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STUDIES ON MEASUREMENTS OF RADICALS IN GAS PHASE USING SPECTROSCOPY TECHNIQUES

Research Project

Project/Area Number 05237104
Research Category

Grant-in-Aid for Scientific Research on Priority Areas

Allocation TypeSingle-year Grants
Research InstitutionNagoya University

Principal Investigator

GOTO Toshio  SCHOOL OF ENGINEERING,NAGOYA UNIVERSITY,PROFESSOR, 工学部, 教授 (50023255)

Co-Investigator(Kenkyū-buntansha) MAKABE Toshiaki  FACULTY OF SCIENCE AND TECHNOLOGY,KEIO UNIVERSITY,PROFESSOR, 理工学部, 教授 (60095651)
WATANABE Yukio  SCHOOL OF ENGINEERING,KYUSHU UNIVERSITY,PROFESSOR, 工学部, 教授 (80037902)
TACHIBANA Kunihide  SCHOOL OF ENGINEERING,KYOTO UNIVERSITY,PROFESSOR, 工学部, 教授 (40027925)
MURAOKA Katsunori  INTERDISCIPLINARY GRADUATE SCHOOL OF SCIENCE,KYUSHU UNIVERSITY,PROFESSOR, 総合理工学研究科, 教授 (80038546)
SUGAI Hideo  SCHOOL OF ENGINEERING,NAGOYA UNIVERSITY,PROFESSOR, 工学部, 教授 (40005517)
Project Period (FY) 1993 – 1995
Project Status Completed (Fiscal Year 1996)
Budget Amount *help
¥106,000,000 (Direct Cost: ¥106,000,000)
Fiscal Year 1995: ¥26,100,000 (Direct Cost: ¥26,100,000)
Fiscal Year 1994: ¥40,400,000 (Direct Cost: ¥40,400,000)
Fiscal Year 1993: ¥39,500,000 (Direct Cost: ¥39,500,000)
KeywordsFREE RADICAL / PLASMA / LASER / PARTICLES / MODELING / SPECTROSCOPY / PROCESS / ION / シリコン
Research Abstract

(1) CFx (X=1-3), SiHx (X=1-3) and Si radicals in plasmas excited by some plasma sources were investigated by infrared diode laser absorption spectroscopy and various kinds of laser spectroscopy technologies, and the behaviors of radicals was clarified. The techniques to control the density and compositon of CFx (X=1-3) radicals were developed.
(2) A set of cross action data on electron-impact dissociation of reactive molecules into neutral radicals was obtained. Ionic species dissociatively scattered from the surface were measured when the ions were incident on the surface. The surface reaction of CF_2 radicals for etching processes were clarified.
(3) The density of H radicals in a parallel plate RF silane plasma were measured by laser fluorescence technique, namely two-photon excitation at 205nm and the behavior of H radicals was clarified.
(4) The role of H radicals in the formation of poly-crystalline Si films at a low temperature was investigated and it was clarified that H radicals playd an important role. The surface of Si exposed to CF_4 plasma was observed by phase-modulated FT-IR spectroscopy developed in this study. It was found that the particles grew through electrostatic forces and/or attractive force in the methane plasma and the spatial arrangement of particle was formed. The mechanism of this pseudo two-dimensional alignment was investigated.
(5) It was found that the key species contributing to the particle nucleation were short-life radicals, especially SiH_2 and they participated many times in the initial growth process using laser and probe techniques.
(6) Space-and time-resolved emission spectroscopy was applied to obtain the information on the behavior of the plasma structure at a capacitively coupled plasma. It was found that the sheath width increased with increasing the dissipated power. Moreover, it was confirmed that the synergism in the reaction between O and O^- produced in abundance in O_2 plasma.

Report

(3 results)
  • 1996 Final Research Report Summary
  • 1995 Annual Research Report
  • 1994 Annual Research Report
  • Research Products

    (95 results)

All Other

All Publications (95 results)

