巨大クラスターイオン衝撃による極端環境場を利用した超高感度材料分析

• Project/Area Number: 06J02328
• Research Category: Grant-in-Aid for JSPS Fellows
• Allocation Type: Single-year Grants
• Section: 国内
• Research Field: Nuclear engineering
• Research Institution: Kyoto University
• Principal Investigator: 二宮 啓 Kyoto University, 工学研究科, 特別研究員(PD)
• Project Period (FY): 2006 – 2008
• Project Status: Completed (Fiscal Year 2008)
• Budget Amount: ¥3,400,000 (Direct Cost: ¥3,400,000); Fiscal Year 2008: ¥1,100,000 (Direct Cost: ¥1,100,000); Fiscal Year 2007: ¥1,100,000 (Direct Cost: ¥1,100,000); Fiscal Year 2006: ¥1,200,000 (Direct Cost: ¥1,200,000)
• Keywords: 質量分析 / クラスター / 二次イオン / 深さ方向分析

Research Abstract

二次イオン質量分析法(SIMS)は重要な表面分析法の1つであるが、近年半導体や金属材料においては表面局所分析の感度向上や数ナノメートルオーダの深さ方向分解能が要求され、また有機無機の混在する多層膜や生体組織中の生体高分子についてはそれらの分子を破壊することなくイオン化することも求められている。しかし既存のSIMS装置でプローブとして使われている単原子や二原子分子のイオンビームを用いる限り、これまでのSIMS分析の性能向上や有機物でのSIMSによる深さ方向分析は原理的に不可能であった。本研究ではそれらの現状を打破する技術としてサイズが数100原子以上の巨大クラスターをプローブとして用いることを提唱している。第3年度目の研究では有機物試料で実際にSIMSによる深さ方向分析を実施するため、ビームスキャン用ディフレクタを設置し、かつエッチングと分析を連続的に行なえるシステムを構築した。実験ではITO/GLASS基板上にスピンコーティング法により作製したPoly methyl methacrylate、Polystyrene、Polycarbonate等の代表的な高分子薄膜試料(膜厚は数10nmから100nm程度)や真空蒸着法により作製した有機物半導体材料からなる多層膜試料を5.5keVのArクラスタービームを用いて分析した。この実験ではエッチングを続けても有機物試料と基板との界面に到達するまで二次イオン強度は一定を維持し、界面に到達した後ではそのシグナルは速やかに減少した。少なくとも二桁以上のダイナミックレンジが得られたため、有機物試料と基板との界面は容易に判別可能であった。また深さ方向分解能の指標となる二次イオン強度の84-16%遷移距離は10nm以下と非常に高い深さ方向分解能が得られることも判明した。

Research Products

• [Journal Article] Precise and fast SIMS depth profiling of polymer materials with large Ar cluster ion beams (2009)
  • Author(s): S. Ninomiya, K. Ichiki, H. Yamada, Y. Nakata, T. Seki, T. Aoki, J. Matsuo
  • Journal Title: Rapid Communications in Mass Spectrometry (in press)
  • Peer Reviewed
• [Journal Article] SIMS Depth Profiling of Organic Materials with Ar Cluster Ion Beam (2009)
  • Author(s): S. Ninomiya, K. Ichiki, H. Yamada, Y. Nakata, T. Seki, T. Aoki, J. Matsuo
  • Journal Title: Transactions of the Materials Research Society of Japan accepted
  • Peer Reviewed
• [Journal Article] The emission process of secondary ions from solids bombarded with large gas cluster ions (2009)
  • Author(s): S. Ninomiya, K. Ichiki, T. Seki, T. Aoki, J. Matsuo
  • Journal Title: Nuclear Instruments and Methods in Physics Research B accepted
  • Peer Reviewed
• [Journal Article] Low Damage Etching of Polymer Materials for Depth Profile Analysis Using Large Ar Cluster Ion Beam (2009)
  • Author(s): S. Ninomiya, K. Ichiki, H. Yamada, Y. Nakata, T. Seki, T. Aoki, J. Matsuo
  • Journal Title: Journal of Surface Analysis 15, No.3 Pages: 275-278
  • Peer Reviewed
• [Journal Article] Size-selected High Density Large Gas Cluster Ion Beam Irradiation (2009)
  • Author(s): K. Ichiki, S. Ninomiya, T. Seki, T. Aoki, J. Matsuo
  • Journal Title: Transactions of the Materials Research Society of Japan accepted
  • Peer Reviewed
• [Journal Article] Processing Techniques of Biomaterials : Using Gas Cluster Ion Beam for Imaging Mass Spectrometry (2009)
  • Author(s): H. Yamada, K. Ichiki, Y. Nakata, S. Ninomiya, T. Seki, T. Aoki, J. Matsuo
  • Journal Title: Transactions of the Materials Research Society of Japan accepted
  • Peer Reviewed
• [Journal Article] A Processing Technique of Cell Surface Using Gas Cluster Ions for Imaging Mass Spectrometry (2009)
  • Author(s): H. Yamada, K. Ichiki, Y. Nakata, S. Ninomiya, T. Seki, T. Aoki, J. Matsuo
  • Journal Title: Journal of the Mass Spectrometry Society of Japan accepted
