates of lanthanides(III),thorium(IV)and uranium(IV)instead of transplutonium elements(III). Much attention was paid to prepare the starting material with a small quantity for arsenic compounds.This work consists of four parts,i.e.preparation of oxide films,preparation of sulfide films,preparation of fluoride films and reactivity of a new chelate compound of thallium.
(1)Preparation of oxide films: Highly crystalline thin film of lanthanide,thorium and uranium oxides was prepared at atmospheric pressure and temperatures as low as 400-600ﾟC by chemical vapor deposition using their dipivaloylmethane(2,2,6,6-tetra
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methy1-3,5-heptanato)chelates and reactant gas(O_2, H_2O).
(2)Preparation of sulfide films. Preparation of thin film of lanthanide sulfides was studied by the similar technique using reactant gas H_2S.Two kinds of sulfide,Ln_2O_2S oxysulfides and EuS monosulfide,were obtained at temperatures as low as 390-570ﾟC.
(3)Preparation of fluoride films. Preparation of thin film of lanthanide fluoride was studied by the similar technique using reactant gas mixture of CF_2Cl_2 and O_2. Two kinds of fluorides, oxyfluoride LnOF and trifluoride LnF3,were obtained along a deposition tube at temperatures as low as 300-600ﾟC.
(4)A new thallium chelate. A new volatile chelate,(2,2,6,6-tetramethy1-3,5-heptane dionato)Tl(I)were prepared and analyzed by chemical analysis,thermal analysis and mass spectrometry.The reactivities were investigated by chemical vapor deposition.
Since thin film can be deposited in intricate patterns and on a restricted surface area,the chemical vapor deposition opened up a new area of application for a variety of actinide compounds as a new microscale preparation technique. Less
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