| Project/Area Number |
08305033
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| Research Category |
Grant-in-Aid for Scientific Research (A)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
反応・分離工学
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| Research Institution | THE UNIVERSITY OF TOKYO |
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Principal Investigator |
KODA Seiichiro The University of Tokyo Graduate School of Engineering Professor, 大学院・光学研究科, 教授 (10011107)
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| Co-Investigator(Kenkyū-buntansha) |
OKUYAMA Kikuo Hiroshima University Faculty of Engineering Professor, 工学部, 教授 (00101197)
NAKANO Katsuyuki Fukuoka University Faculty of Engineering Professor, 工学部, 教授 (50037876)
SUGAWARA Takuo Akita University Mining College Professor, 鉱山学部, 教授 (10006679)
TAKEUCHI Kazuo The Institute of Phys.Chem.Research Chief Researcher, 主任研究員 (10142639)
岡崎 守男 京都大学, 工学部, 教授 (90025916)
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| Project Period (FY) |
1996 – 1997
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| Project Status |
Completed (Fiscal Year 1997)
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| Budget Amount *help |
¥8,300,000 (Direct Cost: ¥8,300,000)
Fiscal Year 1997: ¥4,100,000 (Direct Cost: ¥4,100,000)
Fiscal Year 1996: ¥4,200,000 (Direct Cost: ¥4,200,000)
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| Keywords | Light-control of reaction / Active species / Laser induced reaction / Ultra-fine particles / Far ultraviolet light / Rate of photoabsorption / Photocatalyst / Ion-induced nucleation |
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| Research Abstract |
1.The purpose of the present research is to carry individual research related to the reactions induced by photon and active species, and the systematization of relevant fields and methodology. These trials are considered to be very important for future development of a novel reaction engineering and its practical applications.
2.There are 4 large classes of individual subjects. (1) Reaction control by light and photons-fundamental study of laser induced organic reactions (by Koda), analysis of elementary steps related to isotope separation of silicone (by Takeuchi), and the activation mechanism of ultra-fine particles by laser and its application to the production of fine films (by Kitamoto). (2) Fundamentals of light-induced reaction engineering-fundamental analysis of the recycle system of ultra-pure water using far-uv irradiation (by Sugawara), estimation of photo-absorption rate in heterogeneous reaction systems (by Yokota), technology for the production of film-like semiconductor photocatalysts for treatment of waste materials (by Nakano), and reproduction of fluorine-containing compounds by uv irradiation (by Nishiumi). (3) Elementary processes of radical and active species-analysis of the production mechanism of radicals under the pulsed discharge in fluids (Sato), analysis of pollutant removal using anions (Tamon), production of fine particles in CVD apparatus (Adachi), and ion-induced nucleation and production of fine particles. (4) Engineering for radical reactor design (Sadakata).
These individual subjects have been systematized intending to yield a novel reaction engineering in future.
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