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"Control of surface and interfaces of nano-structures for single electron devices"

Research Project

Project/Area Number 08247101
Research Category

Grant-in-Aid for Scientific Research on Priority Areas

Allocation TypeSingle-year Grants
Research InstitutionHOKKAIDO UNIVERSITY

Principal Investigator

HASEGAWA Hideki  Hokkaido Univ., Grad.School of Eng., Pro., 大学院・工学研究科, 教授 (60001781)

Co-Investigator(Kenkyū-buntansha) SAWAKI Nobuhiko  Nagoya Univ., Grad. School of Eng., Pro.., 工学研究科, 教授 (70023330)
KOMA Atsushi  Univ. of Tokyo, Grad.School of Sci., Pro, 理学系研究科, 教授 (00010950)
IWAMI Motohiro  Okayama Univ., Fuclty of Science, Pro., 理学部, 教授 (80029123)
SUGANO Takuo  Toyo Univ., Faculty of Eng., Pro.., 工学部, 教授 (50010707)
YASUDA Yukio  Nagoya Univ., Grad.School of Eng., Pro.., 工学研究科, 教授 (60126951)
Project Period (FY) 1996 – 1999
Project Status Completed (Fiscal Year 2000)
Budget Amount *help
¥223,900,000 (Direct Cost: ¥223,900,000)
Fiscal Year 1999: ¥29,000,000 (Direct Cost: ¥29,000,000)
Fiscal Year 1998: ¥24,600,000 (Direct Cost: ¥24,600,000)
Fiscal Year 1997: ¥44,500,000 (Direct Cost: ¥44,500,000)
Fiscal Year 1996: ¥125,800,000 (Direct Cost: ¥125,800,000)
KeywordsSingle electron devices / nanostructure / surfaces and interfaces / tunnel barrier / quantum dot / quantum devices / atomic-scale control / high-density intgration
Research Abstract

The pupose of this research was to control surfaces and interfaces of nanostructures in an atomic scale and its application to the device processing techniques for fabricating and integrating novel single electron devices. The main results are listed below.
(l) Novel GaAs- and InGaAs-based single electron transistors having Schottky in-plane and wrap gates were proposed and fabricated. They operated at high temperatures and achieved the voltage gain greater than unity. Furthermore, small-scale integrated circuits such as logic inverter circuits and binary decision diagram (BDD) circuits were stuccessfully fabricated.
(2) Variotus types of Si-based quantum structures and devices were fabricated and characterized. Coulomb staircase and single electron transport through nano-crystal Si dots were observed at room temprature. In addition, quantized conductance was seen for the first time in vertical-type Si transistor with a 20-nm channel. Coulomb blockade phenomena were found in a narrow Si channel where a hopping transport is dominant. A novel structure for single electron devices was proposed on the basis of asymmetric tunneling barriers.
(3) Surface properties of SiC and GaSe were investigated in an atomic scale. Formation processes of metal particles with nanometer sizes on the reconstructed SiC surfaces were clarified. Furthermore, a novel process for formtion of GaAs quantum dots on the GaSe-terminated (111) Si surface was realized.
(4) Tunneling time and propagation process of wave packet in quantun dots were theoretically investigated.

Report

(5 results)
  • 2000 Final Research Report Summary
  • 1999 Annual Research Report
  • 1998 Annual Research Report
  • 1997 Annual Research Report
  • 1996 Annual Research Report
  • Research Products

    (399 results)

All Other

All Publications (399 results)

  • [Publications] K.Jinushi: "Novel GaAs-Based Single-Electron Transistors with Schottky In-Plane Gates Operating up to 20K"Jpn.J.Appl.Phys.. 35. 1132-1139 (1996)

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      「研究成果報告書概要(和文)」より
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      2000 Final Research Report Summary
  • [Publications] S.Kasai: "Fabrication and Characterization of Navel Lateral Surface Superlattice Structure Utilizing Schottky Barrier Height Control by Doped Silicon Interface Control Lavers"Jpn.J.Appl.Phys.. 35. 1340-1347 (1996)

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      2000 Final Research Report Summary
  • [Publications] H.Fujikura: "Photoluminescence and Cathodoluminescence Investigation of Optical Properties of InP-Based InGaAs Ridge Quantum Wires Formed by Selective Molecular Beam Epitaxy"Jpn.J.Appl.Phys.. 35. 1333-1339 (1996)

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      2000 Final Research Report Summary
  • [Publications] H.Fujikura: "Surface Passivation of InGaAs Ridge Quantum Wires Using Silicon Interface Control Laver"J.Vac.Sci.Technol.B. 14. 2888-2894 (1996)

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  • [Publications] T.Hashizume: "Quantum Transport in A Schottky In-Plane-Gate Controlled GaAs/ AlGaAs Quantum Well Wires"Phisica B. 227. 42-45 (1996)

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  • [Publications] H.Tomozawa: "Design and Fabrication of GaAs/AlGaAs Single Electron Transistors Based on In-Plane Schottky Gate Control of 2DEG"Phisica B. 227. 112-115 (1996)

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  • [Publications] H.Fujikura: "Fabrication of InP-Based InGaAs Ridge Quantum Wires Utilizing Selective Molecular Beam Epitaxial Growth on (311)A Facets"J.Electron.Mater. 25. 619 (1996)

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      2000 Final Research Report Summary
  • [Publications] S.Kasai: "Electron Beam Induced Current Characterization of Novel GaAs Quantum Nanostructures Based on Potential Modulation of 2DEG by Schottky In-Plane Gates"Jpn.J.Appl.Phys. vol.34, part1. No.12B 6652-6658 (1996)

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  • [Publications] H.Okada: "Realization of GaAs-Based Small Quantum Structures by Schottky In-Plane-Gate Control of 2DEG"Proceedings of the 23rd International Conference on the Physics of Semiconductors. 1237-1240 (1996)

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  • [Publications] H.0kada: "Realization of GaAs-Based Small Quantum Structures by Schottky In-Plane-Gate Control of 2DEG"Proceedings of 23rd International Conference on the Physics of Semiconductors. 1237-1240 (1996)

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      2000 Final Research Report Summary
  • [Publications] 長谷川英機: "化合物半導体量子細線および量子ドットの製作"光学. 25巻、8号. 448-455 (1996)

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  • [Publications] 長谷川英機: "化合物半導体量子構造表面の Si 超薄膜界面制御層によるパッシべーション"表面科学. 17巻、9号. 567-574 (1996)

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      2000 Final Research Report Summary
  • [Publications] M.Araki: "Fabrication of InGaAs Quantum Wires and Dots by Selective Molecular Beam Epitaxial Growth on Various Mesa-Patterned (001) InP Substrates"Jpn.J.Appl.Phys.. 36. 1763-1769 (1997)

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      2000 Final Research Report Summary
  • [Publications] H.Fujikura: "Excitation Power Dependent Photoluminescence Behavior in Etched Quantum Wires Having Silicon Interlayer-Based Edge Passivation and Its Interpretation"Jpn.J.Appl.Phys.. 36. 1937-1943 (1997)

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      2000 Final Research Report Summary
  • [Publications] S.Kasai: "Fabrication and Characterization of GaAs Single Electron Devices Having Single and Multiple Dots Based on Schottky In-Plane-Gate and Wrap-Gate Control of Two Dimensional Electron Gas"Jpn.J.Appl.Phys.. 36. 1678-1685 (1997)

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      2000 Final Research Report Summary
  • [Publications] H.Okada: "0bservation of Coulomb Blockade Oscillations up to 50K in Gated InGaAs Ridge Quantum Wires Grown by Molecular Beam Epitaxy in InP substrates"Jpn.J.Appl.Phys.. vol.36, part1. No.3B 1672-1677 (1997)

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      2000 Final Research Report Summary
  • [Publications] T.Kudoh: "Controlled Formation of Metal-Semiconductor Interface to 2DEG Layer by In-Situ Electrochemical Process and Its Application to In-Plane Gated Electron Waveguide Devices"Appl.Sur.Sci. vol.117/118. 342-346 (1997)

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      2000 Final Research Report Summary
  • [Publications] M.Kihara: "Effect of Mis-Orientation of Mesa-Stripes on the Growth of InGaAs Quantum Wires by Selective Molecular Beam Epitaxy"Appl.Sur.Sci.. Vol.117/118. 385-389 (1997)

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      2000 Final Research Report Summary
  • [Publications] H.Hasegawa: "Excitation Power Dependent Photoluminescence Characterization of Insulator-Semiconductor Interfaces on Near Surface Quantum Structures Passivated by Silicon Interface Control Layer Technology"Appl.Surf.Sci.. 117/118. 710-713 (1997)

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  • [Publications] K.Ikeya: "Successful Surface Passivation of Air-Exposed AlGaAs by a Silicon Interface Control LAyer-Based Technique"Jpn.J.Appl.Phys.. vol.36, part1. No.3B, 1756-1762 (1997)

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  • [Publications] H.Fujikura: "Formation of Two-Dimensional Arrays of InP-Based InGaAs Quantum Dots on Patterned Substrates by Selective Molecular Beam Epitaxy"Jpn.J.Appl.Phys.. 36. 4092-4096 (1997)

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  • [Publications] H.Okada: "Basic Control Characteristics of Novel Schottky In-Plane and Wrap Gate Structures Studied by Simulation and Transport Measurements in GaAs and InGaAs Quantum Wires"Jpn.J.Appl.Phys.. vol.36, part1. No.6B 4156-4160 (1997)

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  • [Publications] Y.Ishikawa: "Kink defects and fermi level pinning on (2x4) reconstructed molecular beam epitaxially grown surfaces of GaAs and InP studied by ultrahigh-vacuum scanning tunneling microscopy and X ray photoelectron spectroscopy"J.Vac.Sci.Technol.B. vol.15. 1163-1172 (1997)

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      2000 Final Research Report Summary
  • [Publications] H.Hasegawa: "Evolution Mechanism of Nearly-Pinning Platinum/N-Type Indium Phosphide Interface with a High Schottky Barrier Height by In-Situ Electrochemical Process"J.Vac.Sci.Technol.B. vol.15. 1227-1235 (1997)

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      2000 Final Research Report Summary
  • [Publications] T.Hashizume: "Dominant Electron Trap with Metastable state in Molecular Beam Epitaxial GaAs Grown at Low Temperatures"Jpn.J.Appl.Phys.. vol.36. 1775-1780 (1997)

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      2000 Final Research Report Summary
  • [Publications] K.Ikeya: "Successful Surface Passivation of Air-Exposed AlGaAs by a Silicon Interface Control Layer-Based Technique"Jpn.J.Appl.Phys.. vol.36. 1756-1762 (1997)

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      2000 Final Research Report Summary
  • [Publications] Y.Dohmae: "Capacitance-Voltage Behavior of Insulated Gate InGaAs HEMT Capacitor Having Silicon Interface Control Layer"Jpn.J.Appl.Phys.. vol.36. 1834-1840 (1997)

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      2000 Final Research Report Summary
  • [Publications] Y.Ishikawa: "Missing-dimer structures and their kink defects on molecular beam epitaxially grown (2x4) reconstructed (001) InP and GaAs surfaces studied by ultrahigh-vacuum scanning tunneling microscopy"Jpn.J.Appl.Phys.. vol.36. 1749-1755 (1997)

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      2000 Final Research Report Summary
  • [Publications] T.Yoshida: "Characterization of Interface Electronic Properties or Low Temperature Ultrathin Oxides and Oxynitrides Formed on Si (111) Surfaces by Contactless Capacitance-Voltage and Photoluminescence Methods"Jpn.J.Appl.Phys.. vol.36. 1453-1459 (1997)

