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Preparation of Amorphous Thin Films by Reactive Sputtering and Material design

Research Project

Project/Area Number 04453063
Research Category

Grant-in-Aid for General Scientific Research (B)

Allocation TypeSingle-year Grants
Research Field 無機工業化学・無機材料工学
Research InstitutionUniversity of Tokyo

Principal Investigator

YASUI Itaru  UNIVERSITY OF TOKYO, INSTITUTE OF INDUSTRIAL SCIENCE, PROFESSOR, 生産技術研究所, 教授 (20011207)

Co-Investigator(Kenkyū-buntansha) UTSUNO Futoshi  UNIVERSITY OF TOKYO, INSTITUTE OF INDUSTRIAL SCIENCE, ASSOCIATE, 生産技術研究所, 助手 (70232874)
Project Period (FY) 1992 – 1993
Project Status Completed (Fiscal Year 1993)
Budget Amount *help
¥7,200,000 (Direct Cost: ¥7,200,000)
Fiscal Year 1993: ¥2,700,000 (Direct Cost: ¥2,700,000)
Fiscal Year 1992: ¥4,500,000 (Direct Cost: ¥4,500,000)
KeywordsReactive sputtering / Thin film / Two-component target / Amorphous / Material design / Silicide / Oxide / アモルファス / MoSi2
Research Abstract

Amorphous thin films were prepared by reactive sputtering in O_2/Ar atmospheres with several new ceramic targets such as silicide and boride. One of these targets was a molybdenum-silicide (MoSi_2) used in this study. In addition to the MoSi_2 compound target, three other kinds of target (a composite, a Mo and a Si target) were used in this study. The composite target was composed of Mo and Si pieces. Then an analysis of the relations between sputtering rates of these four targets, the rates of both the MoSi_2 target and the composite target could be calculated by those from the Mo and the Si targets taking surface atomic density into consideration. Since it is important to estimate the composition and properties of films prepared by reactive sputtering with multi-component targets on the basis of information using single-component targets, it seems that these results were useful from viewpoint of material design.

Report

(3 results)
  • 1993 Annual Research Report   Final Research Report Summary
  • 1992 Annual Research Report
  • Research Products

    (13 results)

All Other

All Publications (13 results)

  • [Publications] 森 雄爾: "2成分ターゲットの反応性スパッタリングによる薄膜の組成" 第31回セラミックス基礎科学討論会講演要旨集. 256 (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] Futoshi Utsuno: "Sputtering rates of two kinds of Mo-Si target" 1993 Pac Rim Meeting Abstracts. 171 (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] 宇都野 太: "反応性スパッタリングによるセラミックス系薄膜の生成" 生産研究. 45[12]. 821-827 (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] 加藤 寛之: "MDシミュレーションによるFe-Niターゲットのスパッタリング現象" 日本セラミックス協会1994年会. (発表予定). (1994)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] YUJI MORI, FUTOSHI UTSUNO, ITARU YASUI: "Composition of films prepared by reactive sputtering with two-component targets" Proceeding of 31st ceramic basic science symposium. 256. (1993)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] Futoshi Utsuno, Yuji Mori, Atsushi Hayashi, Itaru Yasui: "Sputtering rates of two kinds of Mo-Si targets" 1993 Pac Rim Meeting Abstracts. 171. (1993)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] Futoshi Utsuno, Itaru Yasui: "Preparation of ceramic thin films by reactive sputtering" SEISAN-KENKYU. 45[12]. 821-827 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] Hiroyuki Kato, Futoshi Utsuno, Itaru Yasui: "Sputtering phenomena with a Fe-Ni target by MD simulation" 1994 Annual Meeting of Jpn.Ceram.Soc.(1994)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] 森 雄爾: "2成分ターゲットの反応性スパッタリングによる薄膜の組成" 第31回セラミックス基礎科学討論会講演要旨集. 256 (1993)

    • Related Report
      1993 Annual Research Report
  • [Publications] Futoshi Utsuno: "Sputtering rates of two kinds of Mo-Si target" 1993 Pac Rim Meeting Abstracts. 171 (1993)

    • Related Report
      1993 Annual Research Report
  • [Publications] 宇都野 太: "反応性スパッタリングによるセラミックス系薄膜の生成" 生産研究. 45[12]. 821-827 (1993)

    • Related Report
      1993 Annual Research Report
  • [Publications] 加藤 寛之: "MDシミュレーションによるFe-Niターゲットのスパッタリング現象" 日本セラミックス協会1994年会. (発表予定). (1994)

    • Related Report
      1993 Annual Research Report
  • [Publications] 森 雄爾: "2成分ターゲットの反応性スパッタリングによる薄膜の合成" 第31回 セラミックス基礎科学討論会 講演要旨集. 256 (1993)

    • Related Report
      1992 Annual Research Report

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Published: 1992-04-01   Modified: 2016-04-21  

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