  • [Publications] K.Takahashi et.al.: "Evaluation of CF_2 radical as a precursor for fluorocarbon film formation in highly selective SiO_2 etching process using radical injection technique" Jpn.J.Appl.Phys.35. 3635-3641 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] M.Hiramatsu et.al.: "Hydrogen-radical-assisted radio-frequency plasma-enhanced chemical vapor deposition system for diamond formation" Rev.of Sci.Inst.67. 2360-2365 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] K.Takahashi et.al.: "Fluorocarbon radicals and surfeca reactions in fluorocarbon high density etching plasma.I.O_2 addition to electron cyclotron resonance plasma employing CHF_3" J.Vac.Sci.& Technol.A14. 2004-2010 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] K.Takahashi et.al.: "Fluorocarbon radicals and surfeca reactions in florocarbon high density etching plasma.II.H_2 addition to electron cyclotron resonance plasma employing CHF_3" J.Vac.Sci.& Technol.A14. 2011-2019 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] S.Den et.al.: "Diagnostics of fluorocarbon radicals in a large-area permanent magnet electron cyclotron resonance etching plasma" Jpn.J.Appl.Phys.35. 6528-6533 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] T.Goto and M.Hori: "Radical behavior in fluorocarbon plasma and control of silicon oxide etching by injection of radicals" Jpn.J.Appl.Phys.35. 6521-6527 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] Kunimasa Takahashi et al.: "Evaluation of CF_2 radical as a precursor for fluorocarbon film formation in highly selective SiO_2 etching process using radical injection technique" Jpn.J.Appl.Phys.35-6A. 3635-3641 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] Mineo Hiramatsu et al.: "Hydrogen-radical-assisted radio-frequency plasma-enhanced chemical vapor deposition system for diamond formation" Rev.of Sci.Inst.67-6. 2360-2365 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] Kunimasa Takahashi et al.: "Fluorocarbon radicals and surface reactions in fluorocarbon high density etching plasma. I.O_2 addition to electron cyclotron resonance plasma employing CHF_3" J.Vac.Sci. & Technol.A14-4. 2004-2010 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] Kunimasa Takahashi et al.: "Fluorocarbon radicals and surface reactions in fluorocarbon high density etching plasma. II.H_2 addition to electron cyclotron resonance plasma employing CHF_3" J.Vac.Sci. & Technol.A14-4. 2011-2019 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] Shoji Den et al.: "Diagnostics of fluorocarbon radicals in a large-area permanent magnet electron cyclotron resonance etching plasma" Jpn.J.Appl.Phys.35-12B. 6528-6533 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] Toshio Goto et al.: "Radical behavior in fluorocarbon plasma and control of silicon oxide etching by injection of radicals" Jpn.J.Appl.Phys.35-12B. 6521-6527 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] S.Naito: "H2 partial pressure dependences of CH_3 radical density and effects of H_2 dilution on carbon thin film formation in RF discharge CH_4 plasma" Jpn.J.Appl.Phys.34. 302-303 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] M.Ikeda: "Synthesis of diamond using RF magnetron methanol plasma CVD assisted by hydrogen radical injection" Jpn.J.Appl.Phys.34. 2484-2488 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] K.Miyata: "CFx (x=1-3) radical measurements in ECR etching plasma employing C_4F_8 gas by infrared diode laser absorption spectroscopy" Jpn.J.Appl.Phys.34. L444-L447 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] M.Ikeda: "CH_3 radical density in electron cyclotron resonance CH_3OH and CH_3OH/H_2 plasmas" Jpn.J.Appl.Phys.34. 3273-3277 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] A.Kono: "Laser Induced Fluorescence study of the SiH_2 density in RF SiH_4 plasma with Xe,Ar,He and H_2 dilution gases" Jpn.J.Appl.Phys.34. 307-311 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] K.Maruyama: "Variation of CF_3,CF_2 and CF radical densities with passage of RF CHF_3 discharge duration" J.Phys.D. 28. 884-887 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] H.Nomura: "Rate constants for the reactions of SiH and SiH_2 with in a low pressure SiH_4 plasma" J.Phys.D. 28. 1977-1982 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] M.Inayoshi: "High rate anisotropic ablation and deposition of polytetrafluoroethylene using synchrotron radiation process" Jpn.J.Appl.Phys. 34. L1675-L1677 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] T.Goto: "Measurement of radicals in plasmas for semiconductor processing using laser spectroscopic techniques" J.Advanced Automation Technology. 17. 284-288 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] K.Nakamura: "Helicon wave measurements in an inductively coupled magnetron plasma" Australian J.Phys.48. 