| Project/Area Number |
06554011
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| Research Category |
Grant-in-Aid for Developmental Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Research Field |
固体物性Ⅱ(磁性・金属・低温)
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| Research Institution | University of Tokyo |
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Principal Investigator |
TAMEGAI Tsuyoshi Univ.of Tokyo, Dept.of Applied Physics, Associate Professor, 大学院・工学系研究科, 助教授 (30183073)
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| Co-Investigator(Kenkyū-buntansha) |
TAKEUCHI Ryoichi Showa-Denko K.K., Chichibu Works, Researcher, 秩父工場, 研究員
USADA Masahiko Showa-Denko K.K., Chichibu Works, Researcher, 秩父工場, 研究員
SHIBAUCHI Takasada Univ.of Tokyo, Dept.of Applied Physics, Research Associate, 大学院・工学系研究科, 助手 (00251356)
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| Project Period (FY) |
1994 – 1995
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| Project Status |
Completed (Fiscal Year 1995)
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| Budget Amount *help |
¥700,000 (Direct Cost: ¥700,000)
Fiscal Year 1995: ¥700,000 (Direct Cost: ¥700,000)
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| Keywords | Scanning Hall Probe Microscope / Superconductors / Hall probe / Low Temperature / High Magnetic Field / ホール素子顕微鏡 / 微小ホール素子 / 高温超伝導体 |
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| Research Abstract |
Local field mapping in superconductors or magnetic materials, gives valuable information which can never be accessed from global magnitization measurements. In particular, in the case of superconductors, it makes it possible to discriminate anomaly originated from real vortex system from spurious one which comes from inhomogeneity of the superconductor.
In this study, we developed scanning Hall probe microscope (SHPM) by combining mechanical three dimensional scanning system and micro-Hall-probe array fabricated from ionimplanted GaAs which can be operated at low temperature under string magnetic field. All the scanning motions and Hall resistivity measurements are controlled by computer. Characteristics of the developed sSHPM are as follows.
(1)Temperature range : 1.5K-300K (It can be extended by using another cryostat)
(2)Magnetic field range : 0-9T (It can be extended by using another superconducting magnet)
(3)Spatial resolution : 10mum
(4)Magnetic field resolution : 1G
(5)Dimensions of Hall probe : 5x5mum^2 or 3x3mum^2
Using developed SHPM,we measured critical field profile of Bi_2Sr_2CaCu_2O_<8+y> and I-Bi_2Sr_2CaCu_2O_<8+y>. We also fabricated two component Hall probe using GaAs chips which are arrange in orthogonal way andmeasured two components of field in the critical state
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