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New STM technique for observation of ballistic electrons in semiconductors

Research Project

Project/Area Number 08405023
Research Category

Grant-in-Aid for Scientific Research (A)

Allocation TypeSingle-year Grants
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionTokyo Institute of Technology

Principal Investigator

FURUYA Kazuhito  Tokyo Institute of Technology Faculty of Engineering Professor, 工学部, 教授 (40092572)

Co-Investigator(Kenkyū-buntansha) SUHARA Michihiko  Research Center for Quantum Effect Electronics Research Assistant, 量子効果エレクトロニクス研究センター, 助手 (80251635)
MIYAMOTO Yasuyuki  Tokyo Institute of Technology Faculty of Engineering Associate Professor, 工学部, 助教授 (40209953)
Project Period (FY) 1996 – 1997
Project Status Completed (Fiscal Year 1997)
Budget Amount *help
¥25,400,000 (Direct Cost: ¥25,400,000)
Fiscal Year 1997: ¥2,300,000 (Direct Cost: ¥2,300,000)
Fiscal Year 1996: ¥23,100,000 (Direct Cost: ¥23,100,000)
Keywordshot electron / STM / hot electron emitter / noise in tunnel current / noise reduction by phase sensitive detection / low work function metal / ノイズ除法 / 低仕事関数 / 超高真空STM
Research Abstract

We have proposed and proved a new STM technique, Scanning Hot Electron Microscopy (SHEM), which has detected ballistic hot electrons (HE) propagating towards a surface of a solid material by a probe of STM to measure a spatial distribution and an energy spectrum of the HE.To lower the potential peak between the tip and the surface down to the HE energy, we have derived theoretical relation required for the work functions of the tip and the surface, the tunnel voltage and the tip-surface spacing. We have designed an experiment which has verified our idea in an atmospheric environment. We have selected Si/CaF2/Au heterostructure, analyzed self-consistently a band profile under the bias voltage application to show a possibility of generation of the hot electron with energy of 3eV at current density of 10KA/cm2. We have fabricated hot electron emitters with the area of 10um2 by using photolithography to obtain emission characteristics as designed. We have measured the phase sensitive detec … More tion (PSD) output approaching of the tip to the surface under application of DC voltage of 3V,AC voltage of 170mV at frequency of 82Hz to the emitter and the tunnel voltage of 1.5V.When the tip approached to the sample within certain distance, the output increased suddenly to show the hot electron detection, which was the first detection of the HE by the scanning probe tip. However, it took quite long time for integration to take one data point against the noise. We have theoretically obtained the optimum condition for the detection with respect to the immunity for the tip vibration. We have developed digital recording and processing system of the tunnel current to analyze the noise characteristics and to extract HE signal. It has been made clear from the power spectrum analysis and the above theory that 1pA HE signal can be detected by the PSD at integration time of 10sec. We have established the technique to obtain systematic data of SHEM through this research. The measurement of the spatial distribution of HE and the detection of the hot electron in the semiconductor has been left as the next stage targets. Less

Report

(3 results)
  • 1997 Annual Research Report   Final Research Report Summary
  • 1996 Annual Research Report
  • Research Products

    (40 results)

All Other

All Publications (40 results)

