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Detection of Exo-Electrons From a Scratch Damage of Thin Films

Research Project

Project/Area Number 05650057
Research Category

Grant-in-Aid for General Scientific Research (C)

Allocation TypeSingle-year Grants
Research Field Applied physics, general
Research InstitutionSeikei University

Principal Investigator

BABA Shigeru  Seikei University, Engineering, Professor, 工学部, 教授 (80114619)

Co-Investigator(Kenkyū-buntansha) NAKANO Takeo  Seikei University, Engineering, Research Associate, 工学部, 助手 (40237342)
Project Period (FY) 1993 – 1994
Project Status Completed (Fiscal Year 1994)
Budget Amount *help
¥2,200,000 (Direct Cost: ¥2,200,000)
Fiscal Year 1994: ¥1,000,000 (Direct Cost: ¥1,000,000)
Fiscal Year 1993: ¥1,200,000 (Direct Cost: ¥1,200,000)
KeywordsEXOELECTRON / FRACTO-EMISSION / FILM ADHESION / X-RAY PHOTOELECTRON SPECTROSCOPY / SCRATCH TEST / 薄膜 / 密着性
Research Abstract

MgO films of 200 nm thick were prepared by magnetron sputtering of MgO target in an Aratmosphere of about 2 Pa.X-ray excited photoelectron emission spectrum (XPS) of the films was measured with ESCA PHI 1600 by an excitation of x-rays of 1253.6 eV.It was found that the MgO film yielded exoelectrons, whose energy was higher than that of the incident photons, when it was subjected to the ion bombardment.
The MgO film was set in an XPS apparatus, and the surface was cleaned by the bombardment of 3 keV Ar ions at a rate of 15 mA/cm^2 for about 20 seconds until the contamination was completely removed, followed by an annealing at room temperature for 48 hours under the vacuum of 10^<-8> Pa.
Exoelectrons could be observed in the following procedure : First, Ar ions of 3 keV were irradiated on the sample surface at a rate of 15 mA/cm^2. Then the x-ray photons were irradiated to the surface and the photon excited electrons of the energy range from 1154 to 1554 eV were measured repeatedly at a rate of 15 seconds per a scan. As soon as the irradiation started, exoelectrons of uniform energy spectrum appeared but the intensity decreases monotonically with time. Any exoelectrons were not observed beyond 100 seconds, but they appeared again after quiescence (about 10 minutes) of the photon irradiation. This phenomenon of appearance, decay and recovery was observed for a few repetition of the irradiation and quiescence after the ion beam irradiation. When we increased the ion irradiation period from 30 seconds to 2 minutes, the intensity of exoelectrons increased. It is considered that atoms on the ion-bombarded film surface, which are get fixed at quasi-stable sites, are activated to relax to more stable positions with an irradiation of high energy photons. It has not been understood clearly, however, that the energy of some exoelectrons is too high and that all samples did not necessarily show the exoelectron emission characteristics.

Report

(3 results)
  • 1994 Annual Research Report   Final Research Report Summary
  • 1993 Annual Research Report
  • Research Products

    (7 results)

All Other

All Publications (7 results)

  • [Publications] Shigeru BABA, et al.: "Effect of Plasma Treatment of PTFE on the Adhesion of Au Films" Journal of Adhesion Science & Technology. 7. 457-466 (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1994 Final Research Report Summary
  • [Publications] 馬場 茂: "薄膜の付着力測定" トライボロジスト. 40. 100-104 (1995)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1994 Final Research Report Summary
  • [Publications] S.BABA et al.: "Effect of plasma treatment of PTFE on the adhesion of Au films" Journal of Adhesion Science & Technology. 7. 457-466 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1994 Final Research Report Summary
  • [Publications] S.BABA: "Adhesion Measurement of Thin Films" Tribologist (Japanese). 40. 100-104 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1994 Final Research Report Summary
  • [Publications] Shigeru BABA et al.: "Effect of plasma treatment of PTFE on the adhesion of Au films" Journal of Adhesion Science & Technology. 7. 457-466 (1993)

    • Related Report
      1994 Annual Research Report
  • [Publications] 馬場茂: "薄膜の付着力測定" トライボロジスト. 40. 100-104 (1995)

    • Related Report
      1994 Annual Research Report
  • [Publications] A.Kinbara,S.Baba,et al.: "Effect of plasma treatment of PTFE substrates on the adhesion of Au films" J.Adhesion Sci.Technol.7. 457-466 (1993)

    • Related Report
      1993 Annual Research Report

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Published: 1993-04-01   Modified: 2016-04-21  

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