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Development of cold plasma torch for dry process, under atmospheric pressure

Research Project

Project/Area Number 07555268
Research Category

Grant-in-Aid for Scientific Research (A)

Allocation TypeSingle-year Grants
Section展開研究
Research Field 工業物理化学
Research InstitutionTokyo Institute of Technology

Principal Investigator

KOINUMA Hideomi  Tokyo Institute of Technology, Research Laboratory of Engineering Materials, Professor (70011187)

Co-Investigator(Kenkyū-buntansha) SATO Kouta  Yokohama National University, Faculty of Engineering, Associate Professor (40192091)
SENOO Takehiko  Plasma System Ltd, 開発部, Researcher
Project Period (FY) 1995 – 1997
Project Status Completed (Fiscal Year 1997)
Budget Amount *help
¥14,900,000 (Direct Cost: ¥14,900,000)
Fiscal Year 1997: ¥3,000,000 (Direct Cost: ¥3,000,000)
Fiscal Year 1996: ¥4,500,000 (Direct Cost: ¥4,500,000)
Fiscal Year 1995: ¥7,400,000 (Direct Cost: ¥7,400,000)
Keywordscold plasma / plasma process / Organic polymer film / surface treatment / On bonding inclination / O_2 plasma / 誘電体 / ポーラスアルミナ / 陽極酸化 / 大気圧低温プラズマト-チ / スパッタ堆積 / 金属薄膜 / 酸化物エッチング / プラズマ診断 / 反応性プラズマ
Research Abstract

Various devices which generated the cold plasma under the atmospheric pressure were developed in this research, and the application of the new process of plasma enforceable in air was examined. It aimed to clarify the essence of the low temperature atmosphere open plasma through the examination of the control parameter. of the plasma diagnosis and the electrical discharge shape.
Various shape which arrived from the beam of 1 mm or less like the desk of the seat of 2×50mm and 50mm in the diameter was possessed by this research, the plasma generator which was able to discharge the electrical discharge gas over 100℃ or less from the temperature 500℃ into atmospheric was made, and the characteristic was clarified.
The possibility of the ceramics thin film piling up and the etching was clarified as an application of this new low temperature atmosphere open plasma. to the firstMoreover, it was not easy to process in the vacuum chamber, and developed an effective process the village plasma surface treatment such as rubbers and the polymer films.

Report

(4 results)
  • 1997 Annual Research Report   Final Research Report Summary
  • 1996 Annual Research Report
  • 1995 Annual Research Report
  • Research Products

    (27 results)

All 1998 1997 1996 1995 Other

All Journal Article (13 results) Publications (14 results)

  • [Journal Article] A novel low temperature plasma generator with alumina coated electrode for open air material processing1998

    • Author(s)
      M. KOIDE, T. HORIUCHI, T. INUSHIMA, B. J. LEE, M. TOBAYAMA, H. KOINUMA
    • Journal Title

      Thin Solid Films 316

      Pages: 65-67

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Journal Article] Oxygen plasma treatment of rubber surface by theatomospheric pressure cold plasma torch1997

    • Author(s)
      B. J. LEE, Y. KUSANO, N. KATO, K. NAITO, T. HORIUCHI, H. KOINUMA
    • Journal Title

      Jpn. J. App. Phys. 36

      Pages: 2888-2891

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Journal Article] Oxygen plasma treatment of rubber surface by the atomospheric pressure cold plasma torch1997

    • Author(s)
      B. J. LEE, Y. KUSANO, N. KATO, K. NAITO, T. HORIUCHI, H. KOINUMA
    • Journal Title

      Jpn. J. App. Phys. 36

      Pages: 2888-2891

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Journal Article] Synthesis of carbon clusters and thin films by low temperature plasma chemical vapor deposition under atmospheric pressure1996

    • Author(s)
      H. KOINUMA, T. HORIUCHI, K. INOMATA, H. K. HA, K. NAKAJIMA, K. A. CHAUDHARY
    • Journal Title

      Pure & Appl. Chem 68(5)

      Pages: 1151-1154

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Journal Article] プラズマ化学とセラミックス1996

    • Author(s)
      鯉沼秀臣, 堀内賢雄
    • Journal Title

      セラミックスデータブック 96別冊

      Pages: 42-45

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Journal Article] structure and electric properties of TiO_2 films preparedby cold plasma torch under atomospheric pressure1996

    • Author(s)
      H. HA, B. K. MOON, T. HORIUCHI, T. ONUSHIMA, T. INUSHIMA, H. KOINUMA
    • Journal Title

      Mat. Sci. and Eng. B41

      Pages: 143-147

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Journal Article] Surface modification of rubber by the treatment coldplasma torch1996

    • Author(s)
      B. J. LEE, et al
    • Journal Title

      Proc. the 3rd Conf. on Science & Technology

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Journal Article] Structure and electric properties of TiO_2 films prepared by cold plasma torch under atomospheric pressure1996

