| Project/Area Number |
05555165
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| Research Category |
Grant-in-Aid for Developmental Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Research Field |
Physical properties of metals
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| Research Institution | Tohoku University |
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Principal Investigator |
SHINDO Daisuke Tohoku University, Institute for Advanced Materials Research, Professor, 素材工学研究所, 教授 (20154396)
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| Co-Investigator(Kenkyū-buntansha) |
OIKAWA Tetsuo JEOL company, Chief Researcher, 主任研究員
KUDOH Junichi Tohoku University, Computer Center, Research Associate, 大型計算センター, 助手 (40186408)
WASEDA Yoshio Tohoku University, Institute for Advanced Materials Research, Professor, 素材工学研究所, 教授 (00006058)
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| Project Period (FY) |
1993 – 1994
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| Project Status |
Completed (Fiscal Year 1994)
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| Budget Amount *help |
¥15,200,000 (Direct Cost: ¥15,200,000)
Fiscal Year 1994: ¥2,200,000 (Direct Cost: ¥2,200,000)
Fiscal Year 1993: ¥13,000,000 (Direct Cost: ¥13,000,000)
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| Keywords | Imaging Plate / Electron Microscope / Quantitative Analysis / Computer Network / Image Analysis |
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| Research Abstract |
A quantitative image processing system for electron microscope images obtained with imaging plates has been developed by utilizing the network system (TAINS) and an engineering work station. Basic properties of the imaging plates, such as the resolution and fading phenomena were also investigated. Based on the properties and using the quantitative analysis system, detailed analysis of electron diffraction patterns and high-resolution images was carried out. In the analysis of electron diffraction patterns, detailed intensity distribution of diffuse scattering in compound semiconductors was clearly analyzed to make clear the ordered atomic arrangement of the constituent elements. On the other hand, in the analysis of high-resolution electron microscope images, a residual index was introduced. By minimizing the residual index, deficiency of the constituent elements in a high-Tc superconductor was quantitatively analyzed. Since the quantitative analysis system can be applied to the image analysis with conventional EM films, it will be very useful in quantification for both electron diffraction patterns and high-resolution electron microscope images.
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