  • [Publications] F.Vazquez, 他: "Possibility of hot electron detection with a scanning probe microscope" Physica B. vol.227. 68-72 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] F.Vazquez, 他: "Proposal of a Technique to Detect Subsurface Hot Electrons with a Scanning Probe Microscope" Jan.J.Appl.Phys.Vol.35,no.2B. 1306-1310 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] F.Vazquez, 他: "Detecting subsurface hot electrons with a scanning probe microscopy" J.Appl.Phys.Vol.79,no.2. 651-655 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] H.Hongo, 他: "Electrical properties of 100nm pitch Cr/Au fine electrodes with 40nm width on GaInAs" Jpn. J. Appl. Phys.vol.35,no.8A. L964-L967 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] F.Vazquez, 他: "Detection of hot electron current with scanning hot electron microscopy" Appl.Phys.Lett.vol.69,no.15. 2196-2198 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] R.Takemura, 他: "Current-voltage characteristics of triple-barrier resonant tunneling diodes including coherent and incoherent tunneling process" IEICE of Jpn.vol.E-79C no.11. 1525-1529 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] H.Hongo, 他: "Seventy nm pitch patterning on CaF2 by e-beam exposure : An inorganic resist and a contamination resist" Jpn.J.Appl.Phys.vol.35,no.12. 6342-6343 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] H.Hongo, 他: "Hot electron interference by 40nm-pitch double slit buried in semiconductor" Microelectronic Engineering. vol.35. 337-340 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] H.Hongo, 他: "A 40nm pitch double slit experiment of hot electrons in a semiconductor under a magnetic field" Appl. Phys. Lett.vol.70. 93-95 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] H.Hongo, 他: "Electrical properties of 100nm pitch Cr/Au fine electrodes with 40nm width on GaInAs toward hot electron interference/diffraction devices" Microelectronic Engineering. vol.35. 241-244 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] R.Takemura, 他: "High-temperature estimation of phase coherent length of hot electron using GaInAs/InP triple-barrier resonant tunneling diodes grown by OMVPE" Jpn. J. Appl. Phys.vol.36. 1846-1848 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] T.Oobo, 他: "High paek-to-valley current ratio GaInAs/CaInP resonant tunneling diodes" Jpn. J. Appl. Phys.vol.36,no.8. 5079-5080 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] D.Kobayashi, 他: "Estimation of lateral resolution in scanning hot electron microscope" Jpn. J. Appl. Phys.vol.36,no.7A. 4472-4473 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] H.Hongo, 他: "Influence of a finite energy width on the hot electron double-slit interferece experiment : A design of the emitter structure" J. Appl. Phys.vol.182,no.8. 3846-3852 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] F.Vazquez, K.Furuya and D.Kobayashi: "Possibility of hot electron detection with a scanning probe microscope" Physica B. vol.227. 68-72 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] F.Vazquez, K.Furuya and D.Kobayashi: "Proposal of a Technique to Detect Subsurface Hot Electrons with a Scanning Probe Microscope" Jpn.J.Appl.Phys.Vol.35, no.2B. 1306-1310 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] F.Vazquez, K.Furuya and D.Kobayashi: "Detecting subsurface hot electrons with a scanning probe microscopy" J.Appl.Phys.vol.79, no.2. 651-655 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] H.Hongo, H.Tanaka, Y.Miyamoto, J.Yoshinaga, and K.Furuya: "Electrical properties of 100nm pitch Cr/Au fine electrodes with 40nm width on GaInAs" Jpn.J.Appl.Phys.vol.35, no.8A. L964-L967 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] F.Vazquez, D.Kobayashi, I.Kobayashi, Y.Miyamoto, K.Furuya, W.Saitoh, M.Watanabe and M.Asada: "Detection of hot electron current with scanning hot electron microscopy" Appl.Phys.Lett.vol69, no.15. 2196-2198 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] R.Takemura, M.Suhara, Y.Miyamoto, K.Furuya, and Y.Nakamura: "Current-voltage characteristics of triple-barrier resonant tunneling diodes including coherent and incoherent tunneling process" IEICE of Jpn.vol.E-79C,no.11. 1525-1529 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] H.Hongo, T.Hattori, Y.Miyamoto, K.Furuya, K.Matsunuma, M.Watanabe, and M.Asada: "Seventy nm pitch patterning on CaF2 by e-beam exposure : An inorganic resist and a contamination resist" Jpn.J.Appl.Phys.vol.35, no.12. 