  • Peer Reviewed
• [Journal Article] Imaging Mass Spectrometry with Nuclear Microprobes for Biological Applications (2009)
  • Author(s): Y. Nakata, H. Yamada, Y. Honda, S. Ninomiya, T. Seki, T. Aoki, J. Matsuo
  • Journal Title: Nuclear Instruments and Methods in Physics Research B (in press)
  • Peer Reviewed
• [Journal Article] Study of crater formation and sputtering process with largegas cluster impact by molecular dynamics simulations (2009)
  • Author(s): T. Aoki, T. Seki, S. Ninomiya, K. Ichiki. J. Matsuo
  • Journal Title: Nuclear Instruments and Methods in Physics Research B (in press)
  • Peer Reviewed
• [Journal Article] Matrix-free high-resolution imaging mass spectrometry with high-energy ion projectiles (2009)
  • Author(s): Y. Nakata, Y. Honda, S. Ninomiya, T. Seki, T. Aoki, J. Matsuo
  • Journal Title: Journal of Mass Spectrometry 44 Pages: 128-136
  • Peer Reviewed
• [Journal Article] Low Damage Etching and SIMS Depth Profiling with Large Ar Cluster Ions (2008)
  • Author(s): S. Ninomiya, K. Ichiki, H. Yamada, Y. Nakata, Y. Honda, T. Seki, T. Aoki, J. Matsuo
  • Journal Title: Transactions of the Materials Research Society of Japan 33[4] Pages: 1043-1046
  • Peer Reviewed
• [Journal Article] A fragment-free ionization technique for organic mass spectrometry with large Ar cluster ions (2008)
  • Author(s): S. Ninomiya, Y. Nakata, Y. Honda, K. Ichiki, T. Seki, T. Aoki, J. Matsuo
  • Journal Title: Applied Surface Science 255 Pages: 1588-1590
  • Peer Reviewed
• [Journal Article] Secondary ion emission from Si bombarded with large Ar cluster ions under UHV conditions (2008)
  • Author(s): S. Ninomiya, K. Ichiki, Y. Nakata, Y. Honda, T. Seki, T. Aoki, J. Matsuo
  • Journal Title: Applied Surface Science 255 Pages: 880-882
  • Peer Reviewed
• [Journal Article] SIMS Analysis of Biological Mixtures with Fast Heavy Ion Irradiation (2008)
  • Author(s): Y. Honda, Y. Nakata, S. Ninomiya, T. Seki, T. Aoki, J. Matsuo
  • Journal Title: Transactions of the Materials Research Society of Japan 33[4] Pages: 1039-1041
  • Peer Reviewed
• [Journal Article] What size of cluster is most appropriate for SIMS? (2008)
  • Author(s): J. Matsuo, S. Ninomiya, Y. Nakata, Y. Honda, K. Ichiki, T. Seki, T. Aoki
  • Journal Title: Applied Surface Science 255 Pages: 1235-1238
  • Peer Reviewed
• [Journal Article] MD simulation study of the sputtering process by high-energygas cluster impact (2008)
  • Author(s): T. Aoki, T. Seki, S. Ninomiya, J. Matsuo
  • Journal Title: Applied Surface Science 255 Pages: 944-947
  • Peer Reviewed
• [Journal Article] High sputtering yields of organic compounds by large gas cluster ions (2008)
  • Author(s): K. Ichiki, S. Ninomiya, Y. Nakata, Y. Honda, T. Seki, T. Aoki, J. Matsuo
  • Journal Title: Applied Surface Science 255 Pages: 1148-1150
  • Peer Reviewed
• [Journal Article] Yield enhancement of molecular ions with MeV ion-induced electronic excitation (2008)
  • Author(s): Y. Nakata, Y. Honda, S. Ninomiya, T. Seki. T. Aoki, J. Matsuo
  • Journal Title: Applied Surface Science 255 Pages: 1591-1594
  • Peer Reviewed
• [Journal Article] 高速重イオンを利用したイメージング質量分析 (2008)
  • Author(s): 中田由彦, 山田英丙, 本田善郎, 二宮啓, 瀬木利夫, 青木学聡, 松尾二郎
  • Journal Title: Journal of the Mass Spectrometry Society of Japan 56(4) Pages: 201-208
  • NAID: 10024283402
  • Peer Reviewed
• [Journal Article] Recent Progress in Cluster Ion Beam-Towards Nano-Processing and Advanced Material Analysis (クラスターイオンの新しい展開〜ナノプロセスから先端分析応用〜) (2008)