    • Author(s)
      H. HA, B. K. MOON, T. HORIUCHI, T. ONUSHIMA, T. INUSHIMA, H. KOINUMA
    • Journal Title

      Mat. Sci. and Eng. B41

      Pages: 143-147

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Journal Article] Surface modification of rubber by the treatment cold plasma torch1996

    • Author(s)
      B. J. LEE, et al
    • Journal Title

      Proc. the 3rd Conf. on Science & Technology

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Journal Article] Open air photoresist ashing by a cold plasma torch : Catalytic effect of cathode material1995

    • Author(s)
      K. INOMATA, H. KOINUMA, Y. OIKAWA, T. SHIRAISHI
    • Journal Title

      Appl. Phys. Lett. 66(17)

      Pages: 2188-2190

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Journal Article] Plasma chemical vapor deposition of SiO_2 on Air-exposed surfaces by cold plasma torch1995

    • Author(s)
      H. K. HA, K. INOMATA, H. KOINUMA
    • Journal Title

      Jorn. of the Electrochemical Society 42(8)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Journal Article] Open air plasma chemical vapor deposition of highlydiectric amorphous TiO_2 film1995

    • Author(s)
      H. K. HA, M. YOSHIMOTO, H. KOINUMA B. K. MOON, H. ISHIWARA
    • Journal Title

      Appl. Phys. Lett. 68(21)20

      Pages: 2965-2967

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Journal Article] Open air plasma chemical vapor deposition of highly diectric amorphous TiO_2 film1995

    • Author(s)
      H. K. HA, M. YOSHIMOTO, H. KOINUMA B. K. MOON, H. ISHIWARA
    • Journal Title

      Appl. Phys. Lett. 68(21)20

      Pages: 2965-2967

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] Bong-ju LEE: "Oxygen Plasma Treatment of Rubber Surface by the Atmospheric Pressure Cold Plasma Torch" Jpn. J. Appl. Phys.36. 2888-2891 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] Miyuki Koide: "A novel low temperature plasma generator with alumina coated for open air material processing" Thin Solid Films. in press.

    • Related Report
      1997 Annual Research Report
  • [Publications] Kota Sato: "Ab initio molecular-orbital study on the surface reactions of methane and silane plasma chemical vapor deposition" Phys. Rev. B. 55(23). 15467-15470 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] Kaori Miyazaki: "An ab-initio Molecular-Orbital Analysis on the Initial Plasma CVD Process of a-Si : H Film on Glass Substrate" Thin Solid Films. (in press).

    • Related Report
      1997 Annual Research Report
  • [Publications] H.KOINUMA et al.: "Synthesis of Carbon Clusters and Thin Films by Low Temperature Plasma Chemical Vapor Deposition under Atmosperic Pressure" Pure & Appl.Chem.68. 1151-1154 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] H.K.HA,H.Koinuma et al.: "Structure and Electric Properties of TiO_2 Films Prepared by Cold Plasma Torch under Atmsopheric Pressure" Mat.Sci.Eng.B41. 143-147 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] H.K.HA,H.Koinuma et al.: "Open Air Plasma Chemical Vapor Deposition of Highly Dielectric Amorphous TiO_2 Films" Appl.Phys.Lett.68. 2965-2967 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] B.J.Lee,et al.: "Surface Modification of Rubber by the Treatment with Atmospheric Pressure Cold Plasma Torch" Proc.The 3rd Asia-Pacific Conf.on Science &Technology. 1. 129-132 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] K.Sato and H.Koinuma: "Quantum Chemical Analysis and Prediction of Plasma Chemical Vapor Depposition Procedsses of Silicon Compounds" Prog.Polym.Sci.,42 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] H. Koinuma et al.: "Open Air Photoresist Ashing by A Cold Plasma Torch" Appl. Phys Lett.66[17]. 2188-2190 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] H. Koinuma et al.: "Plasma CVD of SiO_2 on Air-Exposed Surfaces by Cold Pladsma Torch" J. Electrochem. Soc.142[8]. 2726-30 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] H. Koinuma et al.: "Synthesis of Carbon Clusters and Thin Films by Low Temperature Plasma CVD under Atmosphonic Pressure" Pure&Appl. Chem(ISPC-12). Aug. 24. (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] H.Koinuma et al.: "Highly Dielectric Amorphous TiO_2 Films Prepared in Air by Plasma CVD" Proceeding of IUMRS 3rd International Conference in Asia. 987-992 (1995)

    • Related Report
      1995 Annual Research Report
  • [Publications] K. Sato et al.: "High Cross-Linked Polymer Networks of Amorphous Silicon Alloys" Prog. in Polymer Sci.(in press).

    • Related Report
      1995 Annual Research Report

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Published: 1995-04-01   Modified: 2016-04-21  

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