| Project/Area Number |
04650071
|
|---|
| Research Category |
Grant-in-Aid for General Scientific Research (C)
|
| Allocation Type | Single-year Grants |
|---|
| Research Field |
機械材料工学
|
|---|
| Research Institution | Himeji Institute of Technology |
|---|
Principal Investigator |
KOTERAZAWA Keiji Himeji Inst Tech., Faculty of Engng., Prof., 工学部, 教授 (50047594)
|
|---|
| Co-Investigator(Kenkyū-buntansha) |
INOUE Shozo Himeji Inst Tech., Faculty of Engng., Res.Aso., 工学部, 助手 (50193587)
UCHIDA Hitoshi Himeji Inst Tech., Faculty of Engng., Aso.Prof., 工学部, 助教授 (30047633)
|
|---|
| Project Period (FY) |
1992 – 1993
|
| Project Status |
Completed (Fiscal Year 1993)
|
| Budget Amount *help |
¥1,900,000 (Direct Cost: ¥1,900,000)
Fiscal Year 1993: ¥500,000 (Direct Cost: ¥500,000)
Fiscal Year 1992: ¥1,400,000 (Direct Cost: ¥1,400,000)
|
|---|
| Keywords | rf reactive sputtering / functionally gradient films / optical emission spectra / mass spectroscopy / Auger Electron Spectroscopy / Al-AlN系傾斜機能薄膜 / 高周波反応性スパッタリング法 / X線回折 |
|---|
| Research Abstract |
The rf reactive sputtering of metal target on Ar+N_2 mixed gas was applied to fabricate the compositionally gradient films consisting of metal and nitride phases. In this work, two methods are presented to form the ompositionally gradient metaL-nitride films. The first is the N_2 partial pressure-to-total pressure ratio (P_<N2>/P_<total>) control method, and the other is the rf power control method. The compositionally gradient metal-nitride films were deposited onto slide glasses, and the subsrate temperature were room temperature and 200ﾟC.The crystallographic structure, the compositon and the morphology of deposited films were characterized by X-ray diffractometry, Auger electron spectroscopy and scanning electron microscopy, respectively. For comparison, two metal targets(Al and Ti) were used to deposit the compositionally gradient films.
Both P_<N2>/P_<total> and rf power cotrol method can be used to grow compositionally gradient films. It is demonstrated that the deposited film has the structure with a nitride layr on a metal layr. The morphology of the films is greatly dependent on the substrate temperature, independently of the deposition method. It is also shown that the optical emission spectroscopy and the mass spectroscopy are useful tools to monitor the growth of these films.
|