  • Author(s): J. Matsuo, S. Ninomiya, T. Aoki, T. Seki
  • Journal Title: Journal of Surface Analysis 14, No.3 Pages: 196-203
  • Peer Reviewed
• [Journal Article] The Effect of Incident Ion Size on Secondary Ion Yields Produced from Si (2007)
  • Author(s): S.Ninonliya
  • Journal Title: Transactions of the Materials Research Society of Japan 32[4] Pages: 895-898
  • Peer Reviewed
• [Journal Article] Ionization and low damage etching of soft materials with slow Ar cluster ions (2007)
  • Author(s): S.Ninomiya
  • Journal Title: Extended Abs tracts of 8th Workshop on Cluster Ion Beam Technology Pages: 41-46
• [Journal Article] Ion-Induced Emission of Amino Acid Molecular Ions from Thin Films (2007)
  • Author(s): Y.Nakata
  • Journal Title: Transactions of the Materials Research Society of Japan 32[4] Pages: 899-901
  • Peer Reviewed
• [Journal Article] Molecular dynamics study of monomer and dimer emission processes with high energy gas cluster ion impact (2007)
  • Author(s): T.Aoki
  • Journal Title: Surface & Coatings Technology 201 Pages: 8427-8430
  • Peer Reviewed
• [Journal Article] Size effect in cluster collision on solid surfaces (2007)
  • Author(s): J.Matsuo
  • Journal Title: Nuclear Instruments and Methods in Physics Research B 257 Pages: 627-631
  • Peer Reviewed
• [Journal Article] The effect of incident cluster ion energy and size on secondary ion yields emitted from Si (2007)
  • Author(s): Satoshi Ninomiya
  • Journal Title: Nuclear Instruments and Methods in Physics Research B 256 Pages: 528-531
• [Journal Article] Measurements of secondary ions emitted from organic compounds bombarded with large gas cluster ions (2007)
  • Author(s): Satoshi Ninomiya
  • Journal Title: Nuclear Instruments and Methods in Physics Research B 256 Pages: 493-496
• [Journal Article] Surface oxidation of Si assisted by irradiation with large gas cluster ion beam in an oxygen atmosphere (2007)
  • Author(s): Kazuya Ichiki
  • Journal Title: Nuclear Instruments and Methods in Physics Research B 256 Pages: 350-353
• [Journal Article] Secondary ion emission from bio-molecular thin films under ion bombardment (2007)
  • Author(s): Yoshihiko Nakata
  • Journal Title: Nuclear Instruments and Methods in Physics Research B 256 Pages: 489-492
• [Journal Article] Secondary ion measurements for oxygen cluster ion SIMS (2006)
  • Author(s): Satoshi Ninomiya
  • Journal Title: Applied Surface Science 252 Pages: 7290-7292
• [Journal Article] High-intensity Si cluster ion emission from a silicon target bombarded with large Ar cluster ions (2006)
  • Author(s): Satoshi Ninomiya
  • Journal Title: Applied Surface Science 252 Pages: 6550-6553
• [Presentation] Arクラスターイオンによるポリマー試料のSIMS深さ方向分析 (2009)
  • Author(s): 二宮啓
  • Organizer: 第56回応用物理学関係連合講演会
  • Place of Presentation: 筑波大
  • Year and Date: 2009-03-30
• [Presentation] Low Damage Etching of Polymer Materials for Depth Profile Analysis Using Large Ar Cluster Ion Beam (2009)
  • Author(s): Satoshi Ninomiya
  • Organizer: The international workshop for Surface Analysis and Standardization' 09 (iSAS09)
  • Place of Presentation: Okinawa Convention Center, Okinawa
  • Year and Date: 2009-03-18
• [Presentation] SIMS depth profiling of organic films with Ar cluster ion beams (2009)
  • Author(s): 二宮啓
  • Organizer: 9th Workshop on Cluster Ion Beam Technology
  • Place of Presentation: AIST, Tokyo Waterfront
  • Year and Date: 2009-03-12
• [Presentation] SIMS Depth Profiling of Organic Materials with Ar Cluster Ion Beam (2008)
