| Project/Area Number |
06452205
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| Research Category |
Grant-in-Aid for General Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Research Field |
電力工学・電気機器工学
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| Research Institution | MIYAZAKI UNIVERSITY |
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Principal Investigator |
SASAKI Wataru MIYAZAKI UNIVERSITY,FACULTY OF ENGINEERING,PROFESSOR, 工学部, 教授 (30081300)
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| Co-Investigator(Kenkyū-buntansha) |
KAWANAKA Junji MIYAZAKI UNIVERSITY,FACULTY OF ENGINEERING,RESEARCH ASSOCIATE, 工学部, 助手 (50264362)
KUBODERA Syoichi MIYAZAKI UNIVERSITY,FACULTY OF ENGINEERING,ASSOCIATE PROFESSOR, 工学部, 助教授 (00264359)
KUROSAWA Kou MIYAZAKI UNIVERSITY,FACULTY OF ENGINEERING,PROFESSOR, 工学部, 教授 (80109892)
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| Project Period (FY) |
1994 – 1995
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| Project Status |
Completed (Fiscal Year 1995)
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| Budget Amount *help |
¥6,700,000 (Direct Cost: ¥6,700,000)
Fiscal Year 1995: ¥1,600,000 (Direct Cost: ¥1,600,000)
Fiscal Year 1994: ¥5,100,000 (Direct Cost: ¥5,100,000)
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| Keywords | VUV light source / Rare gas excimer / Rare gas cluster / Discharge excitation / Lithography light source |
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| Research Abstract |
We have proposed that a method for formation of rare gas excimers by a discharge excitation of rare gas clusters which were generated in super sonic gas jet. This method has been proved experimentally by our research group in 1993, which was supported by Grant-in-Acid for Scientific Research (C).
Purposes of this project is to establish further progresses of VUV light sources using supper sonic gas jet discharges. Obtained results are as follows :
1. High output power of 9.1 mW at 126 nm for Ar, 300 mW at 147 nm for Kr and 500 mW at 172 nm for Xe were obtained, respectively.
2. The output power was increased by 2.4 times with applying magnetic fields parallel to electric field in the discharge.
3. Very wide VUV spectral region from 100 nm to 200 nm can be covered by using three kinds of rare gases, Ar, Kr and Xe.
4. Jet excimer lamps would be suitable as a lithography light source of for semiconductor processing.
5. Jet excimer lamps can be used for optical machining of some plastic materials.
As a consequence jet excimer lamps have potentialities for many practical applications such as semiconductor processing, photo-chemical processing of plastic meterials and so on.
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