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Study on effect of discharge frequency on particle growth in high frequency plasma.

Research Project

Project/Area Number 07458093
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field プラズマ理工学
Research InstitutionKYUSHU UNIVERSITY

Principal Investigator

WATANABE Yukio  KYUSHU UNIVERSITY,GRADUATE SCHOOL OF INFORMATION SCIENCE AND ELECTRICAL ENGINEERING,PROFESSOR, 大学院・システム情報科学研究科, 教授 (80037902)

Co-Investigator(Kenkyū-buntansha) FUKUZAWA Tsuyoshi  KYUSHU UNIVERSITY,GRADUATE SCHOOL OF INFORMATION SCIENCE AND ELECTRICAL ENGINEER, 大学院・システム情報科学研究科, 助手 (70243904)
KAWASAKI Hiroharu  KYUSHU UNIVERSITY,GRADUATE SCHOOL OF INFORMATION SCIENCE AND ELECTRICAL ENGINEER, 大学院・システム情報科学研究科, 助手 (10253494)
白谷 正治  九州大学, 工学部, 助教授 (90206293)
Project Period (FY) 1995 – 1996
Project Status Completed (Fiscal Year 1996)
Budget Amount *help
¥1,600,000 (Direct Cost: ¥1,600,000)
Fiscal Year 1996: ¥1,600,000 (Direct Cost: ¥1,600,000)
Keywordsparticles / dust / discharge frequency dependence / silane plasma / high frequency plasma / coagulation / plasma CVD / パーティクル / 放電周波数 / VHFプラズマ
Research Abstract

Discharge frequency dependence of growth processes of particles in silane rf discharges have been studied in a size range above a few nanometers as parameters of discharge frequency. A seies of experiments have given the following results : particles nucleate and grow around the plasma/sheath boundary by the rf electrode for all discharge frequencies ; increasing the discharge frequency under a constant power, a growth rate of particles in the rapid growth phase decreases, while they begin to be observed earlier after the discharge initiation due to the increase in their density ; a density of particles of -10nm in size is comparable to or even higher than that of ions, and hence almost of them are neutral. These results can not be explained by the conventional thermal coagulation model, suggesting that high energy electrons above several 10's eV play an important role to ionize a part of neutral particles in their rapid growth. In order to explain properly most of these exprimental features, a particle coagulation model is proposed.

Report

(3 results)
  • 1996 Annual Research Report   Final Research Report Summary
  • 1995 Annual Research Report
  • Research Products

    (29 results)

All Other

All Publications (29 results)