  • Author(s): Satoshi Ninomiya
  • Organizer: The IUMRS International Conference in Asia 2008 (IUMRS-ICA2008)
  • Place of Presentation: Nagoya Congress Center, Nagoya
  • Year and Date: 2008-12-10
• [Presentation] 巨大クラスターイオンを用いたポリマー材料の二次イオン測定 (2008)
  • Author(s): 二宮啓
  • Organizer: 第69回応用物理学会学術講演会
  • Place of Presentation: 中部大
  • Year and Date: 2008-09-03
• [Presentation] ArクラスターSIMSによる有機EL薄膜の深さ方向分析 (2008)
  • Author(s): 二宮啓
  • Organizer: 第69回応用物理学会学術講演会
  • Place of Presentation: 中部大
  • Year and Date: 2008-09-02
• [Presentation] Emission process of secondary ions from solids with large gas cluster ions (2008)
  • Author(s): Satoshi Ninomiya
  • Organizer: 23rd International Conference on Atomic Collisions in Solids (ICACS23)
  • Place of Presentation: Phalaborwa, South Africa
  • Year and Date: 2008-08-19
• [Presentation] High-rate and low-damage etching of organic materials with large gas cluster ions (2008)
  • Author(s): Satoshi Ninomiya
  • Organizer: 21st Annual SIMS Workshop
  • Place of Presentation: San Antonio, Texas, USA
  • Year and Date: 2008-05-15
• [Presentation] 超高真空下における巨クラスターイオン照射による二次イオン測定 (2008)
  • Author(s): 二宮 啓
  • Organizer: 第55回応用物理学会関係連合講演会
  • Place of Presentation: 日本大学理工船橋
  • Year and Date: 2008-03-29
• [Presentation] 巨大Arクラスター衝突によりSiから生成される二次イオンにおける入射速度効果 (2008)
  • Author(s): 二宮 啓
  • Organizer: 日本物理学会2008年春季大会
  • Place of Presentation: 近畿大
  • Year and Date: 2008-03-23
• [Presentation] Low damage etching and SIMS depth profiling wlth large Ar cluster ions (2007)
  • Author(s): S.Ninomiya
  • Organizer: 第18回日本MRS学術シンポジウム
  • Place of Presentation: 日本大学理工駿河台
  • Year and Date: 2007-12-09
• [Presentation] Ionization and low damage etching of soft materials with slow Ar cluster ions (2007)
  • Author(s): S.Ninomiya
  • Organizer: 8th Workshop on Cluster Ion Beam Technology
  • Place of Presentation: AIST Tokyo, Waterfront
  • Year and Date: 2007-11-09
• [Presentation] Secondary ion emission from Si bombarede with large Ar cluster ions under UHV conditions (2007)
  • Author(s): S.Ninomiya
  • Organizer: 16th International Conference on Secondary Ion Mass Spectrometry(SIMS XVI)
  • Place of Presentation: Kanazawa, Ishikawa Ongakudo
  • Year and Date: 2007-10-31
• [Presentation] A fragment-free ionization technique fororganic mass spectrometry with large Ar cluster ions (2007)
  • Author(s): S.Ninomiya
  • Organizer: 16th International Conference on Secondary Ion Mass Spectrometry(SIMS XVI)
  • Place of Presentation: Kanazawa,Ishikawa Ongakudo
  • Year and Date: 2007-10-29
• [Presentation] 生体局分子試料の二次イオン質量分析における入射クラスターイオンの最適化 (2007)
  • Author(s): 二宮 啓
  • Organizer: 第68回応用物理学会学術講演会
  • Place of Presentation: 北海道工業大
  • Year and Date: 2007-09-04
• [Presentation] Arクラスターイオン照射を用いた生体局分子試料のフラグメン1トフリーイオン化 (2007)
  • Author(s): 二宮 啓
  • Organizer: 第68回応用物理学会学術講演会
  • Place of Presentation: 北海道工業大
  • Year and Date: 2007-09-04
• [Presentation] サイズ選別した巨大アルゴンクラスターイオン衝撃による生体局分子試料の二次イオン測定 (2007)
  • Author(s): 二宮 啓
  • Organizer: 第55回質量分析総合討論会
  • Place of Presentation: 広島国際会議場
  • Year and Date: 2007-05-18
• [Presentation] The Effect of Incident Velocity on Secondary Ion Emission from Si and Arginine with Large Ar Cluster Ions (2007)
  • Author(s): S.Ninomiya
  • Organizer: 44th IUVSTA Workshop: Sputtering and Ion Emission by Cluster Ion Beams
  • Place of Presentation: Scotland,UK
  • Year and Date: 2007-04-23
• [Remarks]
  • URL: http://sakura.nucleng.kyoto-u.ac.jp/
• [Remarks]
  • URL: http://sakura.nucleng.kyoto-u.ac.jp/