461-468 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] H.Sugai: "Diagnostics and control of radicals in an inductively coupled etching reactor" J.Vac.Sci & Technol.A13. 887-893 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] H.Sugai: "A biased optical probe method for measurements of electron energy distribution in a aplasma" Plasma Sources Sci.Technol.4. 366-372 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] K.Nakamura: "Hot spot and electron heating processes in a helicon-wave excited plasma" Jpn.J.Appl.Phys.34. 366-372 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] H.Toyota: "Simple direct monitoring of SiH_3 radical and particulates in a silane plasma with ultra violet transmission spectroscopy" Jpn.J.Appl.Phys.34. L448-L451 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] Y.Mitsuoka: "Observation of ion scattering from metal surfaces bombarded with low-energy hydrocarbon ions" Jpn.J.Appl.Phys.34. L516-L519 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] H.Sugai: "Absolute cross section for the electron-impact dissociation of CF_4 and CHF_3 into the CFx (x=1-3) neutral radicals" Contrib.Plasma Phys.35. 415-420 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] M.Ito: "Relative cross section for electron-impact dissociation of SF_6 into SFx (x=1-3) neutral radicals" Contrib.Plasma Phys.35. 405-413 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] Y.Mitsuoka: "Dissociative ion yields on metal surfaces bombarded with low-energy fluorocarbon ions" Jpn.J.Appl.Phys.34. L1486-L1489 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] H.Sugai: "Recent development of reactive plasma diagnostics and radical control" J.Plasma and Fusion Research. 71. 191-201 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] H.Ikeda: "Oxidation of H-terminated Si (100) Surfaces studied by high-resolution electron energy loss spectroscopy" J.Appl.Phys.77. 5125-5129 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] H.Ikeda: "Studies on reaction processes of hydrogen and oxygen atoms with H_2O-absorbed Si (100) surfaces by high-resolution electron energy loss spectroscopy" Jpn.J.Appl.Phys.34. 2191-2195 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] K.Tchibana: "Analysis of the coulomb-solidification process in particle plasma" Aust.J.Phys.48. 469-477 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] K.Hanaoka: "In-situ measurement of gas-phase reacitions during the metal-ogeanic chemical vapor deposition of copper using Fourier-transform infrared spectroscopy" Thin Solid Films. 262. 209-217 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] K.Hanaoka: "In situ monitoring of selective coppre deposition processes in a metal-organic chemical vapor deposition using Fourier-transform infrared reflection absorption spectroscopy" Jpn.J.Appl.Phys.34. 2430-2439 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] T.Shirefuji: "Measurement and calculation of SiH_2 radical density in SiH_4 and Si_2H_6 plasma for the deposition of hydrogenated amorphous silicon thin films" Jpn.J.Appl.Phys.34. 4239-4246 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] T.Shirafuji: "In situ Fourier transform infrared ellipsometry for monitoring c-Si etching process by CF_4 plasma" Proceedings of the 12th International Symposium on Plasma Chemistry. 1413-1418 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] T.Shirafuji: "Role of H radicals in the low temperature growth of poly-Si films by plasma CVD using SiF_4/SiH_4/H_2" Proceeding of the 12th International Symposium on Plasma Chemistry. 2125-2130 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] K.Okimure: "Preparation of routile TiO_2 films by RF magnetron sputtering" Jpn.J.Appl.Phys.34. 4950-4955 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] R.E.Robson: "Frequency variation of the mean energy of r.f electron swarms" Aust.J.Phys.48. 335-345 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] Y.Hosokawa: "Modeling and measurement of submicron particles in RF plasma in Ar" Aust.J.Phys.48. 439-452 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] M.Shibata: "O_2 rf discharge structure in parallel plates reactor at 13.56 MHz for material processing" J.Appl.Phys.77. 6181-6187 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] 真壁利明: "低温プロセスプラズマモデリングの現状と課題" 応用物理. 64. 547-553 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] 真壁利明: "SF_6低温プラズマと半導体プロセス周辺" 電気学会誌. 115. 492-493 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] M.Shibata: "Effect of surface material on spatiotemporal structure in O_2RF glow discharge" Jpn.J.Appl.Phys.34. 6230-6236 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] M.Shiratani: "Simultanious in-situ meassurements of properties of particulates in rf silane plasma using a polarization-sensitive laser-light-scattering method" J.Appl.Phys.79. 104-109 (1996)