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      2000 Final Research Report Summary
  • [Publications] T.Sato: "30), S.Uno, T.Hashizume and H.Hasegawa : "Large Schottky Barrier Heights on Indium Phosphide-Based Materials Realized by In-Situ Electrochemical Process"Jpn.J.Appl.Phys.. vol.36. 1811-1817 (1997)

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  • [Publications] H.Hasegawa: "Interface-controlled Schottky barriers on InP and related materials"Solid-State Electron. 41. 1441-1450 (1997)

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      2000 Final Research Report Summary
  • [Publications] K.Iizuka: "Small-Signal Response of Interface States at Passivated InGaAs Surfaces from Low Frequencies up to Microwave Frequencies"Solid-State Electron. 41. 1463-1468 (1997)

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  • [Publications] S.Suzuki: "Fabrication and electrical characterization of InP-based insulated gate power HEMTs using ultrathin Si interface control layer"Solid-State Electron.. 41. 1641-1646 (1997)

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  • [Publications] H.Hasegawa: "Electrochemical Formation and Characterization of Schottky In-Plane and Wrap Gate Structures for Realization of GaAs- and InP-Based Quantum Wires and Dots"Appl.Surf.Sci.. 123/124. 335-338 (1997)

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  • [Publications] T.Hashizume: "Surface Passivation of GaAs with Ultrathin Si3N4/Si Interface Control Layer Formed by MBE and In Situ ECR Plasma Nitridation"Appl.Surf.Sci. 123/124. 599-602 (1997)

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  • [Publications] H.Takahashi: "Novel InP Metal-Insulator-Semiconductor Structure Having an Ultrathin Silicon Interface Comctrol Layer"Appl.Surf.Sci. 123/124. 615-618 (1997)

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  • [Publications] B.Adamowicz: "Computer analysis of Surface Recombination process at Si and compound semiconductor surfaces and behayior of surface recombination velocity"Japanese Journal of Applied Physics. 37. 1631-1637 (1998)

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  • [Publications] H.Takahashi: "Novel InP Metal-Insulator-Semiconductor Structure Having and Ultrathin Silicon Interface Control Layer"Applied Surface Science. 123/124. 615-618 (1998)

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  • [Publications] Y.Satoh: "Computer Simulation and Experimental Characterization of Single Electron Transistors Based on Schottky Wrap Gate Control of 2DEG"Japanese Journal of Applied Physics. 37. 1584-1590 (1998)

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      2000 Final Research Report Summary
  • [Publications] H.Fujikura: "Controlled Formation of Narrow and Uniform InP-Based In0.53Ga0.47As Ridge Quantum Wire Arrays by Selective Molecular Beam Epitaxy"Japanese Journal of Applied Physics. 37. 1584-1590 (1998)

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  • [Publications] T.Hashizume: "Surface Passivation of GaAs with Ultrathin Si3N4/SiInterface Control Layer Formed by MBE and in situ ECR Plasma Nitridation"Applied Surface Science. 123/124. 599-602 (1998)

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  • [Publications] N.Tsurumi: "In-situ Tunneling Microscope Study of Formation Process of Ultrathin Si Layer by Molecular Beam Epitaxy on GaAs (001 )-(2x4) Surface"Japanese Journal of Applied Physics. 37. 1501-1507 (1998)

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  • [Publications] T.Hashizume: "In-Situ Contactless Characterization of Microscopic and Macroscopic Properties of Si-doped MBE-Grown (2x4) GaAs Surfaces"Japanese Journal of Applied Physics. 37. 1626-1630 (1998)

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      2000 Final Research Report Summary
  • [Publications] H.Hasegawa: "Electrochemical Formation and Characterization of Schottky In-Plane and Wrap Gate Structures for Realization of GaAs- and InP-Based Quantum Wires and Dots"Applied Surface Science. 123/124. 335-338 (1998)

    • Description
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    • Related Report
      2000 Final Research Report Summary
  • [Publications] Y.Ishikawa: "Scanning tunneling microscopy and x-ray photoelectron spectroscopy studies of atomic level structure and Fermi Level pinning on GaAs (110) surfaces grown by molecular beam epitaxy"Journal of Vacuum Science and Technology B. 16. 2387-2394 (1998)

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  • [Publications] S.Chakraborty: "Formation of ultrathin oxynitride layers on Si (100) by low-temperature electron cyclotron resonance N20 plasma oxynitridation process"Journal of Vacuum Science and Technology B. 16. 2159-2164 (1998)

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  • [Publications] B.Adamowicz: "Photoluminescence characterization of air exposed AlGaAs surface and passivated ex situ by ultrathin silicon interface control layer"Physica E. 2. 261-266 (1998)

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  • [Publications] H.Sai: "Gas Source Molecular Beam Epitaxial Growth of Inl-xGaxP on GaAs Using Tertiarybutylphosphine"Japanese Journal of Applied Physics. 38. 151-158 (1999)

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  • [Publications] Y.Satoh: "Voltage Gain in GaAs-Based Lateral Single Electron Transistors Habing Three Schottky Wrap Gates"Japanese Journal of Applied Physics. 38. 415-417 (1999)

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  • [Publications] H.Fujikura: "Control of Dot Size and Tunneling Barrier Profile in In0.53Ga0.47As Coupled Quantum Wire-Dot Structures Grown by Selective Molecular Beam Epitaxy on Patterned InP Substrates"Japanese Journal of Applied Physics. 38. 421-424 (1999)

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  • [Publications] H.Sai: "Study of Reflection High-Energy Electron Diffraction Oscillation for Optimization fo Tertiarybutylposphine-Based Molectular Beam Epitaxial Growth of In0.48GaO.52P on GaAs"Japanese Journal of Applied Physics. 38. 824-831 (1999)

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  • [Publications] H.Fujikura: "Extra-Side-Facet Control in Selectrive Molecular Beam Epitaxial Growth of InGaAs Ridge Quantum Wires for Improvement of Wire Uniformity"Japanese Journal of Applied Physics. 38. 1067-1070 (1999)

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  • [Publications] T.Muranaka: "Size-Controlled Formation of Decananometer InGaAs Quantum Wires by Selective Molecular Beam Epitaxy on InP Patterned Substrates"Japanese Journal of Applied Physics. 38. 1071-1074 (1999)

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  • [Publications] H.Hasegawa: "Fermi Level Pinning and Schottky Barrier Height Control at Metal Semiconductor Interfaces of GaN and Related Materials"Japanese Journal of Applied Physics. 38. 1098-1102 (1999)

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  • [Publications] T.Sato: "Strong Correlation Between Interface Microstructure and Barrier Height in n-InP Schottky Contacts Formed by In Situ Electrochemical Process"Japanese Journal of Applied Physics. 38. 1103-1106 (1999)

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  • [Publications] M.B.Takeyama: "Interfacial Reaction and Electrical Properties in the Sputter-Deposited At/Ti Ohmic Contact to n-InP"Japanese Journal of Applied Physics. 38. 1115-1118 (1999)

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  • [Publications] H.Takahashi: "X-ray Photoelectron Spectroscopy and Ultrahigh Vacuum Contactless Capacitance-Voltage Characterization of Novel Oxide-Free InP Passivation Process Using a Silicon Surface Quantum Well"Japanese Journal of Applied Physics. 38. 1128-1132 (1999)

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  • [Publications] C.Kaneshiro: "Electrochemical Etching of Indium Phosphide Surfaces Studied by Volammetry and Scanned Probe Microscopes"Japanese Journal of Applied Physics. 38. 1147-1152 (1999)

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  • [Publications] B.Adamowicz: "Electronic Properties of AlxGal-xAs Surface Passivated by Ultrathin Silicon Interface Control Layer"Applied Surface Science. 141. 326-332 (1999)

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  • [Publications] H.Fujikura: "Selective Growth of Quantum Wire-Dot Coupled Structures with Novel High Index Facets for InGaAs Single Electron Transistor Arrays"Microelectronics. 30. 397-401 (1999)

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  • [Publications] M.Mutoh: "Effects of Initial Surface Reconstruction on Silicon Interface Control Layer Based Passivation of (001) GaAs Surfaces Studied in an Ultrahigh-Vacuum Multichamber System"Japanese Journal of Applied Physics. 38. 2538-2543 (1999)

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  • [Publications] T.Yoshida: "A Novel Non-Destructive Characterization Method of Electronic Properties of Pre- and Post-Processing Silicon Surfaces Based on Ultrahigh-Vacuum Contactless Capacitance-Voltage Measurements"Japanese Journal of Applied Physics. 38. 2349-2354 (1999)

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  • [Publications] H.Hasegawa: "Properties of Metal-Semiconductor Interfaces Formed on n-Type GaN"Japanese Journal of Applied Physics. 38. 634-2639 (1999)

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  • [Publications] T.Sato: "Formation of Size- and Position-Controlled Nanometer Size Pt Dots on GaAs and InP Substrates by Pulsed Electrochemical Deposition"Japanese Journal of Applied Physics. 38. 2448-2452 (1999)

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  • [Publications] J.Nakamura: "Transport Properties of Schottky In-Plane-Gate GaAs Single and Coupled Quantum Wire Transistors"Inst.Phys.Conf.Ser.. 162. 409-414 (1999)

