| Project/Area Number |
03805021
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| Research Category |
Grant-in-Aid for General Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Research Field |
機械力学・制御工学
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| Research Institution | Faculty of Engineering,Yamaguchi University |
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Principal Investigator |
KURIBAYASHI Katsutoshi Faculty of Engineering,Yamaguchi University,Department of Mechanical Engineering,Professor, 工学部, 教授 (30081251)
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| Co-Investigator(Kenkyū-buntansha) |
OGAWA Sooichi Osaka Prefectural Industrial Technology Research Institute,Chief Researcher, 材料技術部, 総括研究員
TANIGUCHI Takao Faculty of Engineering,Yamaguchi University,Department of Mechanical Engineering, 工学部, 助教授 (20093966)
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| Project Period (FY) |
1991 – 1992
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| Project Status |
Completed (Fiscal Year 1992)
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| Budget Amount *help |
¥2,000,000 (Direct Cost: ¥2,000,000)
Fiscal Year 1992: ¥600,000 (Direct Cost: ¥600,000)
Fiscal Year 1991: ¥1,400,000 (Direct Cost: ¥1,400,000)
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| Keywords | Reversible shape memory alloy / RSMA actuator / Micro-robot / Micron-sized actuator / RTiNi thin film / RTiNi薄膜 / RSMAアクチュエ-タ / ミクロンサイズアクチュエ-タ / RTiNiアクチュエ-タ |
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| Research Abstract |
Summary of this project is as follows. (1)A Micron sized arm of 1000mum length was designed. (2)Control method was established using 1 degree of freedom of millimeter sized arm of 6000mum length. (3)One degree of freedom of micron sized arm was fabricated on silicon wafer by wet etching method. (4)Lower temperature 500ﾟC for crystalization of TiNi which will contribute on the solution of the problem "TiNi thin film peels off from substrate due to the difference of the rate of expansion", was found. (5)The etching condition for deep etch of Si below the TiNi film was found.
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