|Budget Amount *help
¥6,500,000 (Direct Cost: ¥6,500,000)
Fiscal Year 1997: ¥600,000 (Direct Cost: ¥600,000)
Fiscal Year 1996: ¥700,000 (Direct Cost: ¥700,000)
Fiscal Year 1995: ¥5,200,000 (Direct Cost: ¥5,200,000)
To use glss fibers, glass powders, or porous glass materials as well as silica products, modification of the surfaces of them is an important and necessary process. silicon products used in electronic devices also have oxigenated surface and have the same problem concerning their surface of silicone oxide.
Previously, I revield that the surface is covered with a limited numbers of silanol hydroxy1 structures. In this project I would like to confirm that, at an elevated temperatures, the remaining silanol hydroxy1 groups are eliminated with a loss of a half mole of water molecules. This is a standard reference point to estimate the structure of dehydrated galss surface, and thus this could be a solid foundation for chemical modification technology of glass surface.
In this report, I described on 4 different types of slicon oxide materials, at what conditions (temperature, dessicating technique), the silanol hydroxy1 groups can be eliminated finally (dehydration), and how are the characteristics of dehydrated glasses.
On this bases, optimized procedures to modifiy chemically the suraces of those glasses to use as immobilized enzymes, solid support for DNA synthesis, and etc, are proposed.