6342-6343 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] H.Hongo, Y.Miyamoto, M.Suhara and K.Furuya: "Hot electron interference by 40nm-pitch double slit buried in semiconductor" Microelectronic Engineering. vol.35. 337-340 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] H.Hongo, Y.Miyamoto, M.Suhara and K.Furuya: "A 40nm pitch double slit experiment of hot electrons in a semiconductor under a magnetic field" Appl.Phys.Lett.vol.70. 93-95 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] H.Hongo, H.Tanaka, Y.Miyamoto, T.Otake, J.Yoshinaga and K.Furuya: "Electrical properties of 100nm pitch Cr/Au fine electrodes with 40nm width on GaInAs toward hot electron interference/diffraction devices" Microelectronic Engineering. vol.35. 241-244 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] R.Takemura, M.Suhara, T.Oobo, Y.Miyamoto and K.Furuya: "High-temperature estimation of phase coherent length of hot electron using GaInAs/InP triple-barrier resonant tunneling diodes grown by OMVPE" Jpn.J.Appl.Phys.vol.36. 1846-1848 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] T.OObo, R.Takemura, M.Suhara, Y.Miyamoto, K.Furuya: "High peak-to-valley current ratio GaInAs/GaInP resonant tunneling diodes." Jpn.J.Appl.Phys.vol.36, no.8. 5079-5080 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] D.Kobayashi, K.Furuya, N.Kikegawa, and F.Vazquez: "Estimation of lateral resolution in scanning hot electron microscope" Jpn.J.Appl.Phys.vol.36, no.7A. 4472-4473 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] H.Hongo, Y.Miyamoto, M.Gault and K.Furuya: "Influence of a finite energy width on the hot electron double-slit interference experiment : A design of the emitter structure" J.Appl.Phys.vol.82, no.8. 3846-3852 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] H. Hongo 他: "Hot electron interference by 40nm-pich double slit buried in Semiconductor" Microelectronic Engineering. Vol. 35. 337-340 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] H. Hongo 他: "A 40nm pitch double Slit experiment of hot electrons ira Semiconductor under a magretic field" Appl. Phys. Lett.Vol. 70. 93-95 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] H. Hongo 他: "Electrical propertions of 100nm pich Cr/Au tine electrocodes with 40nm width on GaInAs toward hot electron interference/diffraction alvices." Microelectronic Engineering. Vol. 35. 241-244 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] R. Takemura 他: "High-Temperature estimation of pnase coherent length of rot electron using GaInAs/InP triple-barrier resonant tunneling diodos grown by OMVPE" Jpn. J. Appl. Phys.Vol. 36. 1846-1848 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] T. Oobo 他: "High peak-to-valiey current ratio GaInAs/GaInP resonant tunneling diodes" Jpn. J. appl. Phys.36,8. 5079-5080 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] D. Kobayashi 他: "Estimation of lateral in scanning hot electron microscope" Jpn. J. Appl. Phys.36,7A. 4472-4473 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] H. Hongo他: "Influence of a tinite energy width on the hot electron double-slit interierece experiment : A design of the emitter structure" J. Appl. Phys.82、8. 3846-3852 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] F.Vazquez,K.Furuya and D.Kobayashi: "Detecting subsurface hot electrons with a scanning probe microscopy" J.Appl.Phys.79・2. 651-655 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] H.Hongo,H.Tanaka,Y.Miyamoto,J.Yoshinaga,and K.Furuya: "Electrical properties of 100nm pitch Cr/Au fine electrodes with 40nm width on GaInAs" Jpn.J.Appl.Phys.35・8A. L964〜L967 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] F.Vazquez,D.Kobayashi,I.Kobayashi,Y.Miyamoto,K.Furuya,et.al.: "Detection of hot electron current with scanning hot electron microscopy" Appl.Phys.Lett.69・15. 2196-2198 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] R.Takemura,M.Suhara,Y.Miyamoto,K.Furuya,and Y.Nakamura: "Current-voltage characteristics of triple-barrier resonant tunneling diodes including coherent and incoherent tunneling process" IEICE of Jpn.E-79C・11. 1525-1529 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] H.Hongo,T.Hattori,Y.Miyamoto,K.Furuya,K.Matsunuma,et.al.: "Seventy nm pitch patterning on CaF2 by e-beam exposure:An inorganic resist and a contamination resist" Jpn.J.Appl.Phys.35・12. 6342-6343 (1996)

    • Related Report
      1996 Annual Research Report

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Published: 1996-04-01   Modified: 2016-04-21  

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