    • Related Report
      1995 Annual Research Report
  • [Publications] H.Kawasaki: "Discharge frequency dependences of particulate growth in high frequency silane plasma" Appl.Phys.Lett.67. 3880-3882 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] 渡辺征夫: "プラズマCVD半導体プロセスにおける微粒子の発生と測定" 日本エアロゾル学会. 10. 13-19 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] P.L.G.Ventzek: "Simulation of real-time control of two-dimensional features in inductively coupled plasma for etching applications" J.Vac.Sci.&Technol・. A13. 2456-2463 (1996)

    • Related Report
      1995 Annual Research Report
  • [Publications] K.Tanaka: "A modeling for deposition process of hydrogenated amorphous silicon thin film using a Monte Carlo method (II)" Proc.13th Symp.Plasma Processing. 13. 101-104 (1996)

    • Related Report
      1995 Annual Research Report
  • [Publications] A.Shinohara: "Monte Carlo simulation of SiH_4^+ ion swarms under DC and RF electric fields (2)" Proc.13th Symp.Plasma Processing. 13. 409-411 (1996)

    • Related Report
      1995 Annual Research Report
  • [Publications] Y.Yamamoto: "Measurement of Absolute Densities of Si,SiH and SiH_3 in Electron Cyclotron Resonance SiH_4/H_2 Plasma" Jpn.J.Appl.Phys.33(7B). 4320-4324 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] K.Maruyama: "CF_3,CF_2,and CF Radical Measurements in RF CHF_3 Etching Plasma Using Infrared Diode Laser Absorption Spectroscopy" Jpn.J.Appl.Phys.33(7B). 4298-4302 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] K.Takahashi: "CFx(X=1-3)Radicals Controlled by On-Off Modulated Electron Cyclotron Resonance Plasma and Their Effects on Polymer Film Deposition" Jpn.J.Appl.Phys.33(7B). 4181-4185 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] 後藤 俊夫: "レーザー分光法によるプラズマ中のラジカル計測" 精密工学会誌.60(11). 1-6 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] K.Takahashi: "Characteristics of Fluorocarbon Radicals and CHF_3 Molecule in CHF_3 Electron Cyclotron Resonance Downstream Plasma" Jpn.J.Appl.Phys.33(8). 4745-4751 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] H.Nomura: "Effect of Dilution Gases on the SiH_3 Radical Density in an RF SiH_4 Plasma" Jpn.J.Appl.Phys.33(7B). 4165-4169 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] T.Tanaka: "Reaction rate constant of Si atoms with SiH_4 molecules in a RF silane plasma" J.Phys.D:Appl.Phys.27. 1660-1663 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] S.Naito: "Effect of Rare Gas Dilution on CH_3 Radical Density in RF-Discharge CH_4 Plasma" Jpn.J.Appl.Phys.32(12A). 2725-5721 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] U.Czarnetzki: "Two-Photon Laser-Induced Fluorescence Measurements of Absolute Atomic Hydrogen Densities and Powder Formation in a Silane Discharge" J.Vac.Sci.Technol.12. 831-834 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] U.Czarnetzki: "Comparison of various two-photon excitation schemes for laser-induced fluorescence spectroscopy in atomic hydrogen" J.Opt.Soc.Am.B. 11. 2155-2162 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] S.Itoh: "Radical control by wall heating of a fluorocarbon etching reactor" Jpn.J.Appl.Phys.33(9A). L1261-L125 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] H.Sugai: "Cross section measurements for electron-impact neutral dissociation by appearance mass spectrometry" 3rd Australia-Japan Workshop on Gaseous Electronics and Application. 57-60 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] H.Sugai: "Electrostatic coupling of antenna and the shielding effect in inductive RF plasmas" Jpn.J.Appl.Phys.33(4B). 1289-1293 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] Y.Hikosaka: "Free radicals in an inductively coupled etching plasma" Jpn.J.Appl.Phys.33(4B). 2157-2163 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] M.Goto: "Cross section measurements for electron-impact dissociation of CHF_3 into neutral and ionic radicals" Jpn.J.Appl.Phys.33(6B). 3603-3608 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] 菅井秀郎: "低圧力・高密度プラズマの新しい展開" 応用物理. 63(6). 559-567 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] K.Nakamura: "High-speed etching of indium-tin-oxide thin films using an inductively coupled plasma" Jpn.J.Appl.Phys.33(7B). 4438-4441 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] 光岡義仁: "メタンプラズマで生成されるラジカル種と金属テルルとの表面反応" 電気学会論文誌A. 114. 547-552 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] K.Tachibana: "Spectroscopic and probe measurements of structures in a parallel plates rf discharge with particles" Plasma Sources Sci.Technol.3. 