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Investigation on Resistance Oscillation Induced by Direct Current Electromigration

Research Project

Project/Area Number 06452221
Research Category

Grant-in-Aid for General Scientific Research (B)

Allocation TypeSingle-year Grants
Research Field Electronic materials/Electric materials
Research InstitutionHIROSHIMA UNIVERSITY

Principal Investigator

SHINGUBARA Shoso  Hiroshima University.Engineering.Associate Professor, 工学部, 助教授 (10231367)

Co-Investigator(Kenkyū-buntansha) SAKAUE Hiroyuki  Hiroshima University.Engineering.Research Assistant, 工学部, 助手 (50221263)
HORIIKE Yasuhiro  Toyo University.Engineering.Professor, 工学部, 教授 (20209274)
Project Period (FY) 1994 – 1995
Project Status Completed (Fiscal Year 1995)
Budget Amount *help
¥7,500,000 (Direct Cost: ¥7,500,000)
Fiscal Year 1995: ¥800,000 (Direct Cost: ¥800,000)
Fiscal Year 1994: ¥6,700,000 (Direct Cost: ¥6,700,000)
KeywordsElectromigration / Resistance Oscillation / Void / Hillock / Nonlinear / Al Interconnect / Dislocation / SEM / エレクトロマイグレーション / アルミニウム配線 / ULSI / 信頼性 / 結晶粒界 / 振動 / 抵抗振動現象 / 局所性・非局所性評価 / ボイド生成消滅モデル
Research Abstract

Abrupt changes in resistance (ACRs) such as steps and oscillations are frequently observed during DC electromigration testing of Al interconnections. ACRs are observed in a interconnection which width is as large as the mean Al grain size. In vestigations are concectrated to these resistance oscillations, and it is revealed that there are two types in resistance oscillations : downward spikes and upward spikes. These spikes are further classified into quasi-periodic ones and random ones. Investigations on the current density dependence and locality and non-locality strongly suggest that origines of the upward spikes and the downward spikes are quite different. The downward spikes are local phenomena which occur within a range of several mu m, while the upward spikes are non-local phenomena which occurs in a range extending to more than several thousands mu m. A frequency of the downward spikes drastically increases with an increase in the current density, on the other hand, an amplitude increased drastically in the case of the upward spikes. It is most likely that the downward spikes correspond to the alternation of annihilation and formation of a single void, and a modeling based on the current detour effect around a high-resistance region such as a vacancy cluster well explains the current density dependence of the frequency. The mechanisms of the upward spikes are remained to be clarified, however, one possible mechanism may relate to pulsating of stress of the interconnection due to dislocation dynamics such as climb, generation and aninhilation.

Report

(3 results)
  • 1995 Annual Research Report   Final Research Report Summary
  • 1994 Annual Research Report
  • Research Products

    (17 results)

All Other

All Publications (17 results)

  • [Publications] S.Shingubara,K.Fujiki,H.Sakaue,T.Takahagi,: "Resistance Oscillations Induced by DC Electronigration" American Institute of Physics Conference Procecdings,Stress-Induced Phenomena in Metallization-Third Workshop. 373. 248-262 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] S.Shingubara,K.Fujiki,A.Sano,K.Inoue,H.Sakaue,M.Saitoh and Y.Horiike: "Resistance Oscillations Induced by Direct Current Electromigration" Jpn.J.Appl.Phys.34. 1030-1036 (1995)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] S.Shingubara,I.Utsunomiya and T,Takahagi: "Interaction of a Void and a Grain Boundaty Under a High Electric Current Stress Fmploying Three-donersional Melecular Pynamcs Simnlatuio" Applied Surface Science. 91. 220-226 (1995)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] 新宮原正三、宇都宮勇夫、藤井泰三: "アルミニウム配線中のボイドのエレクトロマイグレーション挙動の分子動力学シミュレーション" 電子情報通信学会論文誌. J78-C. 294-304 (1995)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] S.Shingubara,I.Utsunomiya and T,Fujii: "Molecnlar Dynamics Simulation of Void Electronigration Under a High-Density Electric Current Stress in an Aluminium Intercounection" Electronics and Communications in Japan. vol78 Part2. 82-95 (1995)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] S.Shingubara, K.Fujiki, H.Sakaue, T.Takahagi: ""Resistance Oscillations Induced by CD Electromigration"" Stress-Induced Phenomena in Metallization AIP Conf.Proc.Vol.373. 248-262 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] S.Shingubara, K.Fujiki, A.Sano, K.Inoue, H.Sakaue, M.Saitoh, and Y.Horiike: ""Resistance Oscillation Induced by Direct Cuttent Electromigration"" Jpn.J.Apl.Phys.vol.34. 1030-1036 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] S.Shingubara, I.Utsunomiya, and T.Takahagi: ""Interaction of a Void and a Grain Boundary Under a High Electric Current Stress Employing Three Dimensional Molecular Dynamics Simulation"" Applied Surface Scinece. vol.91. 220-226 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] S.Shingubara, I.Utsunomiya, and T.Fujii: ""Molecular Dynamics Simulation of Void Electromigration Under a High Density Electric Current Stress in an Aluminum Interconnection"" Electronics and Communications in Japan. vol.78 part 2. 82-95 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1995 Final Research Report Summary
  • [Publications] S. Shingubara, K. Fujiki, A. Sano, K. Inoue, H. Sakaue, and Y. Horiike: "Resistance Oscillations Induce by a Direct Current Electromigration" Jpn. J. Appl. Phys.34. 1030-1036 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] Shoso Shingubara, Isao Utsunomiya, and takayuki Takahagi: "Interaction of a Void and a Grain Boundary under a High Electric Current Stress Employing Three Dimensional Molecular Dynamics Simulation" Applied Surface Science. 91. 220-226 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] S. Shingubara, K. Fujiki, H. Sakaue, and T. Takahagi: "Resistance Oscillation Induced by a Direct Current Electromigration" 3rd International Workshop on Stress Induced Phenomena in Metallization. (発表予定). (1996)

    • Related Report
      1995 Annual Research Report
  • [Publications] 藤木和之: "Resistance Oscillations Induced by a Direct Current Electromigration" Japanese Journal of Applied Physics. 34. (1995)

    • Related Report
      1994 Annual Research Report
  • [Publications] 藤木和之: "Resistance Oscillations Induced by a Direct Current Electromigration" Extended Abstracts of the 1994 International Conference on Solid State Devices and Materials. 922-924 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] 新宮原正三: "Electromigration Characteristics of Cu-Al Precipitate in AlCu Interconnection" Japanese Journal of Applied Physics. 33. 3860-3863 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] 新宮原正三: "Electromigration Characteristics of Cu and Al Interconnections" Material Research Society Symposium Proceedings. 338. 441-451 (1994)

    • Related Report
      1994 Annual Research Report
  • [Publications] 新宮原正三: "Simulation of Void Dynamics Caused by Atom Migration Under High Electric Current and Stress in Metal Interconnections" Proc.of 1994 VMIC Conference. 518-520 (1994)

    • Related Report
      1994 Annual Research Report

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Published: 1994-04-01   Modified: 2016-04-21  

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