• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to previous page

Developmental Study of Highly-Uniform Large-Diameter ECR Plasma Reactor

Research Project

Project/Area Number 04555004
Research Category

Grant-in-Aid for Developmental Scientific Research (B)

Allocation TypeSingle-year Grants
Research Field Applied materials
Research InstitutionKYOTO UNIVERSITY

Principal Investigator

YASAKA Yasuyoshi (1993)  Kyoto Univ., Fac.Eng., Assoc.Prof., 工学部, 助教授 (30109037)

板谷 良平 (1992)  京都大学, 工学部, 教授 (90025833)

Co-Investigator(Kenkyū-buntansha) ITATANI Ryohei  Niihama Tech.College, President, 校長 (90025833)
KUBO Makoto  Kyoto Univ., Fac.Eng., Instructor, 工学部, 助手 (80089127)
星 弘  日本高周波(株), 取締役
八坂 保能  京都大学, 工学部, 助教授 (30109037)
Project Period (FY) 1992 – 1993
Project Status Completed (Fiscal Year 1993)
Budget Amount *help
¥7,200,000 (Direct Cost: ¥7,200,000)
Fiscal Year 1993: ¥2,300,000 (Direct Cost: ¥2,300,000)
Fiscal Year 1992: ¥4,900,000 (Direct Cost: ¥4,900,000)
KeywordsPlasma process / ECR plasma / Large diameter / Microwave / Multi-cusp field
Research Abstract

The purpose of this research is to develop a large diameter electron cyclotron resonance (ECR) plasma source for high-speed processing of 12 inch wafers. We have constructed a multi-annular (MA) antenna which consists of a concentric array of annular slits for microwave irradiation and of permanent magnets for multi-ring cusp magnetic field. The microwave at 2.45 GHz is fed via coaxial line and is distributed into the annular slits to encounter the ECR layr located 5 mm beyond the exit of the slits. Charged particles drift in azimuthal direction in the multi-ring cusp field. This leads to azimuthally symmetric plasma production. The microwave propagates from the slit to the ECR layr from high magnetic field side as R-waves. It is noted that the plasma is not produced inside the slits because the loss rate of charged particles is large due to proximity of slit walls.
The plasma source using this MA antenna has produced a plasma of 30 cm in diameter with density n = 2*10^<11>cm^<-3> for Ar gas pressure 5*10^<-4> Torr. We measured plasma parameters by changing the number of the slits to find that the uniformity of the plasma is best for one slit at the outermost location. The uniformity is *10% for 30 cm diameter plasma with n = (8-10)*10^<10>cm^<-3> at 10 cm from the MA antenna. This result is consistent with a numerical calculation of the equation of continuity assuming an initial source profile determined by the slits.
The MA antenna has been improved to AMA (adjustable MA) antenna, which has two annular slits at r =140 and 90 mm. Each slit is driven by a magnetron independently. This means that the radial profile of microwave power input is adjustable by simply changing the outputs of two magnetrons. By using AMA antenna, we have achieved plasma production with higher density, higher uniformity at shorter distance from the antenna.

Report

(3 results)
  • 1993 Annual Research Report   Final Research Report Summary
  • 1992 Annual Research Report
  • Research Products

    (18 results)

All Other

All Publications (18 results)

  • [Publications] 八坂保能: "プロセス用ECRプラズマの生成とパルス制御" 平成4年電気関係学会関西支部連合大会講演集. S29 (1992)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] Y.USHIGUSA: "Generation and Uniformity of a Large Diameter Plasma by Using Permanent Magnets" Proceedings of the 10th Symposium on Plasma Processing(Osaka). 125-128 (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] 八坂保能: "パルスプラズマプロセスによる成膜" 日本真空協会関西支部研究例会資料. 5-1. 5-12 (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] 八坂保能: "高密度プラズマのモデリング" 応用物理学会プラズマエレクトロニクス講習会テキスト. 51-77 (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] Y.Ushigusa: "Large Diameter ECR Plasma Produced by Using Multi-Annular Antenna" Proc.2nd Int'l.Conf.on Reactive Plasmas. 537-540 (1994)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] Y.Hara: "Two-Dimensional Simulation of ECR Plasma with Finite Electron Temperature" Proc.2nd Int'l.Conf.on Reactive Plasmas. 725-728 (1994)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] Y.Yasaka: "Production and Pulse Control of ECR Plasmas for Processing" Proc.Joint Symp.of Elec.Assoc.in Kansai Block. S29 (1992)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] Y.Ushigusa: "Generation and Uniformity of a Large Diameter Plasma by Using Permanent Magnets" Proc.10th Symp.on Plasma Processing. 125-128 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] Y.Yasaka: "Film Formation by Pulse Plasma Process" Proc.Symp.Japan Vac.Soc.Vol.5-1. 5-12 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] Y.Yasaka: "Modeling of High-Density Plasmas" Text of School of Plasma Electronics, Jpn.Appl.Phys.Soc.51-77 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] Y.Ushigusa: "Large Diameter ECR Plasma Produced by Using Multi-Annular Antenna" Proc.2nd Int'l.Conf.on Reactive Plasmas. 537-540 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] Y.Hara: "Two-Dimensional Simulation of ECR plasma with Finite Electron Temperature" Proc.2nd Int'l.Conf.on Reactive Plasmas. 725-728

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] 八坂保能: "パルスプラズマプロセスによる成膜" 日本真空協会関西支部研究例会資料. 5-1. 5-12 (1993)

    • Related Report
      1993 Annual Research Report
  • [Publications] 八坂保能: "高密度プラズマのモデリング" 応用物理学会プラズマエレクトロニクス講習会テキスト. 51-77 (1993)

    • Related Report
      1993 Annual Research Report
  • [Publications] Y.Ushigusa: "Large Diameter ECR Plasma Produced by Using Multi-Annular Antenna" Proc.2nd Int'l Conf.on Reactive Plasmas. 537-540 (1994)

    • Related Report
      1993 Annual Research Report
  • [Publications] Y.Hara: "Two-Dimensional Simulation of ECR Plasma with Finite Electron Temperature" Proc.2nd Int'l Conf.on Reactive Plasmas. 725-728 (1994)

    • Related Report
      1993 Annual Research Report
  • [Publications] Y.USHIGUSA: "Generation and Uniformity of a Large Dia-meter Plasma by Using Permanent Magnets" Proceedings of the 10th Symposium on Plasma Processing(Osaka). 125-128 (1993)

    • Related Report
      1992 Annual Research Report
  • [Publications] 八坂 保能: "プロセス用ECRプラズマの生成とパルス制御" 平成4年電気関係学会関西支部連合大会講演集. S29- (1992)

    • Related Report
      1992 Annual Research Report

URL: 

Published: 1992-04-01   Modified: 2016-04-21  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi