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Development of film preparation equipment of facing target sputtering system with UV light radiation and estimation of obtained film properties

Research Project

Project/Area Number 04650269
Research Category

Grant-in-Aid for General Scientific Research (C)

Allocation TypeSingle-year Grants
Research Field 電子材料工学
Research InstitutionThe University of Tokushima

Principal Investigator

TOMINAGA Kikuo  The University of Tokushima, Faculty of Engineering, Assistant Professor, 工学部, 助教授 (10035660)

Project Period (FY) 1992 – 1993
Project Status Completed (Fiscal Year 1993)
Budget Amount *help
¥1,900,000 (Direct Cost: ¥1,900,000)
Fiscal Year 1993: ¥400,000 (Direct Cost: ¥400,000)
Fiscal Year 1992: ¥1,500,000 (Direct Cost: ¥1,500,000)
Keywordsfacing target sputtering system / Zinc oxide film / transparent Conductive films / Planar magnetron sputtering / UV radiation effect / film bombardment by energetic particles / ZnO : Al / 対向ターゲット式スパッタリング法 / イオン衝撃
Research Abstract

We developed planar magnetron sputtering system with facing targets and applied it to film preparations of conductive transparent films such as ZnO : Al and ITO.At the same time, effect of simultaneous radiation of UV light on film growth was investigated. It was demonstrated at first that film resistivity becomes small when the plasma exposure of substrate is decreased. We could obtain ZnO : Al films with fairly low resistivity and good transparency, especially at low gas pressures. (Proc. of IMCTF,San Diego, 1993) After this, we obtained a result that UV light radiation by Hglamp induces an decrease of film resistivity, which is due to an increase of about 50 %in carrier concentration. This was not so drastic effect, but there existed a fairly improvement of film crystallinity. Another important result was that the resistivity of ZnO : Al film was decreased under simultaneous sputtering of ZnO : Al and Zn targets. The supply of Zn atoms was controlled by changing the discharge current of Zn target. This result shows that ZnO : Al films prepared at normal conditions are Zn-deficient films. These Zn-defects act as acceptors, so the control of Zn defects is important in addition to Al dopant control in order to obtain low resistivity ZnO : Al films. (Proc.IMCTF at San Diego, 1994). For ITO films, we are now preparing by the same facing target system.
Concerning film bombardment by energetic particles was also studied. (J.Vac. Sci. & Technol. 1994)

Report

(3 results)
  • 1993 Annual Research Report   Final Research Report Summary
  • 1992 Annual Research Report
  • Research Products

    (18 results)

All Other

All Publications (18 results)

  • [Publications] 富永喜久雄: "Energetic Particles in the Sputtering of an Indium-Tin Oxide Target" J.Vac.Sci Z Technol.A12. in press (1994)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] 富永喜久雄: "Transparent C onductive ZnO:Al Films Prepared by the Planar Magnetron Sputtering System with Obliguely Facing Targs" Surface and Coatings Technology. 62. 683-687 (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] 富永喜久雄: "Film Prepartion of ZnO in Ar Gas by Planar Magnetron Sputtering System with Facing Targets" Proc,11th ISPC(Loughborough,UK). 841-846 (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] 富永喜久雄: "Simultaneous Measuremnts of Energetic O^-Ions and O Atoms in Sputtering of Zinc Oxide Taget" Jpn,J,Appl,Phys,. 32. 4745-4749 (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] 富永喜久雄: "Energetic O^-Ions and O Atoms in Planar Magnetron Sputtering of ZnO Target" Jpn,J,Appl,Phys,. 32. 4131-4135 (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] 富永喜久雄: "Behavior of Energetic O^-Ions and O Atoms in Sputtering of Oxide Target" Proc,2nd.Int'l Symp.on ISSP'93,Tokyo. 183-188 (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] Kikuo Tominaga: "Energetic Particles in the Sputtering of an Indium-Tin Oxide Target" J.Vac.Sci.& Technol.A12 (in press). (1994)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] Kikuo Tominaga :"Transparent Conductive ZnO : Al Films Prepared by the Planar MAgnetron Sputtering System with Obliquely Facing Targets" Surface and Coatings Technology. 62. 683-687 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] Kikuo Tominaga :"Film Preparation of ZnO in Ar Gas by Planar Magnetron Sputtering System with Facing ZnO Targets" Proc.of 11th ISPC (Loughborough, UK). 841-846 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] Kikuo Tominaga :"Simultaneous Measurements of Energetic O^- Ions and OAtoms in Sputtering of Zinc Oxide Target" Jpn.J.Appl.Phys.32. 4745-4749 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] Kikuo Tominaga :"Energetic O^- Ions and OAtoms in Planar Magnetron Sputtering of ZnO Target" Jpn.J.Appl.Phys.32. 4131-4135 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] Kikuo Tominaga :"Behavior of Energetic O^- Ions and OAtoms in Sputtering of Oxide Target" Proc.2nd Int'l Symp.On ISSP'93, Tokyo. 183-188 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1993 Final Research Report Summary
  • [Publications] 富永喜久雄: "Energetic Particles in the Sputtering of an Indium-Tin Oxide Target" J.Vac.Sci & Technol.A12 (in press). (1994)

    • Related Report
      1993 Annual Research Report
  • [Publications] 富永喜久雄: "Transparent Conductive ZnO:Al Films Prepared by the Planar Magnetron Sputtering System with Obliquely Facing Targets" Surface and Coatings Technology. 62. 683-687 (1993)

    • Related Report
      1993 Annual Research Report
  • [Publications] 富永喜久雄: "Film Preparation of ZnO in Ar Gas by Planar Magnetron Sputtering System with Facing ZnO Targets" Proc.11th ISPC(Lough borough). 841-846 (1993)

    • Related Report
      1993 Annual Research Report
  • [Publications] 富永喜久雄: "Simltaneous Measurements of Energetic O- Ions and O atoms in Sputtering of Zinc Oxide Target" Jpn.J.Appl.Phys.32. 4745-4749 (1993)

    • Related Report
      1993 Annual Research Report
  • [Publications] 富永喜久雄: "Energetic O- Ions and O atoms in Planar Magnetron Sputtering of ZnO Target" Jpn.J.Appl.Phys.32. 4131-4135 (1993)

    • Related Report
      1993 Annual Research Report
  • [Publications] 富永喜久雄: "Behavior of Energetic O- Ions and O atoms in Sputtering of Oxide Target" Proc.2nd Int'l Symp.on ISSP'93,Tokyo. 183-188 (1993)

    • Related Report
      1993 Annual Research Report

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Published: 1992-04-01   Modified: 2016-04-21  

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