| Project/Area Number |
07455294
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Material processing/treatments
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| Research Institution | HOKKAIDO INSTITUTE OF TECHNOLOGY |
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Principal Investigator |
YAMAMOTO Tsuyoshi HOKKAIDO INSTITUTE OF TECHNOLOGY,FACULTY OF ENGINEERING,DEPARTMENT OF ENGINEERING,PROFESSOR, 工学部・機械工学科, 教授 (20048036)
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| Co-Investigator(Kenkyū-buntansha) |
TAKASHIMA Toshiyuki HOKKAIDO INSTITUTE OF TECHNOLOGY,FACULTY OF ENGINEERING,DEPERTMENT OF ENGINEERIN, 工学部・機械工学科, 講師 (20094815)
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| Project Period (FY) |
1995 – 1996
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| Project Status |
Completed (Fiscal Year 1996)
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| Budget Amount *help |
¥6,800,000 (Direct Cost: ¥6,800,000)
Fiscal Year 1996: ¥500,000 (Direct Cost: ¥500,000)
Fiscal Year 1995: ¥6,300,000 (Direct Cost: ¥6,300,000)
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| Keywords | Silicon-Nitride Ceramics / Ceramics-Metals Bonding / Solid-state Bonding / Heat-resisting Bonding / Chromium Plating / Chromium-Nitride / クロム窒化物 / クロムめっきニッケル板 / クロム窒化物層 / 窒化ケイ素 / 耐熱接合 |
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| Research Abstract |
The summary of the results of this research is shhown below.
In the case bonded under low pressure, there is a slight time lag in the formation of reaction layrs, but there is no influence on the structure itself of reaction layres. There is a little difference in the structure of reaction layrs for different silicon-nitride ceramics bonded at abobu 1403K.The fracture bending strength of Si_3N_4/SUS304 couple bonded with the insert Cr-plated 2.0-3.5mum in thick showed the maxmum of 440MPa at room temperature. At early stage of the heating to bond at less than 1423K,Ni-Cr solid-solution at Ni side, Cr_2N at the interface of Ni and Cr-plating layr and Ni-Cr-Si ternary alloy at near the bonding interface were formed respectively. Thereafter, Cr_2N transforms to CrN and the mixed phase with CrN, (Cr_3Si) and Ni- (Si) alloy were formed at bonding interface. The thickness of this mixed phase depend on the thickness of Cr-plating. After disappearance of Cr as a plating layr as a result of the formation of reaction layrs, Ni-Cr-Si ternary eutectic alloy of low melting temperature is formde by the another reaction with diffused Ni through the mixed phases to Si_3N_4, so that this alloy phase fuses and Si_3N_4 are aggressively attacked and CrN phases already formed aer decomposde. On the bonding at 1473K,the close condensed CrN phases including little Ni- (Si) alloy are formed at bonding interface, so that the formation of fused phases are suppressed. A similar close condensed CrN phases can form by using a previously annealed Cr-plating Ni sheet as a insert. As a result of this research, it was found that there is a possibility of higher grade heat-resisting bonding using a insert with dual layr plating of Ni and Cr on Mo plate.
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