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    • Related Report
      2000 Final Research Report Summary
  • [Publications] N.Ono: "Study of Selective MBE Growth on Patterned (001) InP Substrates Toward Realization of $$\langle100\rangle$$-Oriented InGaAs Ridge Quantum Wires"Inst.Phys.Conf.Ser.. 162. 385-390 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] C.Kaneshiro: "Realization of Strongly Metal-Dependent Schottky Barrier Heights on n GaAs by In Situ Electrochemical Process"Inst.Phys.Conf.Ser. 162. 585-590 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Muranaka: "Realization of InP-Based InGaAs Single Electron Transistors on Wires and Dots Grown by Selective MBE"Microelectronic Engineering. 47. 201-203 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Okada: "GaAs-Based Single Electron Logic and Memory Devices Using Electro-Deposited Nanometer Schottky Gates"Microelectronic Engineering. 47. 285-287 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Sai: "Growth of Device Quality InGaP/GaAs Heterostructures by Gas Source Molecular Beam Epitaxy using Tertiarybutylphosphine"Solid State Electronics. 43. 1541-1546 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Takahashi: "In-situ Characterization Technique of Compound Semiconductor Heterostructure Growth and Device Processing Steps Based on UHV Contactless Capacitance-Voltage Measurement"Solid State Electronics. 43. 1561-1570 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] Y.Koyama: "Formation Processes and Properties of Schottky and Ohmic Contacts on n-type GaN form Field Effect Transistor Applications"Solid State Electronics. 43. 1483-1488 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] A.Hamamatsu: "Formation of <001>-Aligned Nano-Scale Pores on (001) n-InP Surfaces by Photoelectrochemical Anodization in HCl"J.Electroanalytical Chem.. 473. 223-229 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Hasegawa: "Molecular Beam Epitaxy and Device Applications or III-V Semiconductor Nanowires"MRS Bulletin. 24. 25-30 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] B.Adamowicz: "Computer Simulation of the Surface Photovoltage on Si and GaAs Surfaces with U-shaped Surface State Continuum"Vacuum. 54. 173-177 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Hasegawa: "Properties of nanometer-sized metal-semiconductor interfaces of GaAs and InP formed by an in situ electrochemical process"Journal of Vacuum Science and Technology B. 17. 1856-1866 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Okada: "Characterization of GaAs Schottky in-plane gate quantum wire transistors for switching of quantized conductance"Physica B. 272. 23-126 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] S.Kasai: "Conductance oscillation characteristics of GaAs Schottky wrap-gate single electron transistors"Physica B. 272. 88-91 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] 長谷川英機: "量子構造と MBE"Crystarl Letters. 51. 8-9 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Hasegawa: "Unpinning of Fermi level in nanometer-sized Schottky contacts on GaAs and InP"Applied Surface Science. 166. 92-96 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Takahashi: "In situ UHV contactless C-V and XPS characterization of surface passivation process for InP using a partially nitrided Si interface control layer"Applied Surface Science. 166. 526-531 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Fujikura: "Formation of device-oriented InGaAs coupled quantum structures by selective MBE growth on patterned InP substrates"Physica E. 7. 864-869 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] C.Jiang: "Vertical barrier layer formation during selective MBE growth of InGaAs ridge quantum wires on InP patterned substates"Physica E. 7. 902-906 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Hasegawa: "Prospects and Key Issues for Compound Semiconductor Quantum Devices"Tehcnical Report of IEICE. ED2000-51. 43-48 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] M.Iyawa: "Chemical and Electrochemical Nanofabrication Processes for Schottky In-Plane Gate GaAs Single and Coupled Quantum Wire Transistors"Jpn.J.Appl.Phys.. 39. 4651-4652 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Fujikura: "Electrochemical Formation of Uniform and Straight Nano-Pore Arrays on (001) InP Surfaces and Their Photoluminescence Characterizations"Jpn.J.Appl.Phys.. 39. 4616-4620 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Yoshida: "Ultrahigh-Vacuum Contactless Capacitance-Voltage Characterization of Hydrogen Terminated-Free Silicon Surfaces"Jpn.J.Appl.Phys.. 39. 4504-4508 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Sato: "Electrical Properties of Nanometer-Sized Schottky Contacts on n-GaAs and n-InP Formed by in Situ Electrochemical Process"Jpn.J.Appl.Phys.. 39. 4609-4615 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] M.Yamada: "Fabrication and Characterization of Novel Oxide-Free InP Metal-Insulator-Semiconductor FETs Having an Ultra Narrow Si Surface Ouantum Well"Jpn.J.Appl.Phys.. 39. 2439-2443 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] S.Ootomo: "Nitridation of GaP (1OO) Surfaces by rf Nitrogen Radicals and by Electron Cyclotron Resonance Nitrogen Plasma"Jpn.J.Appl.Phys.. 39. 2407-2413 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Muranaka: "Selective MBE Growth of InGaAs Quantum Wire-Dot Coupled Structures with Controlled Double-Barrier Potential Profiles"Inst.Phys.Conf.Ser.. 166. 187-190 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] S.Kasai: "GaAs Quantum Wire Transistors and Single Electron Transistors using Schottky Wrap Gates for Quantum Integrated Circuits"Inst.Phys.Conf.Ser.. 166. 219-222 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Muranaka: "Origing of Non-Uniformity in MBE Grown Nanometer-Sized InGaAs Ridge Quantum Wires and Its Removal by Atomic Hydrogen-Assisted Cleanin"Thin Solid Film. 380. 189-191 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] R.Nakasaki: "Insulator-GaN interface structures formed by plasma-assisted chemical vapor deposition"Physica E. 7. 953-957 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] B.Adamowicz: "Analysis of photoluminescence efficiency and surface recombination velocity of MBE-grown AlGaAs layers"Thin Solid Films. 367. 180-183 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] B.Adamowicz: "Computer analysis of photon-induced non-equilibrium phenomena at Si and AlGaAs surfaces"Vacuum. 57. 111-120 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] B.Adamowicz: "Computer Analysis of The Fermi Level Behavior at SiO2/n-GaAs Interfaces"Electron Technology. 33. 249-252 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] S.Kasai: "GaAs-Based Single Electron Transistors and Logic Inverters Utilizing Schottky Wrap-Gate Controlled Quantum Wires and Dots"Japanese Journal of Applied Physics (in press). 40. (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Sato: "Electrical Properties of Nanometer-Sized Schottky Contacts for Gate Control of III-V Single Electron Devices and Quantum Devices"Japanese Journal of Applied Physics. 40 (in press). (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] K.Jinushi, H.Okada, T.Hashizume and H.Hasegawa: "Novel GaAs-Based Single-Electron Transistors with Schottky In-Plane Gates Operating up to 20K"Jpn.J.Appl.Phys.. Vol.35. 1132-1139 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] S.Kasai and H.Hasegawa: "Fabrication and Characterization of Noves Lateral Surface Superlattice Structure Utilizing Schottky Barrier Height Control by Doped Silicon Interface Control Layers"Jpn.J.Appl.Phys.. 35. 1340-1347 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Fujikura and H.Hasegawa: "Photoluminescence and Cathodoluminescence Investigation of Optical Properties of InP-Based InGaAs Ridge Quantum Wires Formed by Selective Molecular Beam Epitaxy"Jpn.J.Appl.Phys. 35. 1333-1339 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Fujikura, S.Kodama, T.Hashizume and H.Hasegawa: "Surface Passivation of InGaAs Ridge Quantum Wires Using Silicon Interface Control Layer"J.Vac.Sci.Technol. B. vol.14. 2888-2894 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Hashizume, H.Okada and H.Hasegawa: "Quantum Transport in A Schottky In-Plane-Gate Controlled GaAs/AlGaAs Quantum Well Wires"Phisica B. vol.227. 42-45 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Tomozawa, K.Jinushi, H.Okada, T.Hashizume and H.Hasegawa: "Design and Fabrication of GaAs/AlGaAs Single Electron Transistors Based on In-Plane Schottky Gate Control of 2DEG"Phisica B. vol.227. 112-115 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Fujikura and H.Hasegawa: "Fabrication of InP-Based InGaAs Ridge Quantum Wires Unltzing Selective Molecular Beam Epitaxial Growth on (311) A Facets"J.Electron. Mater.. 25. 619 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] S.Kasai, T.Hashizume and H.Hasegawa: "Electron Beam Induced Current Characterization of Novel GaAs Quantum Nanostructures Based on Potential Modulation of 2DEG by Schottky In-Plane Gates"Jpn.J.Appl.Phys.. vol.34, Part 1, No.12B. 6652-6658 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Okada, T.Hashizume, K.Jinushi, T.Kudon and H.Hasegawa: "Realization of GaAs-Based Small Quantum Structures by Schottky In-Plane-Gate Control of 2DEG"Proceedings of the 23rd International Conference on the Physics of Semiconductors. 1237-1240 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Okada, T.Hashizume, K.Jinushi, T.Kudoh and H.Hasegawa: "Realization of GaAs-Based Small Quantum Structures by Schottky In-Plane-Gate Control of 2DEG"Proceedings of 23rd International Conference on the Physics of Semiconductors. 1237-1240 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] M.Araki, Y.Hanada, H.Fujikura and H.Hasegawa: "Fabrication of InGaAs Quantum Wires and Dots by Selective Molecular Beam Epitaxial Growth on Various Mesa-Patterned (001) InP Substrates"Jpn.J.Appl.Phys. 36. 1763-1769 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Fujikura, M.Kubo and H.Hasegawa: "Excitation Power Dependent Photoluminescence Behavior in Etched Quantum Wires Having Silicon Interlayer-Based Edge Passivation and Its Interpretation"Jpn.J.Appl.Phys.. 36. 1937-1943 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] S.Kasai, K.Jinushi, H.Tomozawa and H.Hasegawa: "Fabrication and Characterization of GaAs Single Electron Devices Having Single and Multiple Dots Based on Schottky In-Plane-Gate and Wrap-Gate Control of Two dimensional Electron Gas"Jpn.J.Appl.Phys. 36. 1678-1685 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Okada, H.Fujikura, T.Hashizume and H.Hasegawa: "Observation of Coulomb Blockade Oscillations up to 50K in Gated InGaAs Ridge Quantum Wires Grown by Molecular Beam Epitaxy in InP substrates"Jpn.J.Appl.Phys.. vol.36, part 1, No.3B. 1672-1677 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Kudoh, H.Okada, T.Hashizume and H.Hasegawa: "Controlled Formation of Metal-Semiconductor Interface to 2DEG Layer by In-Situ Electrochemical Process and Its Application to In-Plane Gated Electron Waveguide Devices"Appl.Sur.Sci.. vol.117/118. 342-346 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] M.Kihara, H.Fujikura and H.Hasegawa: "Effect of Mis-Orientation of Mesa-Stripes on the growth of InGaAs Quantum Wires by Selective Molecular Beam Epitaxy"Appl.Sur.Sci.. vol.117/118. 385-389 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Hasegawa, S.Kodama, K.Ikeya and H.Fujikura: "Excitation Power Dependent Photoluminescence Characterization of Insulator-Semiconductor Interfaces on Near Surface Quantum Structures Passivated by Silicon Interface Control Layer Technology"Appl.Surf.Sci.. 117/118. 710-713 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] K.Ikeya, T.Hashizume and H.Hasegawa: "Successful Surface Passivation of Air-Exposed AlGaAs by a Silicon Interface Control LAyer-Based Technique"Jpn.J.Appl.Phys.. vol.36, part 1, No.3B. 1756-1762 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Fujikura, M.Araki, Y.Hanada, M.Kihara and H.Hasegawa: "Formation of Two-Dimensional Arrays of InP-Based InGaAs Quantum Dots on Patterned Substrates by Selective Molecular Beam Epitaxy"Jpn.J.Appl.Phys.. 36. 4092-4096 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Okada, S.Kasai, H.Fujikura, T.Hashizume and H.Hasegawa: "Basic Control Characteristics of Novel Schottky In-Plane and Wrap Gate Structures Studied by Simulation and Transport Measurements in GaAs and InGaAs Quantum Wires"Jpn.J.Appl.Phys.. vol.36, part 1, No.6B. 4156-4160 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] Y.Ishikawa, T.Fukui and H.Hasegawa: "Kink defacts and fermi level pinning on (2x4) reconstructed molecular beam epitaxially grown surfaces of GaAs and InP studied by ultrahigh-vacuum scanning tunneling microscopy and X ray photoelectron spectroscopy"J.Vac.Sci.Technol. B. vol.15. 