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Studies on surface reaction process and thin film formation by controlling radicals

Research Project

Project/Area Number 08405005
Research Category

Grant-in-Aid for Scientific Research (A)

Allocation TypeSingle-year Grants
Section一般
Research Field 表面界面物性
Research InstitutionNagoya University

Principal Investigator

GOTO Toshio  Graduate School of Eng., Nagoya Univ., Professor, 工学研究科, 教授 (50023255)

Co-Investigator(Kenkyū-buntansha) ITO Masafumi  Graduate School of Eng., Nagoya Univ., Assistant Professor, 工学研究科, 講師 (10232472)
HORI Masaru  School of Eng., Nagoya Univ., Associate Professor, 工学部, 助教授 (80242824)
KONO Akihiro  Center for Coop.Res.in Adv.Sci.& Tech., Nagoya Univ., Professor, 先端技術共同研究センター, 教授 (40093025)
Project Period (FY) 1996 – 1998
Project Status Completed (Fiscal Year 1998)
Budget Amount *help
¥34,300,000 (Direct Cost: ¥34,300,000)
Fiscal Year 1998: ¥2,500,000 (Direct Cost: ¥2,500,000)
Fiscal Year 1997: ¥11,000,000 (Direct Cost: ¥11,000,000)
Fiscal Year 1996: ¥20,800,000 (Direct Cost: ¥20,800,000)
KeywordsPlasma / Chemical vapor deposition / Radical / Poly crystalline Silicon / Amorphous Silicon / Absorption spectroscopy / Process / Diamond / 赤外半導体レーザ吸収分光法 / FT-IR / 赤外半導体レーザー吸収分光法 / FT-IRRAS
Research Abstract

In this project, firstly we investigated systematically the correlation between the crystallinity of the deposited films and the information of gas phase in ECR plasma using silane / hydrogen mixture gases. As a result, we found that the reduction of ion flux contributed to the improvement of the crystallinity. On the basis of this result, we developed a novel method for depositing films without ionic species, namely, only neutral species using permanent magnets. Using this method, we have successfully synthesized the polycrystalline films with high crystallinty and smooth surfase. However, the deposition rate was reduced to be a tenth of that using the conventional method. To solve this problem, we have tried a novel two step growth method. In the method, ionic species were removed at the initial growth stage by using permanent magnets. After this step, the permanent magnets were removed from the plasma, the films were deposited by using the conventional ECR silane/hydrogen plasma., n … More amely including ionic and neutral species. As a result, we have successfully synthesized the films with high crystallinity, smooth surface and relatively high deposition rate. Moreover, we have found that ionic species disturb the nucleation of the crystalline phase especially.
In a diamond formation process, we have clarified the role of radicals from the correlation between the film quality and the behaviors of the radicals using vacuum ultraviolet absorption spectroscopy and optical emission spectroscopy. As a result, carbon atom contributes to the formation of non-diamond phase while OH radical promotes the abstraction reaction of hydrogen atom terminating the diamond surface.
In this project from 1996 to 1998, we have successfully obtained important findings by elucidating the roles in the polycrystalline silicon and diamond film formation processes. Moreover, on the basis of the findings, we have successfully developed the methods promising to obtain the films with further better quality by controlling the radicals. Less

Report

(4 results)
  • 1998 Annual Research Report   Final Research Report Summary
  • 1997 Annual Research Report
  • 1996 Annual Research Report
  • Research Products

    (35 results)

All Other

All Publications (35 results)

