| Project/Area Number |
06452157
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| Research Category |
Grant-in-Aid for General Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Research Field |
機械工作・生産工学
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| Research Institution | Tokyo Institute of Technology |
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Principal Investigator |
YOSHIKAWA Masanori Tokyo Institute of Technology, Interdisciplinary Graduate School of Science and Engineering, Professor, 大学院・総合理工学研究科, 教授 (30016422)
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| Co-Investigator(Kenkyū-buntansha) |
HIRATA Atsushi Tokyo Institute of Technology, Fuculty of Engineering, Research Associate, 工学部, 助手 (50242277)
TOKURA Hitoshi Tokyo Institute of Technology, Fuculty of Engineerin, Associate Professor, 工学部, 助教授 (10016628)
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| Project Period (FY) |
1994 – 1995
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| Project Status |
Completed (Fiscal Year 1995)
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| Budget Amount *help |
¥7,200,000 (Direct Cost: ¥7,200,000)
Fiscal Year 1995: ¥1,300,000 (Direct Cost: ¥1,300,000)
Fiscal Year 1994: ¥5,900,000 (Direct Cost: ¥5,900,000)
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| Keywords | Chemical vapor deposition / Diamond / Transparency / Synthesis apparatus / Arc discharge / Plasma jet / Magnetic field |
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| Research Abstract |
Diamond films were synthesized by arc discharge plasma jet CVD that is suitable for high rate synthesis. However, this method has drawbacks such as distributions of thickness and quality occurs in diamond films. Thus, the plasma state were controled by magnetic field with a newly type of an apparatus that were designed and developed in order to study the effect of magnetic field on the shape and quality of diamond films deposited. As a result of application of magnetic field to plasma jet generated with methane, hydrogen and argon gases, the diameter of a plasma jet increases and the distributios of thickness and quality are improoved.
The deposition conditions were also discussed for synthesizing transparent diamond films. Diamond films that have high transmittance are obtained at lower methane concentration of 1% independen of nucleation density. Transmittance of the diamond film that polished with diamond wheel was measured with FTIR and was approximately 68% at the wavelength of 10mum. This transparent diamond film was found to have random orientation by X-ray diffraction analysis and less defects and impurities by the observation of the structure of its cross section. As it takes long time to synthesize thick transparent diamond films under the determined deposition conditions, CVD apparatuses need to generate a stable and long-life time plasma jet.
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