1163-1172 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Hasegawa, T.Sato and T.Hashizume: "Evolution Mechanism of Nearly-Pinning Platinum/N-Type Indium Phosphide Interface with a High Schottky Barrier Height by In-Situ Electrochemical Process"J.Vac.Sci.Technol. B. vol.15. 1227-1235 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Hashizume, S.Shiobara and H.Hasegawa: "Dominant Electron Trap with Metastable state in Molecular Beam Epitaxial GaAs Grown at Low Temperatures"Jpn.J.Appl.Phys.. vol.36. 1775-1780 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] K.Ikeya, T.Hashizume and H.Hasegawa: "Successful Surface Passivation of Air-Exposed AlGaAs by a Silicon Interface Control Layer-Based Technique"Jpn.J.Appl.Phys.. vol.36. 1756-1762 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] Y.Dohmae, S.Suzuki, T.Hashizume and H.Hasegawa: "Capacitance-Voltage Behavior of Insulated Gate InGaAs HEMT Capacitor Having Silicon Interface Control Layer"Jpn.J.Appl.Phys.. vol.36. 1834-1840 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] Y.Ishikawa, T.Fukui and H.Hasegawa: "Missing-dimer structures and their kink defects on molecular beam epitaxially grown (2x4) reconstructed (001) InP and GaAs surfaces studied by ultrahigh-vacuum scanning tunneling microscopy"Jpn.J.Appl.Phys.. vol.36. 1749-1755 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Yoshida, T.Hashizume and H.Hasegawa: "Characterization of Interface Electronic Properties of Low Temperature Ultrathin Oxides and Oxynitrides Formed on Si (111) Surfaces by Contactless Capacitance-Voltage and Photoluminescence Methods"Jpn.J.Appl.Phys.. vol.36. 1453-1459 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Sato, S.Uno, T.Hashizume and H.Hasegawa: "Large Schottky Barrier Heights on Indium Phosphide-Based Materials Realized by In-Situ Electrochemical Process"Jpn.J.Appl.Phys.. vol.36. 1811-1817 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Hasegawa: "Interface-controlled Schottky barriers on InP and related materials"Solid-State Electron.. 41. 1441-1450 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] K.Iizuka, T.Hashizume and H.Hasegawa: "Small-Signal Response of Interface States at Passivated InGaAs Surfaces fromn Low Frequencies up to Microwave Frequencies"Solid-State Electron.. 41. 1463-1468 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] S.Suzuki, Y.Dohmae and H.Hashegawa: "Fabrication and electrical characterization of InP-based insulated gate power HEMTs using ultrathin Si interface control layer"Solid-State Electron.. 41. 1641-1646 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Hasegawa, T.Sato, H.Okada, K.Jinushi, S.Kasai and Y.Satoh: "Electrochemical Formation and Characterization of Schottky In-Plane and Wrap Gate Structures for Realization of GaAs- and InP-Based Quantum Wires and Dots"Appl.Surf.Sci.. 123/124. 335-338 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Hashizume, K.Ikeya, M.Mutoh and H.Hasegawa: "Surface Passivation of GaAs with Ultrathin Si3N4/Si Interface Control Layer Formed by MBE and In Situ ECR Plasma Nitridation"Appl.Surf.Sci.. 123/124. 599-602 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Takahashi, T.Hashizume and H.Hasegawa: "Novel InP Metal-Insulator-Semiconductor Structure Having an Ultrathin Silicon Interface Control Layer"Appl.Surf.Sci.. 123/124. 615-618 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] B.Adamowicz and H.Hasegawa: "Computer analysis of Surface Recombination process at Si and Compound semiconductor surfaces and behavior of surface recombination velocity"Japanese Journal of Applied Physics.. 37. 1631-1637 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Takahashi, T.Hashizume and H.Hasegawa: "Novel InP Metal-Insulator-Semiconductor Structure Having and Ultrathin silicon Interface Control Layer"Applied Surface Science.. 123/124. 615-618 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] Y.Satoh, S.Kasai, K.Jinushi and H.Hasegawa: "Computer Simulation and Experimental Characterization of Single Electron Transistors Based on Schottky Wrap Gate Control of 2DEG"Jpanese Journal of Applied Physics.. 37. 1584-1590 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Fujikura, Y.Hanada, M.Kihara and H.Hasegawa: "Controlled Formation of Narrow and Uniform InP-Based In0.53Ga0.47As Ridge Quantum Wire Arrays by Selective Molecular Beam Epitaxy"Japanese Journal of Applied Physics.. 37. 1584-1590 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Hashizume K.Ikeya, M.Muto and H.Hasegawa: "Surface Passivation of GaAs with Ultrathin Si3N4/SiInterface Control Layer Formed by MBE and in situ ECR Plasma Nitridation"Applied Surface Science.. 123/124. 599-602 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] N.Tsurumi, Y.Ishikawa, T.Fukui and H.Hasegawa: "In-situ Tunneling Microscope Study of Formation Process of Ultrathin Si Layer Molecular Beam Epitaxy on GaAs (001)-(2x4) Surface"Japanese Journal of Applied Physics.. 37. 1501-1507 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Hashizume, Y.Ishikawa, T.Yoshida and H.Hasegawa: "In-Situ Contactless Characterization of Microscopic and Macroscopic Properties of Si-Doped MBE-Grown (2x4) GaAs Surfaces"Japanese Journal of Applied Physics. 37. 1626-1630 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Hasegawa, T.Sato, H.Okada, K.Jinushi, S.Kasai and Y.Satoh: "Electrochemical Formation and Characterization of Schottky In-Plane and Wrap Gate Structures for Realization of GaAs-and InP-Based Quantum Wires and Dots"Applied Surface Science.. 123/124. 335-338 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] Y.Ishikawa, N.Tsurumi, T.Fukui and H.Hasegawa: "Scanning tunneling microscopy and x-ray photoelectron spectroscopy studies of atomic level structure and Fermi Level pinning on GaAs (110) surfaces grown by molecular beam epitaxy"Journal of Vacuum Science and Technology B. 16. 2387-2394 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] S.Chakraborty, T.Yoshida, T.Hashizume and H.Hasegawa: "Formation of ultrathin oxynitride layers on Si (100) by low-temperature electron cyclotron resonance N2O plasma oxynitridation process"Journal of Vacuum Science and Technology B. 16. 2159-2164 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] B.Adamowicz, K.Ikeya, M.Mutoh, T.Saitoh, H.Fujikura and H.Hasegawa: "Photoluminescence characterization of air exposed AlGaAs surface and passivated ex situ by ultrathin silicon interface control layer"Physica E. 2. 261-266 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Sai, H.Fujikura and H.Hasegawa: "Gas Source Molecular Beam Epitaxial Growth of Inl-xGaxP on GaAs Using Tertiarybutylphosphine"Japnaese Journal of Applied Physics. 38. 151-158 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] Y.Satoh, H.Okada, K.Jinushi, H.Fujikura and H.Hasegawa: "Voltage Gain in GaAs-Based Lateral Single Electron Transistors Habing Three Schottky Wrap Gates"Japanese Journal of Applied Physics. 38. 415-417 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Fujikura, Y.Hanada, T.Muranaka and H.Hasegawa: "Control of Dot Size and Tunneling Barrier Profile in In0.53Ga0.47As Coupled Quantum Wire-Dot Structures Grown by Selective. Molecular Beam Epitaxy on Patterned InP Substrates"Japanese Journal of Applied Physics. 38. 421-424 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Sai, H.Fujikura and H.Hasegawa: "Study of Reflection High-Energy Electron Diffraction Oscillation for Optimization fo Tertiarybutylposphine-Based Molecutular Beam Epitaxial growth of In0.48Ga0.52P on GaAs"Japanese Journal of Applied Physics. 38. 824-831 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Fujikura, M.Kihara, and H.Hasegawa: "Extra-Side-Facet Control in Selectrive Molecular Beam Epitaxial Growth of InGaAs Ridge Quantum Wires for Improvement of Wire Uniformity"Japanese Journal of Applied Physics. 38. 1067-1070 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Muranaka, H.Okada, H.Fujikura and H.Hasegawa: "Size-Controlled Formation of Decananometer InGaAs Quantum Wires by Selective Molecular Beam Epitaxy on InP Patterned Substrates"Japanese Journal of Applied Physics. 38. 1071-1074 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Hasegawa Koyama, Y and T.Hashizume: "Fermi Level Pinning and Schottky Barrier Height Control at Metal Semiconductor Interfaces of GaN and Related Materials"Japanese Journal of Applied Physics. 38. 1098-1102 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Sato, C.Kaneshiro and H.Hasegawa: "Strong Correlation Between Interface Microstructure and Barrier Height in n-InP Schottky Contacts Formed by In Situ Electrochemical Process"Japanese Journal of Applied Physics. 38. 1103-1106 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] M.B.Takeyama, A.Noya, Hashizume. T and H.Hasegawa: "Interfacial Reaction and Electrical Properties in the Sputter-Deposited Al/Ti Ohmic Contact to n-InP"Japanese Journal of Applied Physics. 38. 1115-1118 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Takahashi, T.Sato and H.Hasegawa: "X-ray Photoelectron Spectroscopy and Ultrahigh Vacuum Contactless Capacitance-Voltage Characterization of Novel Oxide-Free InP Passivation Process Using a Silicon Surface Quantum Well"Japanese Journal of Applied Physics. 38. 1128-1132 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] C.Kaneshiro, T.Sato and H.Hasegawa: "Electrochemical Etching of Indium Phosphide Surfaces Studied by Volammetry and Scanned Probe Microscopes"Japanese Journal of Applied Physics. 38. 1147-1152 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] B.Adamowicz, M.Miczek, K.Ikeya, M.Mutoh, T.Saitoh, H.Fujikura and H.Hasegawa: "Electronic Properties of AlxGal-xAs surface Passivated by Ultrathin Silicon Interface Control Layer"Applied Surface Science.. 141. 326-332 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Fujikura, T.Muranaka and H.Hasegawa: "Selective Growth of Quantum Wire-Dot Coupled Structures with Novel High Index Facets for InGaAs Single Electron Transistor Arrays"Microelectronics. 30. 397-401 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] M.Mutoh, M.Tsurumi and H.Hasegawa: "Effects of Initial Surface Reconstruction on Silicon Interface Control Layer Based Passivation of (001) GaAs Surfaces Studied in an Ultrahigh-Vacuum Multichamber System"Japanese Journal of Applied Physics. 38. 2538-2543 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Yoshida, H.Hasegawa and T.Sakai: "A Novel Non-Destructive Characterization Method of Electronic Properties of Pre-and Post-Processing Silicon Surfaces Based on Ultrahigh-Vacuum Contactless Capacitance-Voltage Measurements"Japanese Journal of Applied Physics. 38. 2349-2354 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Hasegawa, Y.Koyama and T.Hashizume: "Properties of Metal-Semiconductor Interfaces Formed on n-Type GaN"Japanese Journal of Applied Physics. 38. 634-2639 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Sato, C.Kaneshiro, H.Okada and T.Hasegawa: "Formation of Size-and Position-Controlled Nanometer Size Pt Dots on GaAs and InP Substrates by Pulsed Electrochemical Deposition"Japanese Journal of Applied Physics. 38. 2448-2452 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] J.Nakamura, T.Kudoh, H.Okada and H.Hasegawa: "Transport Properties of Schottky In-Plane-Gate GaAs Single and Coupled Quantum Wire Transistors"Inst.Phys.Conf.Ser.. 162. 409-414 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] N.Ono, H.Fujikura and H.Hasegawa: "Study of Selective MBE Growth on Patterned (001) InP Substrates Toward Realization of $\langle100\rangle$-Oriented InGaAs Ridge Quantum Wires"Inst.Phys.Conf.Ser.. 162. 385-390 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] C.Kaneshiro, T.Sato and H.Hasegawa: "Realization of Strongly Metal-Dependent Schottky Barrier Heights on n GaAs by In Situ Electrochemical Process"Inst.Phys.Conf.Ser. 162. 585-590 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Muranaka, H.Okada, H.Fujikura and H.Hasegawa: "Realization of InP-Based InGaAs Single Electron Transistors on Wires and Dots Grown by Selective MBE"Microelectronic Engineering. 47. 201-203 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Okada, T.Sato, K.Jinushi and H.Hasegawa: "GaAs-Based Single Electron Logic and Memory Devices Using Electro-Deposited Nanometer Schottky Gates"Microelectronic Engineering. 47. 285-287 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Sai, H.Fujikura, A.Hirama and H.Hasegawa: "Growth of Device Quality InGaP/GaAs Heterostructures by Gas Source Molecular Beam Epitaxy using Tertiarybutylphosphine"Solid State Electronics. 43. 1541-1546 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Takahashi, T.Yoshida, M.Mutoh, T.Sakai and H.Hasegawa: "In-situ Characterization Technique of Compound Semiconductor Heterostructure Growth and Device Processing Steps Based on UHV Contactless Capacitance-Voltage Measurement"Solid State Electronics. 43. 