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Characterization of new ultra-hardness material-carbon nitride and rhombohedral boron nitride syntesized using electron cycrotron resonance plasma

Research Project

Project/Area Number 07455429
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Metal making engineering
Research InstitutionNagaoka University of Technology

Principal Investigator

OHSHIO Shigeo  Nagaoka University of Technology, Faculty of Engineering, Research Assistant, 工学部, 教務職員 (90160473)

Co-Investigator(Kenkyū-buntansha) MARUYAMA Kazunori  Nagaoka University of Technology, Faculty of Engineering, Associate Professor, 工学部, 助教授 (00143826)
SAITOH Hidetoshi  Nagaoka University of Technology, Faculty of Engineering, Associate Professor, 工学部, 助教授 (80250984)
Project Period (FY) 1995 – 1997
Project Status Completed (Fiscal Year 1997)
Budget Amount *help
¥800,000 (Direct Cost: ¥800,000)
Fiscal Year 1997: ¥400,000 (Direct Cost: ¥400,000)
Fiscal Year 1996: ¥400,000 (Direct Cost: ¥400,000)
KeywordsCarbon nitride film / Boron nitrde film / ECR plasma / CVD / DLC / Strain rate sensitivity exponent / Indentation creep test / Random Covalent Networks Theory / r.f.プラズマCVD / X線光電子分光法 / 赤外分光分析法 / CVD / PVD / Randoor.Covalent Networks理論 / ラマン散乱分光法 / 微小硬さ試験法
Research Abstract

In this study. carbon nitride films and boron nitride films werr produced and characteized to investigate new function of these films. Raman scattering analysis reveals that the amorphous carbon nitride films deposited using an electron cycrotron resonancc (ECR) plasma enhanced chemical vapor deposition (CVD) apparatus had dianond-like carbon (DLC) structure as a fundamental structure. The relative nitrogen fraction [N] / ([N]+[C]) of the resulting films were 0.08 as a macimum value at every experimental conditions. IR spectra analysis reveals that nitrtogen atoms were substituted for carbon atoms or terminated carbon dangling bonds. Nitrogen containing carbon films deposited using an ion beam sputtering method or a magnetron sputtering method had DLC structure as the fundamental structure. The relative nitrogen fraction [N] / ([N] + [C]) of the resulting films were restricted to valus of 0.08. These results strongly suggest that the nirogen composition in the resulting films were rest … More ricted with fundamental structure of the felms and independent upon synthetic process. Theoretical composition of nirtogen calculated using the random covalent network theory was good agreement with experimental resuits. Therefore nitrogen composition in nitrogen-containing carbon films were found to be restricted to structrual factor.
An indentation creep test has been performed to investigate the namo-structure changing of nitrogen-containing carbon films. It was found that viscous flow of the nitrogen-containing carbon films were promoted as compared with the films without nitrogen. Furthermore the critical force of the viscous flow beginning was decreased with the presence of the -C=N bond. This nano-indentation creep technique was found to be the effective technique in evaluation of nano-structure changing of the films.
We have also produced boron nitride films using an r.f.plasma CVD method from BCl_3 and N_2 gas. Resulting films were found to be boron-rich composition. B-N bonds were found to form sp^2 bond from IR spectra. Hardness of the resulting films determined by an ultralow-load micro-hardness indenter were about 20GPa. The strain rate sensitivity exponent (m-value) detemined by an indentation creep test was 0.005-0.008. This value was found to be similar to DLC or glass. Less

Report

(4 results)
  • 1997 Annual Research Report   Final Research Report Summary
  • 1996 Annual Research Report
  • 1995 Annual Research Report
  • Research Products

    (4 results)

All Other

All Publications (4 results)

  • [Publications] Daisuke TANAKA: "Indentation Creep of Nitrogen-Containing Carbon Films" Japanese Journal of Applied Physics. 35. L1452-L1454 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] Daisuke TANAKA: "Indentation Creep of Nitrogen-Containing Carbon Films" Japanese Jouranal of Applied Physics. 35. L1452-L1454 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] Daisuke TANAKA: "Indentation Creep of Nitrogen-Containing Carbon Films" Japanese Journal of Applied Physics. 35. L1452-L1454 (1996)

    • Related Report
      1997 Annual Research Report
  • [Publications] Daisuke TANAKA: "Indentation Creep of Nitrogen-Containing Carbon Films" Japanese Journal of Applied Physics. 35. L1452-L1454 (1996)

    • Related Report
      1996 Annual Research Report

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Published: 1996-04-01   Modified: 2016-04-21  

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