• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to previous page

Plasma Production by New Type ECR Antenna for Large Area Uniform Processing

Research Project

Project/Area Number 05558053
Research Category

Grant-in-Aid for Developmental Scientific Research (B)

Allocation TypeSingle-year Grants
Research Field プラズマ理工学
Research InstitutionTohoku University

Principal Investigator

SATO Noriyoshi  Dept. of Elactronic Eng. Tohoku Univ., Professor, 工学部, 教授 (40005252)

Co-Investigator(Kenkyū-buntansha) NAKAGAWA Yukihito  Res. and Develop. Anelva Corp., Chief, 研究開発本部, 主任
TSUKUDA Tsutomu  Res. and Develop. Anelva Corp., Head, 研究開発本部, 部長
HATAKEYAMA Rikizo  Dept. of Elactronic Eng. Tohoku Univ., Assis. Prof, 工学部, 助教授 (00108474)
IIZUKA Satoru  Dept. of Elactronic Eng. Tohoku Univ., Assis. Prof, 工学部, 助教授 (20151227)
Project Period (FY) 1993 – 1995
Project Status Completed (Fiscal Year 1995)
Budget Amount *help
¥16,200,000 (Direct Cost: ¥16,200,000)
Fiscal Year 1995: ¥1,600,000 (Direct Cost: ¥1,600,000)
Fiscal Year 1994: ¥3,600,000 (Direct Cost: ¥3,600,000)
Fiscal Year 1993: ¥11,000,000 (Direct Cost: ¥11,000,000)
KeywordsLarge-diameter uniform plasma / ECR plasma / Slotted antenna / Plasma processing / Etching / Energy control / Radical control / Electron temperature control / 大口径プラズマ / ECRプラズマ / 均一プラズマ / マイクロ波
Research Abstract

The results using plane slotted ECR (Electron Cyclotron Resonance) antenna are summarized as follows ;
(1)A uniform plasma with a diameter larger than 45cm is easily produced by using a smaller slotted sntenna of 15cm in diameter. This has an advantage in a practical use.
(2)The plasma density increases with the microwave power in the range of 1kW owing to the antenna water-cooling system. A new type the ECR antenna structure which can be placed outside the vacuum chamber is discussed and designed for the high power operation.
(3)Good plasma uniformity is obtained even in reactive plasma with O_2, CF_4, and N_2.
(4)The uniformities of the plasma processing such as photoresist ashing in O_2 plasma, polysilicon etching in SF_6 plasma, and silicon and silicon dioxide etchings in CF_4 plasma are obtained within 5% over 45cm in diameter.
(6)A new method for controlling electron and ion energy distribution functions is developed for a qualified plasma processing with radical and ion-assist chemical reactions, respectively. The electron and ion temperatures are found to be varied by one order of magnitude.

Report

(4 results)
  • 1995 Annual Research Report   Final Research Report Summary
  • 1994 Annual Research Report
  • 1993 Annual Research Report
  • Research Products

    (44 results)

All Other

All Publications (44 results)