1561-1570 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] Y.Koyama, T.Hashizume and H.Hasegawa: "Formation Processes and Properties of Schottky and Ohmic Contacts on n-type GaN form Field Effect Transistor Applications"Solid State Electronics. 43. 1483-1488 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] A.Hamamatsu, C.Kaneshiro, H.Fujikura and H.Hasegawa: "Formation of <001>-Aligned Nano-Scale Pores on (001) n-InP Surfaces by Photoelectrochemical Anodization in HCI"J.Electroanalytical Chem.. 473. 223-229 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Hasegawa H.Fujikura and H.Okada: "Molecular Beam Epitaxy and Device Applications of III-V Senmiconductor Nanowires"MRS Bulletin. 24. 25-30 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] B.Adamowicz and H.Hasegawa: "Computer Simulation of the Surface Photovoltage on Si and GaAs Surfaces with U-shaped Surface State Continuum"Vacuum. 54. 173-177 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Hasegawa, T.Sato and C.Kaneshiro: "Properties of nanometer-sized metal-semiconductor interfaces of GaAs and InP formed by an in situ electrochemical process"Journal of Vacuum Science and Technology B. 17. 1856-1866 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Okada and H.Hasegawa: "Characterization of GaAs Schottky in-plane gate quantum wire transistors for switching of quantized conductance"Physica B. 272. 23-126 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] S.Kasai, Y.Satoh and H.Hasegawa: "Conductance oscillation characteristics of GaAs Schottky wrap-gate single electron transistors"Physica B. 272. 88-91 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Hasegawa, T.Sato and S.Kasai: "Unpinning of Fermi level in nanometer-sized Schottky contacts on GaAs and InP"Applied Surface Science. 166. 92-96 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Takahashi and H.hasegawa: "In situ UHV contactless C-V and XPS characterization of surface passivation process for InP using a partially nitrided Si interface control layer"Applied Surface Science.. 166. 526-531 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Fujikura, T.Muranaka and H.Hasegawa: "Formation of device-oriented InGaAs coupled quantum structures by selective MBE growth on patterned InP substrates"Physica E. 7. 864-869 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] C.Jiang, H.Fujikura and H.Hasegawa: "Vertical barrier layer formation during selective MBE growth of InGaAs ridge quantum wires on InP patterned substates"Physica E. 7. 902-906 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Hasegawa and S.Kasai: "Prospects and Key Issues for Compound Semiconductor Quantum Devices"Tehenical Report of IEICE. ED2000-51. 43-48 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Hasegawa: "Advanced mesoscopic device concepts and technology"Microelectronic Engineering. 53. 29-36 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] N.Negoro, H.Fujikura and H.Hasegawa: "Scanning tunneling microscopy and spectroscopy study of ultrathin Si interface control layers grown on (001) GaAs for surface passivation"Applied Surface Science. 159/160. 292-300 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] S.Anantathanasarn, S.Ootomo, T.Hashizume and H.Hasegawa: "Surface passivation of GaAs by ultra-thin cubic GaN layer"Applied Surface Science. 159/160. 456-461 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Shiozawa, T.Yoshida, T.Hashizume and H.Hasegawa: "Correlation between interface state properties and electron transport at ultrathin insulator/Si interfaces"Applied Surface Science. 159/160. 98-103 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Hasegawa: "MBE growth and applications of silicon interface control layers"Thin Solid Films. 367. 58-67 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Hasegawa, N.Negoro, S.Kasai, Y.Ishikawa and H.Fujikura: "Effects of gap states on scanning tunneling spectra observed on (110)-and (001)-oriented molecular beam epitaxy"Journal of Vacuum Science & Technology B. 18. 2100-2108 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] M.Iyawa, S.KaH.Sai, Okada, J.Nakamura and H.Hasegawa: "Chemical and Electrochemical Nanofabrication Processes for Schottky In-Plane Gate GaAs Single and Coupled Quantum Wire Transistors"Jpn.J.Appl.Phys.. 39. 4651-4652 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Fujikura, A.Liu, A.Hamamatsu, T.Sato and H.Hasegawa: "Electrochemical Formation of Uniform and Straight Nano-Pore Arrays on (001) InP Surfaces and Their Photoluminescence Characterizations"Jpn.J.Appl.Phys.. 39. 4616-4620 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Yoshida and H.Hasegawa: "Ultrahigh-Vacuum Contactless Capacitance-Voltage Characterization of Hydrogen Terminated-Free Silicon Surfaces"Jpn.J.Appl.Phys.. 39. 4504-4508 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Sato, S.Kasai, Okada and H.Hasegawa: "Electrical Properties of Nanometer-Sized Schottky Contacts on n-GaAs and n-InP Formed by in Situ Electrochemical Process"Jpn.J.Appl.Phys.. 39. 4609-4615 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] M.Yamada, H.Takahashi, T.Hashizume and H.Hasegawa: "Fabrication and Characterization of Novel Oxide-Free InP Metal-Insulator-Semiconductor FETs Hving an Ultra Narrow Si Surface Quantum Well"Jpn.J.Appl.Phys.. 39. 2407-2413 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] S.Ootomo, T.Hashizume and H.Hasegawa: "Nitridation of GaP (100) Surfaces by rf Nitrogen Radicals and by Electron Cyclotron Resonance Nitrogen Plasma"Jpn.J.Appl.Phys.. 39. 2407-2413 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Muranaka H.Fujikura and H.Hasegawa: "Selective MBE Growth of InGaAs Quantum Wire-Dot Coupled Structur es with Controlled Double-Barrier Potential Profiles"Inst.Phys.Conf.Ser.. 166. 187-190 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] S.Kasai, Y.Satoh and H.Hasegawa: "GaAs Quantum Wire Transistors and Single Electron Transistors using Schottky Wrap Gates for Quantum Integrated Circuits"Inst.Phys.Conf.Ser. 166. 219-222 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Muranaka, C.Jiang, A.Ito and H.Hasegawa: "Origing of Non-Uniformity in MBE Grown Nanometer-Sized InGaAs Ridge Quantum Wires and Its Removal by Atomic Hydrogen-Assisted Cleaning"Thin Solid Film. 380. 189-191 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] R.Nakasaki, T.Hashizume and H.Hasegawa: "Insulator-GaN interface structures formed by plasma-assisted chemical vapor deposition"Physica E. 7. 953-957 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] B.Adamowicz and H.Hasegawa: "Analysis of photoluminescence efficiency and surface recombination velocity of MBE- grown AlGaAs layers"Thin Solid Films. 367. 180-183 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] B.Adamowicz and H.Hasegawa: "computer analysis of photon-induced non-equilibrium phenomena at Si and AlGaAs surfaces"Vacuum. 57. 111-120 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] H.Hasegawa: "Fermi Level Pinning and Schottky Barrier Height Control at Metal-Semiconductor Interfaces of InP and Related Materials"Japanese Journal of Applied Physics. 38. 1098-1102 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] T.Muranaka: "Size-Controlled Formation of Decananometer InGaAs Quantum Wires by Selective Molecular Beam Epitaxy on InP Patterned Substrates"Japanese Journal of Applied Physics. 38. 1071-1074 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] H.Fujikura: "Extra-Side-Facet Control in Selective Molecular Beam Epitaxial Growth of InGaAs Ridge Quantum Wires for Improvement of Wire Uniformity"Japanese Journal of Applied Physics. 38. 1067-1070 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] M.B.Takeyama: "Interfacial Reaction and Electrical Properties in the Sputter-Deposited Al/Ti Ohmic Contact to n-InP"Japanese Journal of Applied Physics. 38. 1115-1118 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] C.Kaneshiro: "Electrochemical Etching of Indium Phosphide Surfaces Studied by Voltammetry and Scanned Probe Microscopes"Japanese Journal of Applied Physics. 38. 1147-1152 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] T.Sato: "The Strong Correlation Between Interface Microstructure and Barrier Height in n-InP Schottky Contacts Formed by In Situ Electrochemical Process"Japanese Journal of Applied Physics. 38. 1103-1106 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] H.Takahashi: "X-ray Photoelectron Spectroscopy and Ultrahigh Vacuum Contactless Capacitance-Voltage Characterization of Novel Oxide-Free InP Passivation Process Using a Silicon Surface Quantum Well"Japanese Journal of Applied Physics. 38. 1128-1132 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] Y.Sato: "Voltage Gain in GaAs-Based Lateral Single-Electron Transistors Having Three Schottky Wrap Gates"Japanese Journal of Applied Physics. 38. 410-414 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] J.Nakamura: "Transport Properties of Schottky In-Plane-Gate GaAs Single and Coupled Quantum Wire Trasistors"IOP conference series. 162. 409-414 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] N.Ono: "Study of Selective MBE Growth on Patterned (001) InP Substrates Toward Realization of <100>-Oriented InGaAs Ridge Quantum Wires"IOP conference series. 162. 385-390 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] C.Kaneshiro: "Realization of Strongly Metal-Dependent Schottky Barrier Heights on n-GaAs by In Situ Electrochemical Process"IOP conference series. 162(in press). (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] T.Muranaka: "Realization of InP-Based InGaAs Single Electron Transistors on Wires and Dots Groen by Selective MBE"Microelectronic Engineering. 47. 201-203 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] H.Okada: "GaAs-Based Single Electron Logic and Memory Devices Using Electro-Deposited Nanometer Schottky Gates"Microelectronic Engineering. 285-287 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] H.Sai: "Growth of Device Quality InGaP/GaAs Heterostructures by Gas Source Molecular Beam Epitaxy using Tertiarybutylphosphine"Solid State Electron. 1541-1546 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] H.Sai: "Study of Reflection High-Energy Electron Diffraction Oscillation for Optimization of Tertiarybutylphosphine-Based Molecular Beam Epitaxial Growth of In_<0.48>Ga_<0.52>P on GaAs"Japanese Journal of Applied Physics. 38. 824-831 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] H.Sai: "Gas Source Molecular Beam Epitaxial Growth of In_<1-x>Ga_xP on GaAs Using Tertiarybutylphosphine"Japanese Journal of Applied Physics. 38. 151-158 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] H.Hasegawa: "Properties of Metal-Semiconductor Interfaces Formed on n-type GaN"Japanese Journal of Applied Physics. 38. 2637-2639 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] T.Sato: "Formation of Size- and Position-Controlled Nanometer Size Pt Dots on GaAs and InP Substrates by Pulsed Electrochemical Deposition"Japanese Journal of Applied Physics. 38. 2448-2452 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] T.Yoshida: "A Novel Non-Destructive Characterization Method of Electronic Properties of Pre- and Post-Processing Silicon Surfaces Based on Ultrahigh-Vacuum Contactless Capacitance-Voltage Measurements"Japanese Journal of Applied Physics. 38. 2349-2354 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] M.Mutoh: "Effects of Initial Surface Reconstruction on Silicon Interface Control Layer Based Passivation of(001)GaAs Surfaces Studied in an Ultrahigh-Vacuum Multichamber System"Japanese Journal of Applied Physics. 38. 2538-2543 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] H.Takahashi: "In-situ Characterization Technique of Compound Semiconductor Heterostructure Growth and Device Processing Steps Based on UHV Contactless Capacitance-Voltage Measurement"Solid-State Electronics. 43. 1561-1570 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] Y.Koyama: "Formation Processes and Properties of Schottky and Ohmic Contacts on n-type GaN form Field Effect Transistor Applications"Solid-State Electronics. 43. 1483-1488 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] A.Hamamatsu: "A.Hamamatsu, C.Kaneshiro, H.Fujikura and H.Hasegawa, "Formation of <001>-Aligned Nano-Scale Pores on (001) n-InP Surfaces by Photoelectrochemical Anodization in HCI"Journal of Electroanalytical Chemistry. 223-229 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] B.Adamowicz: "Electronic Properties of Al_xGa_<1-x>As Surface Passivation by Ultrathin Silicon Interface Control Layer"Applied Surface Science. 141. 326-332 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] B.Adamowicz: "Computer simulation of the surface photovoltage on Si and GaAs surfaces with U-shaped surface state continuum"Vacuum. 54. 137-177 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] H.Hasegawa: "Molectular-Beam Epitaxy and Device Applications of III-V Semiconductor Nanowires"MRS Bulletin. 