  • [Publications] R.Nozawa et.al: "Effects of ions on surface morphology and structures of polycrystalline silicon films prepared by electron cyclotron resonance silane/hydrogen plasmas" PLASMA PROCESSING XI. 11. 662-667 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] M.Ito et.al: "Scanning tunneling microscopic and spectro-scopic characterization of diamond film prepared by capacitvely coupled radio frequency CH3OH plasma with OH radical injection" Appl. Phys. Lett.70・16. 2141-2143 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] R.Nozawa et.al: "Substrate DC bias effects on low temperature polycrystalline silicon formation in electron cyclotron resonance plasma-enhanced chemical vapor deposition" J. Appl. Phys.79・6. 8035-8039 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Y.Yamamoto et.al: "Effects of dilution gases on Si atom and SiHx^+(x=0-3)ions in electron cyclotron resonance SiH4 plasma" Jpn. J. Appl. Phys.36・7B. 4664-4669 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] R.Nozawa et.al: "IN-situ observation of hydrogenated amorphous silicon surfaces in electron cyclotron resonance hydrogen plasma annealing" J. Appl. Phys.85・2. 1172-1177 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Ito et.al: "Diamond deposition and behavior of atomic carbon species in a low pressure inductively coupled plasma" Jpn. J. Appl. Phys.in print (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] R.Nozawa et.al: "Low temperature poly-crystalline silicon formation with and without charged species in electron cyclotron resonance SiH4/H2 plasma enhanced chemical vapor deposition" J. Vac. Sci.Technol.in print (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] R.Nozawa et.al: "Effects of ions on surface morphology and structures of polycrystalline silicon films prepared by electron cyclotron resonance silane/hydrogen plasmas" PLASMA PROCESSING XI. Vol.11. 662-667 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] R.Nozawa et.al: "Substrate DC bias effects on low temperature polycrystalline silicon formation in electron cyclotron resonance plasma-enhanced chemical vapor deposition" J.Appl.Phys.Vol.79, No.6. 8035-8039 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] M.Ito et.al: "Scanning tunneling microscopic and spectro-scopic characterization of diamond film prepared by capacitvely coupled radio frequency CH_3OH plasma with OH radical injection" Appl.Phys.Lett.Vol.70, No.16. 2141-2143 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Y.Yamamoto et.al: "Effects of dilution gases on Si atom and SiHx^+ (x=0-3) ions in electron cyclotron resonance SiH_4 plasma" Jpn.J.Appl.Phys.Vol.37, No.7B. 4664-4669 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] R.Nozawa et.al: "In-situ observation of hydrogenated amorphous silicon surface in electron cyclotron resonance hydrogen plasma annealing" J.Appl.Phys.Vol.85, No.2. 1172-1177 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Ito et.al: "Diamond deposition and behavior of atomic carbon species in a low pressure inductively coupled plasma" Jpn.J.Appl.Phys.(in print). (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] R.Nozawa et.al: "Low temporature poly-crystalline silicon formation with and eithout charged species in electron cyclotron resonance SiH_4/H_2 plasma enhanced chemical vapor deposition" J.Vac.Sci.Technol.(in print). (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] K.Murata et.al: "Effect of ion bombardment on the initial growth In low temperature poly-Si formation" Proceedings of 4th International Conference Reactive Plasmas. 107-108 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] H.Ito et.al: "Behavior of atomic C species in inductively coupled plasma" Proceedings of 4th International Conference Reactive Plasmas. 209-210 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] R.Nozawa et.al: "In-situ observation of hydrogenated amorphous silicon surfaces in electron cyclotron resonance hydrogen plasma annealing" J.Appl.Phys.85・2. 1172-1177 (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] H.Ito et.al: "Diamond deposition and behavior of atomic carbon species in a low pressure inductively coupled plasma" Jpn.J.Appl.Phys.(in print). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] R.Nozawa et.al: "Low temperature poly-crystalline silicon formation with and without chrged species in electron cyclotron resnance SiH_4/H_2 plasma enhanced chemical vapor deposition" J.Vac.Sci.Technol.(in print). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] Y.Yamamoto et.al.: "Effects of Dilution Gases on Si Atoms and SiHx^+(x=0-3)Ions in Electron Cyclotron Resonance SiH_4 Plasmas" Jpn.J.Appl.Phys.36. 4664-4669 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] R.Nozawa et.al.: "Substrate Bias Effects on Low Temperature Polycrystalline Formation Using Electron Cyclotron Resonance SiH_4/H_2 Plasma" J.Appl.Phys.,. 81. 8035-8039 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] R.Nozawa et.al.: "In situ Obserbation of Hydrogenated Amorphous Silicon Surface during Electron Cyclotron Resonance Hydrogen Plasma Annealing Using Polarization Modulation Infrared Reflection Absorption Spectroscopy" Proc.of 44rd National Symposium of American Vacuum Society. 44. 58- (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] R.Nozawa et.al.: "Early Stage of Poly-Si Growth in ECR Silane Plasma CVD" Proc.of the 15th Symposium on Plasma Processing. 15. 60-63 (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] R.Nozawa et.al.: "In-Situ PM-IR-RAS Observation of ECR Hydrogen Plasma Annealing Process" 平成9年度電気学会総合研究会プラズマ研究会予稿集. 61-66 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] Y.Yamamoto et.al..: "Effects of dilution gases on Si atom and SiHx^+(x=0-3)ions in electron cyclotron resonance SiH_4 plasma" Jpn.J.Appl.Phys.36(in printing). (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] R.Nozawa et.al.: "Substrate DC bias effects on low temperature polycrystalline silicon formation in electron cyclotron resonance SiH_4/H_2 plasma-enhanced chemical vapor deposition" J.Appl.Phys.75(in printing). (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] R.Nozawa et.al.: "Effects of ions on surface morphology and structures of polycrystalline silicon films prepared by electron cyclotron resonance silane/hydrogen plasmas" Plasma processing XI(Proc.of the 11th inter.sympo.in plasma processing). 11. 662-667 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] R.Nozawa et.al.: "Low temperature polycrystalline silicon formation by nutral reactive species in electron cvclotron resonance SiH_4/H_2 plasma chemical vapor deposition" Proc.of 3rd int.conf.reactive plasmas. 132-133 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] Y.Yamamoto et.al.: "Effect of dilution gases on Si atom and SiHx^+(x=0-3)in ECR SiH_4 plasma" Proc.of 3rd int.conf.reactive plasmas. 449-450 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] R.Nozawa et.al.: "Ion bombardment effects on polycrystalline silicon formation in electron cyclotron resonance SiH_4/H_2 plasma enganced chemical vapor deposition" Proc.of 3rd Asia-pacific conf.plasma sic.& technol.,. 529-534 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] M.Ito et.al.: "The roles of plasma species on polycrystalline silicon film formation by ECR SiH_4/H_2 plasma" Bulletin of the American Physical Society(Proc.of 49th GEC). 41(6). 1309 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] Y.Yamamoto et.al.: "Behaviors of Si atom and SiHx^+(x=0-3)ions in ECR SiH_4 plasma" Bulletin of the American Physical Society(Proc.of 49th GEC). 41(6). 1308 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] M.Hori et.al.: "In-situ surface diagnostics of a-Si : H films during ECR-H_2 plasma annealing" Bulletin of the American Physical Society(Proc.of 49th GEC). 41(6). 1311 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] M.Hori et.al.: "The effects of radicals on the crystallinity of polycrystalline silicon films formed by using ECR SiH_4/H_2 plasma" Proc.of 43rd national symposium of American vacuum society. 102 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] M.Ito et.al.: "Effects of ions on surface morphology and structures of polycrystalline silicon films prepared by electron cyclotron resonance silane/hydrogen plasma" 189th Electrochemical society meeting abstract. 96-1. 324 (1996)

    • Related Report
      1996 Annual Research Report

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Published: 1996-04-01   Modified: 2016-04-21  

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