314-319 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] Y.Hayashi: "Mie scattering ellipsometry for analysis of particle behaviors in processing plasmas" Jpn.J.Appl.Phys.33(3B). L476-L478 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] T.Shirafuji: "In Situ Ellipsometric Monitoring of Low Temperature Growth of Poly-Si Films by RF Plasma CVD" Material Research Society Symposium Proceedings. 336. 73-78 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] Y.Hayashi: "Observation of Coulomb-crystal formation from carbon particles grown in a methane plasma" Jpn.J.Appl.Phys.33(6A). L804-L806 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] K.Tachibana: "Detection of H atoms in RF-discharge SiH_4,CH_4,H_2 plasmas by two-photon absorption laser-induced fluorescence spectroscopy" Jpn.J.Appl.Phys.33(7B). 4329-4334 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] K.Tachibana: "In situ ellipsometric monitoring of the growth of polycrystalline silicon thin films by RF plasma chemical vapor deposition" Jpn.J.Appl.Phys.33(7B). 4191-4194 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] Y.Hayashi: "Analysis of spherical carbon particle growth in a methane plasma by Mie-scattering ellipsometry" Jpn.J.Appl.Phys.33(7B). 4208-4211 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] 白藤 立: "薄膜トランジスタ用多結晶シリコンの低温堆積過程" 真空. 37(11). 875-880 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] M.Shiratani: "Formation Processes of Particulates in Helium-Diluted Silane RF Plasmas" IEEE Transactions on Plasma Science. 22. 103-107 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] 渡辺征夫: "プラズマプロセスにおけるパーティクルの発生と制御" 日本工業出版「クリーンテクノロジー」. 10(4). 69-74 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] Y.Watamabe: "Experimental Investigation of Particulate Formation in He-SiH_4 Modulated RF Discharges" Plasma Sources Sci.Technol.3. 286-290 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] M.Shiratani: "Study on growth processes of particulates in helium-diluted silane rf plasmas using scanning electron microscopy" Appl.Phys.Lett.65(15). 1900-1902 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] T.Fukuzawa: "Novel in situ method to detect subnanometer-size particles in plasmas and its application to particles in helium-diluted silane rf plasmas" Appl.Phys.Lett.64(23). 3098-3100 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] H.Kawasaki: "Investigation of Particulate Growth Processes in RF Silane Plasmas Using Light Absorption and Scanning Electron Microscopic Methods" Jpn.J.Appl.Phys.33(7B). 4198-4201 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] T.Fukuzawa: "Study on Growth Processes of Subnanometer Particles in Early Phase of Silane RF Discharge" Jpn.J.Appl.Phys.33(7B). 4212-4215 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] Y.Watamabe: "Effects of Particles on He-SiH_4 Modulated RF Discharges" Plasma Sources Sci.Technol.3. 355-359 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] K.Kondo: "A study of the sustaining mechanism in an inductively coupled plasma" Jpn.J.Appl.Phys.33(7B). 4254-4257 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] F.Tochikubo: "Influence of Ar metastable on the discharge structure in Ar and N_2 mixture in RF discharges at 13.56 MHz" Jpn.J.Appl.Phys.33(7B). 4271-4275 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] T.kamata: "A correlation between particle growth and spatiotemporal RF plasma structure" Plasma Source Sci.Technol.3. 310-313 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] R.E.Robson: "Transport coefficients and velocity distribution function of an ion swarm in an A.C. electric field obtained from the BGK kinetic equation" Aust.J.Phys.47. 305-314 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] N.Nakano: "The radical transport in the narrow-gap-reactive-ion etcher in SF_6 by the relaxation continuum model" Jpn.J.Appl.Phys.33(4B). 2223-2230 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] N.Nakano: "Simulation of rf glow discharge in SF_6 by the relaxation continuum model:Physical structure and function of the narrow-gap reactive-ion etcher" Phys.Rev.E49. 4455-4465 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] K.Kondo: "Spatiotemporal characteristics determined by a relaxation continuum model of an inductively coupled plasma" Appl.Phys.Lett.65. 31-33 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] K.Maeda: "Time dependent RF swarm transport by direct numerical procedure of the Boltzmann equation" Jpn.J.Appl.Phys.33(7B). 4173-4176 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] 橘 邦英: "先端電気化学(分担執筆pp.105-113)" 電気化学協会編(丸善), 398 (1994)

    • Related Report
      1994 Annual Research Report

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Published: 1993-04-01   Modified: 2016-04-21  

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