24. 25-30 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] H.Hasegawa: "Properties of nanometer-sized metal-semiconductor interfaces of GaAs and InP formed by an in situ electrochemical process"Journal of Vacuum Science and Techonolgy. B17. 1856-1866 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] H.Okada: "Characterization of GaAs Schottky in-plane gate quantum wire transistors fow switching of quantized conductance"Physica B. 272. 123-126 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] S.kasai: "Conductance oscillation characteristics of GaAs Schottky wrap-gate single-electron transistors"Physica B. 272. 88-91 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] H.Fujikura: "Selective growth of quantum wire-dot couple structures with novel high index facets for InGaAs single electron transistor arrays"Microelectronics Journal. 30. 397-401 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] T.Tanaka: "A novel GaAs flip-chip power MODFET with high gain and efficiency"Solid-State Electronics. 43. 1405-1411 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] D.Ueda: "Implementation of GaAs monolithic microwave integrated circuits with on-chip BST capacitors"Journal of Electroceramics. 3. 105-113 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] H.Hasegawa: "Advanced mesoscopic device concepts and technology"Microelectronic Engineering. (in press). (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] H.Hasegawa: "MBE Growth and Applications of Silicon Interface Control Layers"Thin Solid Films. (in press). (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] H.Hasegawa: "Unpinning of Fermi Level in Nanometer-Sized Schottky Contacts on GaAs and InP"Applies Surface Science. (in press). (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] H.Fujikura: "Formation of Device-Oriented InGaAs Coupled Quantum Structures by Selective MBE Growth on Patterned InP Substrates"Physica E. (in press). (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] T.Sato: "Electrical Properties of Nanometer-Sized Schottky Contacts on n-GaAs and n-InP Formed by in situ Electrochemical Process"Japanese Journal Applies Physics. (in press). (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] M.Iwaya: "Chemical can Electrochemical Nanofabrication Processes for Schottky In-Plane Gate GaAs Single and Coupled Quantum Wire Transistors"Japanese Journal Applies Physics. (in press). (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] S.kasai: "GaAs quantum wire transistor and single electron transistors using Schottky wrap gates for quantum integrated circuits"IOP conference series. (in press). (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] T.Muranaka: "Selective MBE growth of InGaAs quantum wire-dot coupled structures with controlled double-barrier potential profiles"IOP conference series. (in press). (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] N.Negoro: "Scanning Tunneling Microscopy and Spectroscopy Study of Ultrathin Si Interface Control Layers Grown on (001) GaAs for Surface Passivation"Applied Surface Science. (in press). (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] S.Ootomo: "Nitridation of GaP(100) Surfaces by Rf Nitrogen Radicals and by ECR Nitrogen Plasma"Japanese Journal of Applied Physics. 39(in press). (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] M.Yamada: "Fabrication and Characterization of Novel Oxide-Free InP MISFET Having and Ultra-Narrow Si Surface Quantum Well"Japanese Journal of Applied Physics. 39(in press). (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] R.Nakasaki: "Insulator-GaN Interface Structures Formed by Plasma-Assisted Chemical Vapor Deposition"Physica E. (in press). (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] C.Jiang: "Vertical Barrier Layer Formation during Selective MBE Growth of InGaAs Ridge Quantum Wires on InP Patterned Substrates"Physica E. (in press). (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] S.Anantathanasarn: "Surface Passivation of GaAs by Ultra-thin Cubic GaN Layer"Applied Surface Science. (in press). (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] K.Ueno: "Growth and characterization of Ga_2Se_3/GaAs(100) epitaxial thin films"J.Cryst.Growth. 207. 69-75 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] N.Sawaki: "Electron tunneling time into a quantum disk"Microelectronic Engineering. 47. 143-145 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] H.Kondo: "Coulomb blockade phenomena in low-dimensional Si MOSFETs fabricated using focused-ion-beam implantation"Jpn.J.Appl.Phys.. 38. 7222-7226 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] T.Hanjiri: "Self-formation of ultrasmall structures on Si substrates for nano-device array"J.Cryst.Growth. (in press). (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] S.Dutta: "Silicon based single electron memory using multi-tunnel junction fabricated by electron beam direct wtiting"Appl.Phys.Lett.. 75. 1422-1424 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] T.Nakanishi: "Structure and photoelectrochemical properties of laminated monoparticle layers of CdS and ZnS on gold"Jpn.J.Appl.Phys.. 38. 518-521 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] I.V.Ignatiev: "Anti-Stokes photoluminescence of InP self-assembledquantum dots in the presence of electric current"Phys.Rev.B. 60. R14001 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] M.Iwaki: "Time-resolved spectroscopy of chlorophyll-a like electron acceptor in the reaction center complex of the green sulfur bacterium Chlorobium tepidum"Plant and Cell Physiol. 40. 1021-1028 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] L.Mantese: "Analysis of high-index Si(100) surfaces by reflectance difference spectroscopy"J.Vac.Sci.Technol A. 17. 1652-1656 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] K.Murakoshi: "Anisotropic agglomeration of surface-modified gold nanoparticles in solution and on sold surfaces"Jpn.J.Appl.Phys.. (in press). (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] S.Nakabayashi: "Two dimensional metal deposition at liquid/liquid interface : potential and magnetohydrodynamic pattern transition"J.Electroanal.Cehm. 473. 54-58 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] M.Fujii: "Photoluminescence from Si nanocrystals dispoersed in phosphosilicate glass thin films : improvement of photoluminecsence efficiency"Appl.Phys.Lett.. 75. 184-186 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] H.Hasegawa: "Electrochemical formation and characterization of Schottky in-plane and wrap gate structures for realization of GaAs-and InP-based quantum wires and dots" Applied Surface Science. 123/124. 335 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] T.Hashizume: "Surface passivation of GaAs with ultrathin Si_3Ni_4/Si interface control layer formed by MBE and in situ ECR plasma nitridation" Applied Surface Science. 123/124. 599 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] H.Takahashi: "Novel InP metal-insulator-semiconductor structure having an ultrathin silicon interface control layer"" Applied Surface Science. 123/124. 615 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] B.Adamowicz: "Photoluminescence characterization of air exposed AlGaAs surface and passivated ex situ by ultrathin silicon interface control layer" PhysicaE. 2. 261 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] N.Tsurumi: "In-Situ Tunneling Microscope Study of Formation Process of Ultrathin Si Layer by Molecular Beam Epitaxy on GaAs (001)-(2x4) Surface" Japanese Journal of Applied Physics. 37. 1501 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] Y.Sato: "Computer Simulation and Experimental Characterization of Single Electron Transistors Based on Schottky Wrap Gate Control of 2DEG" Japanese Journal of Applied Physics. 37. 1584 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] H.Fujikura: "Controlled Formation of Narrow and Uniform InP-Based In_<0.53>Ga_<0.47>As Ridge Quantum Wire Arrays by Selective Molecular Beam Epitaxy" Japanese Journal of Applied Physics. 37. 1532 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] T.Hashizume: "In-Situ Contactless Characterization of Microscopic and Macroscopic Properties of Si-doped MBE-Grown (2x4) GaAs Surface" Japananese Journal of Applied Physics. 37. 1626 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] B.Adamowicz: "Computer Analysis of Surface Recombination Process at Si and Compound Semiconductor Surface and Behavior of Surface Recombination Velocity" Japanese Journal of Applied Physics. 37. 1631 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] Y.Hanada: "Direct Formation of InGaAs Coupled Quantum Wire-Dot Structured by Selective Molecular Beam Expitaxy on InP Patterned Substrates" Solid State Electronics. 42. 1413 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] H.Okada: "A Novel Wrap-Gate-Controlled Single Electron Transistor Formed on an InGaAs Ridge Quantum Wire Grown by Selective MBE" Solid State Electronics. 42. 1419 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] S.Chkraborty: "Formation of ultrathin oxynitride layers on Si (100) by low-temperature electron cyclotron resonance N_2O plasma oxynitridation process" Journal of Vacuum Science and Technology. B16. 2159 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] Y.Ishikawa: "Scanning tunneling microscopy and x-ray photoelectron spectroscopy studies of atomic level structure and Fermi level pinning on GaAs (110) surfaces grown by molecular beam epitaxy" Journal of Vacuum Science and Technology. B16. 2387 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] Y.Sato: "Voltage Gain in GaAs-Based Lateral Single-Electron Transistors Having Three Schottky Wrap Wrap Gates" Japanese Journal of Applied Physics. 38(in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] H.Fujikawa: "Control of Dot Size and Tunneling Barrier Profile in In_<0.53>Ga_<0.47>As Coupled Quantum Wire-Dot Structures Grown by Selective Molecular Beam Epitaxy on Patterned InP Substrates" Japanese Journal of Applied Physics. 38(in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] T.Muranaka: "Size-Controlled Formation of Decananometer InGaAs Quantum Wires by Selective Molecular Beam Epitaxy on InP Patterned Substrates" Japanese Journal of Applied Physics. 38(in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] H.Fujikura: "Extra-Side-Facet Control in Selective Molecular Beam Epitaxial Growth of InGaAs Ridge Quantum Wires for Improvement of Wire Uniformity" Japanese Journal of Applied Physics. 38(in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] M.B.Takeyama: "Interfacial Reaction and Electrical Properties in the Sputter-Deposited Al/Ti Ohmic Contact to n-InP" Japanese Journal of Applied Physics. 38(in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] T.Sato: "Strong Correlation Between Interface Microstructure and Barrier Height in n-InP Schottky Contacts Formed by In Situ Electrochemical Process" Japanese Journal of Applied Physics. 38(in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] C.Kaneshiro: "Electrochemical Etching of Indium Phosphide Surfaces Studied by Voltammetry and Scanned Probe Microscopes" Japanese Journal of Applied Physics. 38(in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] H.Takahashi: "XPS and UHV Contactless C-V Characterization of Novel Oxide-Free InP Passivation Process Using Silicon Surface Quantum Well" Japanese Journal of Applied Physics. 38(in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] H.Fujikura: "Formation of Highly Uniform InGsAs Ridge Quantum Wire by Selective Molecular Beam Epitaxy on Novel InP Patterned Substrates" Thin Solid Film. (in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] H.Fujikura: "Selective MBE Growth of Quantum Wire-Dot Coupled Structures with Novel High Index Facets for InGaAs Single Electron Transistor Arrays" Microelectronics. (in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] J.Nakamura: "Transport Properties of Schottky In-Plane-Gate GaAs Single and Coupled Quantum Wire Transistors" IOP conference series. (in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] N.Ono: "N.Ono. H.Fujikura and H.Hasegawa : “Study of Selective MBE Growth on Patterned (001) InP Substrates Toward Realization of <100>-Oriented InGaAs Ridge Quantum Wires" IOP conference series. (in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] C.Kaneshiro: "Realization of Strongly Metal-Dependent Schottky Barrier Heights on n-GaAs by In Situ Electrochemical Process" IOP conference series. (in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] T.Muranaka: "Realization of InP-Based InGaAs Single Electron Transistors on Wires and Dots Grown by Selective MBE" Microelectronic Engineering. (in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] H.Okada: "GaAs-Based Single Electron Logic and Memory Devices Using Electro-Deposited Nanometer Schottky Gates" Microelectronic Engineering. (in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] H.Sai: "Growth of Device Quality InGaP/GaAs Heterostructures by Gas Source Molecular Beam Epitaxy using Tertiarybutylphosphine" Solid State Electronics. (in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] H.Sai: "Study of Reflection Highly-Energy Electron Diffraction Oscillation for Optimization of Tertiarybutylphosphine-Based Molecular Beam Epitaxial Growth of In_<0.48>Ga_<0.52>P on GaAs" Japanese Journal of Applied Physics. 