Vapor-Phase Preparation of Carbonaceous Materials Using Activated Fluorine Species
| Project/Area Number |
07455426
|
|---|
| Research Category |
Grant-in-Aid for Scientific Research (B)
|
| Allocation Type | Single-year Grants |
|---|
| Section | 一般 |
|---|
| Research Field |
Inorganic materials/Physical properties
|
|---|
| Research Institution | KYOTO UNIVERSITY |
|---|
Principal Investigator |
OGUMI Zempachi Kyoto University, Graduate School of Engineering Professor, 工学研究科, 教授 (60110764)
|
|---|
| Co-Investigator(Kenkyū-buntansha) |
INABA Minoru Kyoto University, Graduate School of Engineering Instructor, 工学研究科, 助手 (80243046)
|
|---|
| Project Period (FY) |
1995 – 1996
|
| Project Status |
Completed (Fiscal Year 1996)
|
| Budget Amount *help |
¥500,000 (Direct Cost: ¥500,000)
Fiscal Year 1996: ¥500,000 (Direct Cost: ¥500,000)
|
|---|
| Keywords | Activated fluorine species / Vapor-phase reaction / Plasma / Carbon / Thin film / Nitrogen trifluoride / Quadrupole mass spectroscopy / Benzene |
|---|
| Research Abstract |
The aim of this research is to develop a novel method for vapor-phase preparation of carbonaceous materials at temperatures lower than those used in conventional methods. Activated fluorine species was obtained by decomposition of nitrogen trifluoride (NF_3) in plasma, and was used to activate the decomosition process of hydrocarbon. The decomposition mechanism in the presence of NF_3 was analyzed by quadrupole mass spectroscopy (QMS). Major findings are as follows :
1.Vapor-phase preparation of carbonaceous materials
Benzene was used as a carbon source for thin film. In the presence of NF_3, deposition rate of carbonaceous film increased significantly when compared with that in the absence of NF_3. Carbonaceous thin films can be obtained even at a low temperature of 400ﾟC.Glass plate substrates gave carbonaceous films of flat surface, wheresas nickel plate substrates resulted in rough surface. When the temperature of the substrate was increased, deposition rate decreased. Carbonaceous films with best quality was obtained by vaporphase reaction at 700ﾟC.When the plasma power was increased, the crystallinity of the resulting films increased, whereas the deposition rate decreased.
2.Analysis by QMS
QMS analysis revealed that activated fluorine species was released by decomposition of NF_3, and this active species substitutes the hydrogen of benzene to form fluorobenzene. Flurobenzene decomposes more easily than benzene, resulting in the observed enhancement of deposition rate.
|
Report
(3 results)
Research Products
(3 results)