  • [Publications] Yukio Watanabe: "Growth processes of particles in high frequency silane plasmas" J.Vac.Sci.Technol.A. 14,2. 540-545 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] Masaharu Shiratani: "In-situ polarization-sensitive laser-light scattering method for simultanious measurements of two dimensional spatial size and density distributions of particles in plasmas" J.Vac.Sci.Technol.A. 14,2. 603-607 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] 渡辺征夫: "プラズマ化学気相堆積技術における微粒子発生メカニズムとその応用" 応用物理. 65,6. 594-600 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] Yukio Watanabe: "Contribution of short lifetime radicals to growth of particles in SiH_4 HF discharges and effects of particles on deposited films" J.Vac.Sci.& Technol.A. 14,3. 995-1001 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] Masaharu Shiratani: "Simultaneous in-situ measurements of properties in rf silane plasmas using a polarization-sensitive laser-light-scattering method" L.Appl.Phys.79,1. 104-109 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] Hiroharu Kawasaki: "Study on Growth Processes of Particles in rf SiH_4 Plasmas" Proc.3rd Int.Conf.Reactive Plasma/14th Symp.Plasma Processes. 3. 351-352 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] H.Kawasaki, Y.Ueda, T.Yoshioka, T.Fukuzawa, M.Shiratani and Y.Watanabe: "Discharge frequency dependences of particulate growth in high frequency silane plasmas" Appl. Phys. Lett.Vol.67. 3880-3882 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] M.Shiratani, H.Kawasaki, T.Fukuzawa, T.Yoshioka, Y.Ueda, S.Singh and Y.Watanabe: "Simultaneous in-situ measurements of properties in rf silane plasmas using a polarization-sensitive laser-light-scattering method" J.Appl. Phys.Vol.79. 104-109 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] Y.Watanabe, M.Shiratani, H.Kawasaki, S.Singh, T.Fukuzawa, Y.Ueda and H.Ohkura: "Growth processes of particles in high frequency silane plasmas" J.Vac. Sci. & Technol. A. Vol.14. 540-545 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] Y.Watanabe, M.Shiratani, T.Fukuzawa, H.Kawasaki, Y.Ueda, S.Singh and H.Ohkura: "Contribution of short lifetime radicals to growth of particles in SiH_4 HF discharges and effects of particles on deposited films" J.Vac. Sci. & Technol. A. Vol.14. 995-1001 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] Y.Watanabe: "Generation mechanism of particles in plasma chemical vapor deposition and its application" Oyo Butsuri. Vol.65. 594-600 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1996 Final Research Report Summary
  • [Publications] Yukio Watanabe: "Growth processes of particles in high frequency silane plasmas" J.Vac.Sci.Technol.A. 14,2. 540-545 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] Masaharu Shiratani: "In-situ polarization-sensitive laser-light scattering method for simultanious measurements of two dimensional spatial size and density distributions of particles in plasmas" J.Vac.Sci.Technol.A. 14,2. 603-607 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] 渡辺征夫: "プラズマ化学気相堆積技術における微粒子発生メカニズムとその応用" 応用物理. 65,6. 594-600 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] Masaharu Shiratani: "Two dimensional spatial profiles of size and density of particulates grown in rf silane plasmas" IEEE Trans.Plasma Sci.24,1. 99-100 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] Masaharu Shiratani: "Production of Size-Controlled Si Fine Particles Using Pulsed RF Discharge" Surf.Rev.Lett.3,1. 75-78 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] Hiroharu Kawasaki: "Study on Growth Processes of Particles in rf SiH_4 Plasmas" Proc.3rd Int.Conf.Reactive Plasma/14th Symp.Plasma Processes. 3. 351-352 (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] Yukio Watanabe: "Contribution of short lifetime radicals to growth of particles in SiH_4 HF discharges and effects of particles on deposited films" Journal of Vacuum Science & Technology.

    • Related Report
      1995 Annual Research Report
  • [Publications] Yukio Watanabe: "Growth processes of particles in high frequency silane plasmas" Journal of Vacum Science & Technology.

    • Related Report
      1995 Annual Research Report
  • [Publications] Masaharu Shiratani: "In-situ polarization-senstive laser-light scattering method for simultanious measurements of two dimensional spatial size and density distributions of particles in plasmas" Journal of Vacum Science & Technology.

    • Related Report
      1995 Annual Research Report
  • [Publications] Masaharu Shiratani: "Two dimensional spatial profiles of particle size and density of particulates grown in rf silane plasmas" Surface Review and Letters.

    • Related Report
      1995 Annual Research Report
  • [Publications] Masaharu Shiratani: "Simultanious in-situ measurementof properties in rf silane plasmas using a polarization-sensitive laser-light-scattering method" Surface Review and Letters.

    • Related Report
      1995 Annual Research Report
  • [Publications] 渡辺征夫: "プラズマCVD半導体プロセスにおける微粒子の発生と測定" 日本エアロゾル学会. 10. 13-19 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] 川崎仁晴: "Effects of discharge frequency on growth processes of particulates in rf silane plasmas." Proceedings of the 12th Symposium on Plasma Processing. 12. 389-392 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] 川崎仁晴: "微粒子発生を伴う高周波シランプラズマに及ぼす放電周波数の影響" 電気学会プラズマ研究会資料. 63-72 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] 川崎仁晴: "高周波シランプラズマ中微粒子の成長過程と放電周波数の関係" 第42回応用物理学関係連合講演会講演予稿集. 29- (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] 小畑考司: "高周波シランプラズマ中の電子・正イオン・負帯電粒子密度に及ぼす放電周波数の影響" 電気関係学会九州支部連合大会講演論文集. 192- (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] S. Singh: "Rapid growth process of particleles in HF plasma" 応用物理学会九州支部講演会講演予稿集. 21. 123-124 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] Hiroharu Kawasaki: "Discharge frequency dependence of particulate growth in high frequency silane plasmas" Applied Physics Letters. 67. 3880-3882 (1995)

    • Related Report
      1995 Annual Research Report

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Published: 1996-04-01   Modified: 2016-04-21  

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