38(in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] H.Sai: "H.Sai, H.Fujikura and Hasegawa : “Gas Source Molecular Beam Epitaxial Growth of In_<1-x>Ga_xP on GaAs Using Tertiarybutylphosphine" Japanese Journal of Applied Physics. 38(in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] H.Hasegawa: "Properties of Metal-Semiconductor Interfaces Formed on n-type GaN" Japanese Journal of Applied Physics. 38(in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] T.Sato: "Formation of Size- and Position-Controlled Nanometer Size Pt Dots on GaAsand InP Substrates by Pulsed electrochemical Depositionc" Japanese Journal of Applied Physics. 38(in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] T.Yoshida: "A Novel Non-Destructive Characterization Method of Electronic Properties of Pre- and Post-Prosessing Silicon Surfaces Based on Ultrahigh-Vacuum Contactless Capacitance-Voltage Measurements" Japanese Journal of Applied Physics. 38(in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] M.Mutoh: "Effects of Initial Surface Reconstruction on Silicon Interface Control Layer Based Passivation of (001) GaAs Surfaces Studied in an Ultrahigh-Vacuum Multichamber System" Japanese Journal of Applied Physics. 38(in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] H.Takahashi: "In-Situ Characterization Technique of Compound Semiconductor Heterostructure Growth and Device Processing Steps Based on UHV Contactless Capacitance-Voltage Measurement" Solid-State Electron.(in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] Y.Koyama: "Formation Processes and Properties of Schottky and Ohmic Contacts on n-type GaN form Field Effect Transistor Applications" Solid-State Electron.(in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] A.Hamamatsu: "Formation of <001>-Aligned Nano-Scale Pores on (001)n-InP Surfaces by Photoelectrochemical Anodization in HCl" Journal of Electroanalytical Chemistry. (in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] J.L.Wang: "Mn (thin-film)/Si(substrate) conacts : Analysis of the buried interface by sofy X-ray emission spectroscopy" Japanese Journal of Applied Physics. 38. 198 (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] K.Ueno: "A novel method to fabricate a molecular quantum structure : Selective growth of C60 on layered metarial heterostructures" Japanese Journal of Applied Physics. 38. 511 (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] N.Sawaki: "Electron tunneling time into a quantum disk" Microelectronic Engineering. (in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] H.Kondo: "Conductance oscillations in low-dimensional ion implanted regions annealead by rapid thermal annealing" Japanese Journal of Applied Physics. 38(in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] S.Nomura: "Enhancement of photoluminescence near Fermi level in bias voltage controlled quantum dot array" Solid-State Communications. 106. 815 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] M.Otobe: "Observation of single electron charging effect in nanocrystalline silicon at room temperature using atomic force microscopy" Applied Physics Letters. 72. 1089 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] B.Ullrich: "Optical and Hybrid the Propertiesof the ZnSe/InSe Heterojunctions" Solid State Commun.107. 209 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] T.Loher: "Van der Waals Type Buffer Layers : Epitaxial Growth of the Large Lattice Mismatch System CdS/InSe/H-Si (100)" Appl.Sur.Sci.130-132. 334 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] Y.Kawaguchi: "Selective area growth of GaN on Si substrates using SiO2 mask by MOVPE" Japanese Journal of Applied Physics. 37. L966 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] M.Ishida: "Computer simulation of tunneling transfer and formation of resonant states in a GaAs/AlGaAs 2DEG disk" Japanese Journal of Applied Physics. 38(in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] H.Iwano: "Hopping conduction and localized states in p-Si wires formed by focused ion beam implantations" Journal of Vacuum Science & Technology B. 16. 2558 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] J.P.Bird: "Intrinsic stable orbits in open quantum dots" Semicond.Sci.Technol.13. A4 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] K.Ishibashi: "Characterization of SET electrometer coupled to the quantum dot in GaAs/AlGaAs 2DEG" Microelectronics Engineering. (in press). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] Y.Hanada: "Direct Formation of InGaAs Coupled Wire-Dot Structures by Selective Molecular Beam Epitaxy on InP Patterned Substrates" Solid State Electronics. 印刷中 (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] H.Okada: "A Novel Wrap-Gate-Controlled Single Electron Transistor Formed on an InGaAs Ridge Quantum Wire Grown by Selective MBE" Solid State Electronics. 印刷中 (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] T.Hashizume: "In-Situ Contactless Characterization of Microscopic and Macroscopic Properties of Si-doped MBE-Grown(2x4)GaAs Surfaces" Japanese Journal of Applied Physics. 印刷中 (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] H.Fujikura: "Controlled Formation of Narrow and Uniform InP-Based InGaAs Ridge Quantum Wire Arrays by Selective Molecular Beam Epitaxy" Japanese Journal of Applied Physics. 印刷中 (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] B.Adamowicz: "Computer Analysis of Surface Recombination Process at Si and Compound Semiconductor Surfaces and Behavior of Surface Recombination Velocity" Japanese Journal of Applied Physics. 印刷中 (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] N.Tsurumi: "In-Situ UHV-STM Study of Formation Process of Ultrathin MBE Si Layer on GaAs(001)-(2x4)Surface" Japanese Journal of Applied Physics. 印刷中. (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] Y.Satoh: "Computer Simulation and Experimental Characterization of Single Electron Transistors Based on Schottky Wrap Gate Control of 2DEG" Japanese Journal of Applied Physics. 印刷中. (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] H.Hasegawa: "Electrochemical Formation and Characterization of In-Plane and Wrap Gate Structures for Realization of GaAs-and InP-Based Quantum Wires and Dots" Applied Surface Science. 123/124. (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] T.Hashizume: "Surface Passivation of GaAs with Ultrathin Si_3N_4/Si Inter-face Control Layer Formed by In-Situ ECR Plasma Nitridation" Applied Surface Science. 123/124. (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] H.Takahashi: "Novel InP Metal-Insulator-Semiconductor Structure Having Ultrathin Silicon Interface Control Layer" Applied Surface Science. 123/124. (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] H.Hasegawa: "Interface-Controlled Schottky Barriers on InP and Related Materials" Solid State Electronics. 41. 1441-1450 (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] S.Suzuki: "Fabrication and Electrical Characterization of InP-Based Insulated Gate Power HEMTs Using Ultrathin Si Interface Control Layer" Solid State Electronics. 41. 1641-1646 (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] B.Adamowicz: "Photoluminescence Characterization of Air Exposed AlGaAs Surface and Passivated Ex-Situ by Ultrathin Silicon Interface Control Laye" Physica E. 印刷中. (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] H.Hasegawa: "Formation of InP-Based Quantum Structures by Selective MBE on Patterned Substrates Having High-Index Facets" Microelectronics Journal. 28. 887-901 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] M.Araki: "Fabrication of InGaAs Quantum Wires and Dots by Selective Molecular Beam Epitaxial Growth on Various Mesa-Patterned(001)InP Substrates" Japanese Journal of Applied Physics. 36. 1763-1769 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] H.Fujikura: "Excitation Power Dependent Photoluminescence Behavior in Etched Quantum Wires Having Silicon Interlayer-Based Edge Passivation and Its Interpretation" Japanese Journal of Applied Physics. 36. 1937-1943 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] S.Kasai: "Fabrication and Characterization of GaAs Single Electron Devices Having Single and Multiple Dots Based on Schottky In-Plane-Gate and Wrap-Gate Control of Two-Dimensional Electron Gas" Japanese Journal of Applied Physics. 36. 1678-1685 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] H.Okada: "Observation of Coulomb Blockade Oscillations up to 50K in Gated InGaAs Ridge Quantum Wires Grown by Molecular Beam Epitaxy in InP substrates" Japanese Journal of Applied Physics. 36. 1672-1677 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] T.Kudoh: "Controlled Formation of Metal-Semiconductor Interface to 2DEG Layer by In-Situ Electrochemical Process and Its Application to In-Plane Gated Electron Waveguide Devices" Applied Surface Science. 117/118. 342-346 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] M.Kihara: "Effect of Mis-Orientation of Mesa-Stripes on the Growth of InGaAs Quantum Wires by Selective Molecular Beam Epitaxy" Applied Surface Science. 117/118. 385-389 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] H.Hasegawa: "Excitation Power Dependent Photoluminescence Characterization of Insulator-Semiconductor Interfaces on Near Surface Quantum Structures Passivated Silicon Interface Control Layer Technology" Applied Surface Science. 117/118. 710-713 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] K.Ikeya: "Successful Surface Passivation of Air-Exposed AlGaAs by a Silicon Interface Control LAyer-Based Technique" Japanese Journal of Applied Physics. 36. 1756-1762 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] H.Fujikura: "Formation of Two-Dimensional Arrays of InP-Based InGaAs Quantum Dots on Patterned Substrates by Selective Molecular Beam Epitaxy" Japanese Journal of Applied Physics. 36. 4092-4096 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] H.Okada: "Basic Control Characteristics of Novel Schottky In-Plane and Wrap Gate Structures Studied by Simulation and Transport Measurements in GaAs and InGaAs Quantum Wires" Japanese Journal of Applied Physics. 36. 4156-4160 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] Y.Ishikawa: "Kink defects and fermi level pinning on(2x4)reconstructed molecular beam epitaxially grown surfaces of GaAs and Inp studied by ultrahigh-vacuum scanning tunneling microscopy and X-ray photoelectron spectroscopy" Journal of Vacuum Science and Technology B. 15. 1163-1172 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] H.Hasegawa: "Evolution Mechanism of Nearly-Pinning Platinum/N-Type Indium Phosphide Interface with a High Schottky Barrier Height by In-Situ Electrochemical Process" Journal of Vacuum Science and Technology B. 15. 1227-1235 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] Y.Dohmae: "Capacitance-Voltage Behavior of Insulated Gate InGaAs HEMT Capacitor Having Silicon Interface Control Layer" Japanese Journal of Applied Physics. 36. 1834-1840 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] Y.Ishikawa: "Missing-dimer structures and their kink defects on molecular beam epitaxially grown(2x4)reconstructed(001)InP and GaAs surfaces studied by ultrahigh-vacuum scanning tunneling microscopy" Japanese Journal of Applied Physics. 36. 1749-1755 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] T.Sato: "Large Schottky Barrier Heghts on Indium Phosphide-Based Materials Realized by In-Situ Electrochemical Process" Japanese Journal of Applied Physics. 36. 1811-1817 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] T.Hashizume: "Dominant Electron Trap with Metastable state in Molecular Beam Epitaxial GaAs Grown at Low Temperatures" Japanese Journal of Applied Physics. 36. 1775-1780 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] T.Yoshida: "Characterization of Interface Electronic Properties of Low-Temperature Ultrathin Oxides and Oxynitrides Formed on Si(111)Surfaces by Contactless Capacitance-Voltage and Photoluminescence Methods" Japanese Journal of Applied Physics. 36. 1453-1459 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] T.Jikimoto: "Photoemission Study of 6H-SiC(0001)Si face" Applied Surface Science. 117/118. 794 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] M.Hirai: "Investigation of metal/SiC interface using electron spectroscopy and scanning tunneling microscopy" Applied Surface Science. 