Thin Film Synthesis of High-Conductive Tungsten Nitrides and Furactal Analysis
| Project/Area Number |
05650761
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| Research Category |
Grant-in-Aid for General Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Research Field |
反応・分離工学
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| Research Institution | Tokyo University of Agriculture and Technology |
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Principal Investigator |
OMI Shinzo Tokyo University of Agriculture and Technology, Graduate School of Bio-Applications and Systems Engineering, Professor, 大学院・生物システム応用科学研究科, 教授 (70016393)
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| Co-Investigator(Kenkyū-buntansha) |
NAGAI Masatoshi Tokyo University of Agriculture and Technology, Graduate School of Bio-Applicati, 大学院・生物システム応用科学研究科, 助教授 (20111635)
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| Project Period (FY) |
1993 – 1994
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| Project Status |
Completed (Fiscal Year 1994)
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| Budget Amount *help |
¥2,200,000 (Direct Cost: ¥2,200,000)
Fiscal Year 1994: ¥600,000 (Direct Cost: ¥600,000)
Fiscal Year 1993: ¥1,600,000 (Direct Cost: ¥1,600,000)
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| Keywords | Tungsten Nitride / Thin Film / Surface Analysis / Growth Parameter / Fractal Analysis / タングステン窒化物 / 成膜パラメータ |
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| Research Abstract |
1.The dependence of growth parameters (deposition temperature and gas composition) on the deposition rate of tungsten nitride was studied by chemical vapor deposition (CVD) under low pressure. Tungsten nitride (beta-W_2N) was deposited on a silicon (100) substrate in a gas mixture of WF_6-NH_3-H_2 (in Ar) at 0.12 kPa. The film of tungsten nitride was formed at temperatures of 250 to 800ﾟC.Amorphous W_2N was formed at lower temperatures, but W_2N (200) and (111) faces were preferably orientated on to silicon (100) above 500ﾟC.
2.The reaction orders for W_2N deposition were 1.0,0.65 and 0 with respect to WF_6, NH_3 and H_2, respectively. From these results, the formation of tungsten nitride is considered to be more limited by surface reaction of WF_6 with NH_3.
3.Tungsten nitride was an interstitial compound with unclear W-N bonding state.
4.Fractal analysis of the surface of Mo nitrides was performed in surface morphology and reactivity of the nitrides with varying nitriding temperature. The Fractal dimension of the surface of the Mo nitrides was increased from 2.1 to 2.5 and 2.8 with increasing nitriding temperature of 500ﾟC to 700ﾟC and 900ﾟC.The results indicated that an irregularity of the surface structure of the Mo nitrides increased with increasing nitriding temperature.
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Report
(3 results)
Research Products
(15 results)
