| Project/Area Number |
08044148
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| Research Category |
Grant-in-Aid for international Scientific Research
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| Allocation Type | Single-year Grants |
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| Section | Joint Research |
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| Research Field |
計測・制御工学
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| Research Institution | Osaka University |
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Principal Investigator |
TAKAI Mikio Faculty of Enginired Science Osaka Univ.Prof, 極限科学研究センター, 教授 (90142306)
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| Co-Investigator(Kenkyū-buntansha) |
FREY Lothar Fraunhofer Inst.fuer.Int.Schalt, chief researcher, 部長
RYSSEL Hiener Fraunhofer Inst.fuer.Int Schalt Prof., 所長, 教授
YANAGISAWA Junichi Faculty of Enginired Science Osaka Univ.Lecter, 大学院・基礎工学研究科, 講師 (60239803)
YUBA Yoshihiko Faculty of Enginired Science Osaka Univ.Assist. Prof, 大学院・基礎工学研究科, 助教授 (30144447)
LOTHAR Frey フラウンホーファ集積回路電子素子技術研究所, 部長
HEINER Rysse フラウンホーファ集積回路電子素子技術研究所, 所長, 教授
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| Project Period (FY) |
1996 – 1998
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| Project Status |
Completed (Fiscal Year 1998)
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| Budget Amount *help |
¥13,900,000 (Direct Cost: ¥13,900,000)
Fiscal Year 1998: ¥4,900,000 (Direct Cost: ¥4,900,000)
Fiscal Year 1997: ¥4,900,000 (Direct Cost: ¥4,900,000)
Fiscal Year 1996: ¥4,100,000 (Direct Cost: ¥4,100,000)
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| Keywords | ion microprobe / focused ion beam / TOF-SIMS / nanometer structure / 3 dimensional analysis technique / nano fabrication / vacuum micro electronics device / beam induced process / 真空マイクロエレクトロニクス素子 / ナノファブリケーション / ナノメートル3次元分析 / 電界放射電子源 / プロセス誘起欠陥 / ナノ構造 / DRAM |
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| Research Abstract |
Fabrication of structures with a size of a few tens of nanometer has drawn much interest in the application to the processing of a future generation of ultra large scale integration (ULSI) circuits and new devices in the field of mesoscopic area. Therefore development of non-destructive two and three dimensional analyses is quite important to realize such structures. A bilateral collaboration between Osaka University and Fraunhofer Institut fuer Integrierte Schaltungen has been performed to establish a three dimensional analysis technique with a nanometer resolution. An ion micro probe (or nuclear micro probe) technique using a focused ion beam for three dimensional analysis has been developed at Osaka University and compared with the destructive analysis technique such as TOF-SIMS being used at Fraunhofer Institut using the same samples. The ion micro probe could provide stoichiometry, crystallinity, and impurity distribution in a sample material without material removal techniques.
Following results were obtained :
1. Three dimensional structures such as vacuum micro electronics devices and basic structures for quantum effect devices, fabricated at Osaka University, have successfully been analyzed using non-destructive and destructive techniques. Advantage of the techniques developed in this study was demonstrated.
2. Miniature structures fabricated at Fraunhofer Institute using beam induced chemical and physical processes could have been analyzed with a resolution of 80 nm using the techniques developed.
3. Two and three dimensional mapping (tomography) techniques of material stoichiometry and impurity distribution have been developed using ion micro probes.
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