  • [Publications] N. Sato: "Uniform plasma produced by a plane slotted antenna with magnets for electron cyclotron resonance" Applied Physics Letters. 62. 1469-1471 (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] S. Iizuka: "Plasma density increase in uniform ECR plasma of large diameter" Proc. 10th Symp. on Plasma Processing. 121-124 (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] T. Ishida: "Production of large-diameter oxygen plasma by a plane ECR antenna" Proc. 6th Symp. on Plasma Sci. for Materials. 63-68 (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] 中川行人: "ECRプラズマ源の特性評価とドライエッチングへの応用" 電気学会プラズマ研究会資料. EP-93-68. 29-38 (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] 石田大繁: "大面積ECR酸素プラズマの特性" 電気学会プラズマ研究会資料. EP-93-64. 95-104 (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] S. Iizuka: "Electron cyclotron device with permanent magnets for production of large diameter uniform plasma" Japan Journal of Applied Physics. 33. 4221-4225 (1994)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] T. Ishida: "Large-diameter reactive plasma produced by a plane electron cyclotron resonance antenna" Japan Journal of Applied Physics. 33. 4236-4238 (1994)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] N. Sato: "Plasma production and control for material processings" Proc. 2nd Int. Conf. on Reactive Plasmas. 531-536 (1994)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] T. Ishida: "Large-diameter reactive plasma produced by plane ECR antenna" Proc. 2nd Int. Conf. on Reactive Plasmas. 339-342 (1994)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] S. Hiyama: "Large-diameter reactive plasma produced by a plane ECR antenna" Proc. 7th Symp. on Plasma Sci. for Materials. 45-48 (1994)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] A. Takahashi: "Control of ion energy in an ECR plasma" Proc. 12th Symp. on Plasma Processing. 241-244 (1995)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] S. Hiyama: "Material processing using a large-diameter ECR plasma" Proc. 12th Symp. on Plasma Processing. 237-240 (1995)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] S. Iizuka: "Large-area etching using a plane-slotted ECR antenna plasma source" IUVSTA Int. Workshop on Plasma Sources and Surface Interactions in Materials Processing. 49 (1995)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] A. Takahashi: "Plasma production for control of surface reactions" Proc. 33th RIEC Symp. on Photo- and Plasma-Excited Processes on Surface. 57-65 (1995)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] T. Ono: "Large-diameter plasma produced by a plane-slotted ECR antenna" Plasma Sources Science and Technology. (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] S. Hiyama: "Wide-area uniform plasma processing in an ECR plasma" Plasma Sources Science and Technology. (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] A. Takahashi: "Control of ion temperature in an ECR plasma" Proc. 13th Symp. on Plasma Processing. (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] N.Sato: "Uniform plasma produced by a plane slotted antenna with magnets for electron cyclotron resonance" Applied Physics Letters. Vol.62. 1469-1471 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] S.Iizuka: "Plasma density increase in uniform ECR plasma of large diameter" Proc. 10th Symp. on Plasma Processing. 121-124 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] T.Ishida: "Production of large-diameter oxygen plasma by a plane ECR antenna" Proc. 6th Symp. on Plasma Sci. for Materials. 63-68 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] S.Iizuka: "Electron cyclotron device with permanent magnets for production of large diameter uniform plasma" Japan Journal of Applied Physics. Vol.33. 4221-4225 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] T.Ishida: "Large-diameter reactive plasma produced by a plane electron cyclotron resonance antenna" Japan Journal of Applied Physics. Vol.33. 4236-4238 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] N.Sato: "Plasma production and control for material processings" Proc. 2nd Int. Conf. on Reactive Plasmas. 531-536 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] T.Ishida: "Large-diameter reactive plasma produced by a plane ECR antenna" Proc. 2nd Int. Conf. on Reactive Plasmas. 339-342 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] S.Hiyama: "Large-diameter reactive plasma produced by a plane ECR antenna" Proc. 7th Symp. on Plasma Sci. for Materials. 45-48 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] A.Takahashi: "Control of ion energy in an ECR plasma" Proc. 12th Symp. on Plasma Processing. 241-244 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] S.Hiyama: "Material processing using a large-diameter ECR plasma" Proc. 12th Symp. on Plasma Processing. 237-240 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] S.Iizuka: "Large-area etching using a plane-slotted ECR antenna plasma source" IUVSTA Int. Workshop on Plasma Sources and Surface Interactions in Materials Processing. 49 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] A.Takahashi: "Plasma production for control of surface reactions" Proc. 33th RIEC Symp. on Photo-and Plasma-Excited Processes on Surface. 57-65 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] T.Ono: "Large-diameter plasma produced by a plane-slotted ECR antenna" Plasma Sources Science and Technology. (in press). (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] S.Hiyama: "Wide-area uniform plasma processing in an ECR plasma" Plasma Sources Science and Technology. (in press). (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] A.Takahashi: "Control of ion temperature in an ECR plasma" Proc. 13th Symp. on Plasma Processing. (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] Takeshige Ishida: "Large-diameter reactive plasma produced by a plane ECR antenna" Japan Journal of Applied Physics. 33. 4236-4238 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] Satoru Iizuka: "Electron cyclotron resonance device with permanent magnets for production of large diameter uniform plasma" Japan Journal of Applied Physics. 33. 4221-4225 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] Noriyoshi Sato: "Plasma production and control for material processing" Proceeding of the 2nd International Conference on Reactive Plasmas. 2. 531-537 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] Shin Hiyama: "Large-diameter reactive plasma produced by a plane ECR antenna" Proceeding of the 7th Symposium on Plasma Science for Materials. 7. 45-49 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] Akira Takahashi: "Control of ion energy in an ECR plasma" Proceeding of the 12th Symposium on Plasma Processing. 12. 241-244 (1995)

    • Related Report
      1994 Annual Research Report
  • [Publications] Shin Hiyama: "Material processing using a large-diameter ECR plasma" Proceeding of the 12th Symposium on Plasma Processing. 12. 237-240 (1995)

    • Related Report
      1994 Annual Research Report
  • [Publications] N.Sato: "Uniform plasma produced by a plane slotted antenna with magnets for electron cyclotron resonance" Applied Physics Letters. 62. 1469-1471 (1993)

    • Related Report
      1993 Annual Research Report
  • [Publications] S.Iizuka: "Plasma density increase in uniform ECR plasma of large diameter" Proc.of the 10th Symposium on Plasma Processing. 10. 121-124 (1993)

    • Related Report
      1993 Annual Research Report
  • [Publications] T.Ishida: "Production of large-diameter oxygen plasma by a plane ECR antenna" Proc.of the 6th Symposium on Plasma Science for Materials. 6. 63-68 (1993)

    • Related Report
      1993 Annual Research Report
  • [Publications] 中川行人: "ECR プラズマ源の特性評価とドライエッチングへの応用" 電気学会プラズマ研究会資料. EP-93-68. 29-38 (1993)

    • Related Report
      1993 Annual Research Report
  • [Publications] T.Ishida: "Large-diameter reactive plasma produced by a plane ECR antenna" Proc.of Inter.Conf.on Reactive Plasmas. 2. 339-342 (1994)

    • Related Report
      1993 Annual Research Report
  • [Publications] Y.Nakagawa: "Diameter effect on the properties of the plasma in the high density plasma source" Proc.of Inter.Conf.on Reactive Plasmas. 2. 423-426 (1994)

    • Related Report
      1993 Annual Research Report

URL: 

Published: 1993-04-01   Modified: 2016-04-21  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi