FORMATION OF DIAMOND FILMS BY PLASMA CVD USING PULSED DISCHARGE.
Project/Area Number |
05650013
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Research Category |
Grant-in-Aid for General Scientific Research (C)
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Allocation Type | Single-year Grants |
Research Field |
Applied materials science/Crystal engineering
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Research Institution | Aichi University of Education |
Principal Investigator |
NODA Mikio Aichi University of Education, Department of Integrated Sciences, Professor, 教育学部, 教授 (10024324)
|
Project Period (FY) |
1993 – 1994
|
Project Status |
Completed (Fiscal Year 1994)
|
Budget Amount *help |
¥2,200,000 (Direct Cost: ¥2,200,000)
Fiscal Year 1994: ¥700,000 (Direct Cost: ¥700,000)
Fiscal Year 1993: ¥1,500,000 (Direct Cost: ¥1,500,000)
|
Keywords | Diamond film / Plasma CVD / Pulsed discharge |
Research Abstract |
Formation of diamond films by both the intermittent and pulsed discharge DC plasma CVD have been investigated. The intermittent discharge was performed by applying half-wave-rectified voltage to electrodes, and follwing results were found. 1. Electron tempereture and density at beginning of the discharge become very high, and then crystalline quality of the diamond film deposited by the intermittent discharge become superior in comparison with that by usual continuous discharge method. (paper 1,3) 2. Carbonized layr is formed when polarity of the electrodes during the discharge is inversed, and the deposition rate and quality of the film can be improved by this treatment. (paper 4) 3. The diamond film deposited on TiN or TiC coated substrate can be peeled off from the substrate easily, and then diamond chip can be obtained by this method. (paper 2) The pulsed discharge was performed by fabricating the pulsed power supply, where the pulse repetition period and duty ratio can be changed, and the following results were found. 1. The crystalline quarity can be improved by changing the discharge method from continuous to the pulsed discharge. 2. When the repetition period increases at constant duty ratio, the crystalline quality of the deposited film become superior though the deposition rate decreases. (paper 5) 3. The crystalline quality become superior when duty ratio decreases and current peak at the beggining of the discharge is formed.
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Report
(3 results)
Research Products
(15 results)