113/114. 467 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] T.Loher: "Heteroepitaxial Growth of Lattice Mismatched Materials using Layered Compound Buffer Layers" Applied Surface Science. (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] K.Ueno: "Fabrication of C_<60> Nanostructures by Selective Growth on GaSe/MoS_2 and InSe/MoS_2 Heterostructure Substrates" Applied Surface Science. (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] K.Sasaki: "Nanostructure Fabrication Using Selective Growth on Nanosize Patterns Drawn by a Scanning Probe Microscope" Japanese Journal of Applied Physics. 36. 4061-4064 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] S.Niwa: "Energy relaxation of photo-excited hot electrons under an external electric field in a quasi-one dimensional structures" Physica Status Solidi(b). 204. 283-286 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] N.Sawaki: "Tunneling transfer and energy relaxation rate of photo-excited carriers in coupled quantum wells" Japanese Journal of Applied Physics. 36. 4008-4012 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] N.Sawaki: "Effect of carrier-carrier scattering on the tunneling and energy relaxation process in a coupled quantum well" Physica Status Solidi(b). 204. 423-426 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] Y.Yasuda: "Effects of H-termination on initial oxidation process" Applied Surface Science. 113/114. 579 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] K.Ohmori: "Initial oxidation of Si(100)-(2x1)H monohydride surfaces studies by scanning tunneling micro scopy/scanning tunneling spectroscopy" Applied Surface Science. 117/118. 114 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] Y.Matsumoto: "Advantages of the Asymmetric Tunnel Barrier for High Density Integration of Single Electron Devices" Japanese Journal of Applied Physics. 36. 4143-4146 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] M.Otabe: "Observation of Single Electron Charging Effects in Nanocrystalline Silicon at Room Temperature Using Atomic Force Microscopy" Applied Physics Letter. 72. (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] Y.Kanemitsu: "Photoluminescnce Mechanism in Surface-Oxidized Silicon Nanocrystals" Physical Review B. 55. R7375-R7378 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] A.Dutta: "Fabrication and Electrical Characteristics of Single Electron Tunneling Devices Based on Si Quantum Dots Prepared by Plasma Processing" Japanese Journal of Applied Physics. 36. 4038-4041 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] T. Saitoh: "Determination of Built-in Electric Field Strength in InP/n^+-InP Structures Using Photoellipsometry" Japanese Jounal of Applied Physics. 35. 1696-1700 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] B. X. Yang: "Propcrties of InAs_xP_<1-x> Layer Formed by P-As Exchange Reaction on (001) InP Surface Exposed to As_4 Beam" Journal of Electronic Materials. 25. 379-384 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] H. Fujikura: "Fabrication of InP-Based InGaAs Ridge Quantum Wires Utilizing Sclcctive Molcculat Beam Epitaxial Growth on (311) A Facets" Journal of Electronic Materials. 25. 619-625 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] S. Suzuki: "A Novel Insulated Gate Technology for InGaAs High Electron Mobility Transistors Using Silicon Interlayer Based Passivation Technique"," Journal of Electronic Materials. 25. 649-656 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] B. X. Yang: "Scanning Tunneling Microscoe Study of (001) InP Surface Prepared by Gas Source Molecular Beam Epitaxy" Japanese Journal of Applied Physics. 35. 1267-1272 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] H. Fujikura: "Photoluminescence and Cathodoluminescence Investigation of Optical Properties of InP-Based InGaAs Ridge Quantum Wires Formed by Selective Molecular Beam Epitaxy." Japanese Journal of Applied Physics. 35. 1333-1339 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] S. Kasai: "Fabrication and Characterization of Novel Lateral Surface Superlattice Structure Utilizing Schottky Barrier Height Control by Doped Silicon Interface Control Layers" Japanese Journal of Applied Physics. 35. 1340-1347 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] S. Kakai: "Electron Beam Induced Current Characterization of Novel GaAs Quantum Nanostructures Based on Potential Modultion of Two-Dimensional Electron Gas by Schottky In-Plane Gates" Japanese Journal of Applied Physics. 35. 6652-6658 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] S. Uno: "0.86e V Platinum Schottky Barrier on Indium Phosphide by In Situ Electrochemical Process and Its Application to MESFETs" Japanese Journal of Applied Physics. 35. 1258-1263 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] S. Koyanagi: "Contactless and Nondestructive Characterization of Silicon Surfaces by Capacitance-Voltage and Photoluminescence Mcthods" Japanese Journal of Applied Physics. 35. 946-953 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] K. Jinushi: "Novel GaAs-Based Single Elecctron Transistors with Schottky In-Plane Gates Operating up to 20K" Japanese Journal of Applied Physics. 35. 1132-1139 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] H. Fujikara: "Surface Passivation of In_<0.53>Ga_<0.47>AsRidge Quantum Wires Using Silicon Interface Control Layers" Journal of Vacuum Scince and Technology. B-14. 288-2894 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] T. Hashizume: "Contactless Capacitance- Voltage and Photolummescence Characterization of Ultrathin Oxide-Silicon Interfaces Formed on Hydrogen Terminated (111) Surfaces" J. Vac. Sci. Technol. B-14. 2872-2881 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] T. Hashizume: "Quantum Transport in A Schottky In-Plane-Gate Controlled GaAs/AlGaAs Quantum Well Wires" Phisica B. 227. 42-45 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] H. Tomozawa: "Design and Fabrication of GaAs/AlGaAs Single Electoron Transistors Based on In-Plane Schottky Gate Control of 2DEG" Phisica B. 227. 112-115 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] S. Shiobara: "Deep Level and Conduction Mechanism in Low-Temperature GaAs Grown by Molecular Beam Epitaxy" Japanese Journal of Applied Physics. 35. 1159-1164 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] 長谷川 英機: "化合物半導体量子細線および量子ドットの製作" 光学. 25. 448-455 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] 長谷川 英機: "化合物半導体量子構造表面のSi超薄膜界面制御層によるパッシベーション" 表面化学. 17. 567-574 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] 長谷川 英機: "InP系化合物半導体材料およびデバイスの新展開" 応用物理. 65(2). 108-118 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] M. Hirai: "Reconstruction of Heat Treated 6H-SiC(0001) Surfaces" Thin Solid Films. 281-282. 591-593 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] T. Jikimoto: "Co Overlayer Formation Process on Si(100)2×1 Studied by SR-PES" Appl. Surf. Sci. 100/101. 513-517 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] A. Suzuki: ""Patterning of Epitaxial Organic Films by Selective Epitaxian Growth"" Jpn. J. Appl. Phys. 2. 35. L254-256 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] K. Ueno: ""Investigation of the growth mechanism of layered semiconductor GaSe"" Appl. Surf. Sci.印刷中. (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] K. Ueno: ""Nanostrure Fabrication by Selective Growth of Molecular Crystals on Layered Material Substrates"" Appl. Phys. Lett.印刷中. 946-953 (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] K. Sakai: "“Nanostructure Fabrication Using Selective Growth on Nanosize Patterns Drawn by Scannig by Scanning Probe Microscope"" Jpn. J. Phys. 36(印刷中). (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] N. Sawai: "Tunneling transfer and energy relaxation rate of photo-excited carriers in coupled quantum dots." Jap. J. Appl. Phys. 36(印刷中). (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] Y. Matsumoto: "″Advantages of the Asymmetric Tunnel Barrier for High Density Integration of Single Electron Devices″" Jpn. J. Appl. Phys.36(印刷中). (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] S. Oda: ""Preparation of nanocrystalline silicon quantum dot structure by pulsed Plasma processes"" Adv. Collid and Interface Sci.(印刷中). (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] M. Otobe: ""Preferential nucleation of nenosrystalline silicon along microsteps"" Jpn. J. Appl. Phys.35. 1325-1328 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] M. Otobe: "″Nanocrystalline silicon foemation in a SiH_4 plasma call″" J. Non-Cryst. Solids. 198-200. 875-878 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] Y. Kanemitsu: ""Photolumiiescnce mechanism in surface- oxidized silicon nanocrystals"" Phy. Rev. B, (1997). 印刷中. (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] M. Araki: "Formation of InGaAs/InAlAs Quantum Wires and Dots with Extremely Smooth Facets on Mesa-Patterned (001) InP Substrates by Selective Molecular Beam Enitaxy"" Jpn. J. Appl. Pthys.36(3)(印刷中). (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] H. Fujikura: ""Excitation Power Dependent Photoluminescence Behavior in Etched Quantum Wires Having Silicon Interlayer-Based Edge Passivation and Its Interpretation"," Jpn. J. Appl. Phys.36(3)印刷中. (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] S. Kasai: ""Fabrication and Characterization of GaAs Single Electron Devices Having Single and Multiple Dots Based on Schottky In-Plane-Gate and Wrap-Gate Control of Two-Dinensional Electron Gas"" Jpn. J. Appl. Phys.36(3)印刷中. (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] H. Okada: "Observation of Coulomb Blockade Type Conductance Oscvillations up to 50K in Gated InGaAs Ridge Quantum Wires Grown by Molecular Beam Epitaxy on InP Substrates," Jpn. J. Appl. Phys.36(3)印刷中. (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] T. Sato: "Large Schottky Berrier Heights on Indium Phosphide-Based Materials Realized by In-Situ Electrochemical Process." Jpn. J. Appl. Phys.36(3)印刷中. (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] K. Ikeya: "Successful Surface Passivation of Air-Exposed AlGaAs by a Silicon Interface Control Layer-Besed Technique," Jpn. J. Appl. Phys.36(3)印刷中. (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] Y. Dohmae: "Capacitance-Voltage Behavior of Insulated Gate InGaAs HEMT Capacitor Having Silicon Interface Control Layer," Jpn. J. Appl. Phys.36(3)印刷中. (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] T. Yoshida: "Characterization of Interface Electronic Properties of Low-Temperature Ultrathin Oxides and Oxynitrides Formed on Si(111) Surfaces by Contactless Capacitance-Voltage and Photoluminescence Methods," Jpn. J. Appl. Phys.36(3)印刷中. (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] H. Hasegawa: "Evolution mechanism of Nearl-Pinning Plantinum/N-Type Indium Phosphide Interface with a High Schottky Barrier Height by In-Situ Electrochemical Process," J. Vac. Sci. Technol.B15(4)印刷中. (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] H. Okada: "Basic Control Characteristics of Novel Schottky In-Plane and Wrap Gate Structures Studied by Simulation and Transport Measurements in GaAs and InGaAs Quantum Wires," Jpn. J. Appl.Phys.36(6)印刷中. (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] T. Kudoh: "Controlled Formation of Metal-semiconductor to Interface to 2DEG Layer by In-Situ Electrochemical Process and Its Application to In-Plane Electron Waveguide Devices." Appl. Sun. Sci.印刷中. (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] K. Iizuka: "Small-Signal Response of Interface States at Passivated InGaAs Surfaces from Low Frequencies up to Microwave Frequencies," Splid-State Electron.印刷中. (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] Y. Ishikawa: "MIssing-dinner structures and their kink defects on molecular beam epitaxially grown (2×4) reconstructed (001) InP and GaAs surfaces studied by ultrahihgh-vacuum scanning tunneling microscopy" Jpn. J. Appl. Phys.36(3)印刷中. (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] H. Hasegawa: "Interface-controled Schottky barriers on InP and related materials" Saolid-State Electronics. 印刷中. (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] S. Suzuki: "Fabrication and electrial characterization of InP-based insulated gate power HEMTs using ultrathin Si inteface control layer" Solid-State Electronics. 印刷中. (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] M. Kihara: ""Effect of Mis-Orientaition of Mesa-Stripes on the Groeth of InGaAs Quantum Wires by Selective Molecular Beam Epitaxy"" Appl. Sur. Sci.印刷中. (1997)

    • Related Report
      1996 Annual Research Report

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Published: 1996-04-01   Modified: 2019-02-15  

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