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Study on Fabrication of High Power Electrostatic Microactuators Using High Aspect Ratio X-ray Lithography

Research Project

Project/Area Number 08455046
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Applied physics, general
Research InstitutionRitsumeikan University

Principal Investigator

SUGIYAMA Susumu  Ritsumeikan University, Robotics, Professor, 理工学部, 教授 (20278493)

Co-Investigator(Kenkyū-buntansha) TABATA Osamu  Ritsumeikan University, Mech.Engng., Associate Professor, 理工学部, 助教授 (20288624)
Project Period (FY) 1996 – 1998
Project Status Completed (Fiscal Year 1998)
Budget Amount *help
¥2,100,000 (Direct Cost: ¥2,100,000)
Fiscal Year 1998: ¥500,000 (Direct Cost: ¥500,000)
Fiscal Year 1997: ¥1,600,000 (Direct Cost: ¥1,600,000)
KeywordsMicroactuator / High aspect ratio / X-ray lithography / LIGA / Synchrotron radiation / Electroforming / Comb type linear actuator / Wobble motor / Niめっき / ディープX線リソグラフィー / 高アスペクト微細構造体 / Ni電鋳 / 高アスペクト比微細構造体
Research Abstract

1.Optimization of process conditions for high aspect ratio X-ray lithography (LIGA) using the compact synchrotron radiation (SR) light source has been investigated. An exclusive beam-line for LIGA process has been set-up on the smallest super conductive SR light source "AURORA", installed in 1996, spring. in Ritsumeikan Univ., and operated. Process conditions for exposure and development of PMMA, were founded, and PMMA microstructures of 200 mum-deep and 100 mum-deep were fabricated under exposing dosage of 3 A min and 32 A min.
2.An X-ray mask for LIGA has been fabricated. Mask patterns were designed using a CAD system. The X-ray mask is consisted of 2 mum-thick SiC membrane and 5 mum-thick Au absorber in order to optimize contrast for X-ray exposure. Using the X-ray mask, PMMA resist structures with 2 mum-wide, 200 mum-high and aspect ratio of 100 were exposed and developed, and Ni microstructures were produced using Ni electroforming.
3.3-D high power microactuators have been designed, fabricated and evaluated. The basic structure of microactuators is consisted of Ni microstructures as fixed electrodes and movable electrodes, a Ni seed layer, SiO_2 as an isolation layer arid a sacrificial layer, and Si substrate. Dimensions of Ni microstructures were height of 100 mum, minimum line width of 2 mum, minimum gap of 2 mum and maximum aspect ratio of 50. A comb-drive electrostatic microactuator and an electrostatic micro wabble motor were fabricated by LIGA process combined high aspect ratio X-ray lithography using SR light source and electroforming. The comb-drive electrostatic microactuator and electrostatic micro wabble motor were confirmed to move by applying 65V pulse voltage and 125V-12 phases pulse voltage, respectively.

Report

(4 results)
  • 1998 Annual Research Report   Final Research Report Summary
  • 1997 Annual Research Report
  • 1996 Annual Research Report
  • Research Products

    (42 results)

All Other

All Publications (42 results)

  • [Publications] 保坂 誠, 張 延平, 上野 洋, 井上泰伸, 杉山 進: "小型SRビームラインを用いたPMMAの高アスペクト比X線リソグラフィーの検討" 立命館大学理工学研究所紀要. No.55. 155-162 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] K.Suzuki, S.Sugiyama: "Silicon IC compatible LIGA mask-fabricationprocess" Microsystem Technologies. Vol.4. 7-11 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] S.Sugiyama, Y.Zhang, M.Hosaka, H.Ueno, O.Tabata, S.Konishi and R.Maeda: "Study on fabrication of high aspect ratio MEMS microparts using a compact SR beamline" Microsystem Technologies. Vol.4,. 61-63 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] 杉山 進: "小型シンクロトロン放射光を用いた高アスペクト比マイクロマシン製作の研究" 放射線と産業. 第81号. 25-31 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Ueno, M.Hosaka, O.Tabata, S.Konishi, S.Sugiyama: "X-ray Mask with SiC Membrane for LIGA Process" 電気学会論文誌E. Vol.120-E. 229-235 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] S.Sugiyama, Y.Zhang, H.Ueno, M.Hosaka, T.Fujimoto, R.Maeda and T.Tanaka: "A Compact SR Beamline for Fabrication of High Aspect Ratio MEMS Microparts" The Seventh International Symposium on Micro Machine and Human Science, MHS'96, IEEE,. 79-84 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] 保坂 誠, 張 延平, 上野 洋, 井上泰伸, 杉山 進,: "小型SR光ビームラインを用いた高アスペクト比マイクロマシン製作の検討" 電気学会研究会資料, MM-97-6(マイクロマシン研究会). 31-35 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] 保坂 誠, 張 延平, 井上泰伸, 杉山 進: "MEMS用高アスペクト比X線リソグラフィの研究" 1997年春季第44回応用物理学会関係連合講演会講演予稿集. 30a-X-7. 630 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] K.Suzuki, H.Ueno, N.Nakamura and S.Sugiyama: "An X-ray Mask with a Low-Stress Controlled Polysilicon Membrane in Use for High Aspect Ratio Pattern Lithography" Technical Digest of the 15th Sensor Symposium. 197-200 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] 上野 洋, 保坂 誠, 張 延平, 田畑 修, 杉山 進: "LIGAプロセスを用いた高アスペクト比マイクロマシン製作の検討" 日本機械学会ロボティクス・メカトロニクス講演会'97 講演論文集. (Vol.A). 101-102 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] S.Sugiyama, Y.Zhang, M.Hosaka, H.Ueno, O.Tabata and R.Maeda: "Study on Fabrication of High Aspect Ratio MEMS Microparts Using a Compact SR Beamline" Book of Abstracts of High Aspect Ratio Micro Structure Technology (HARMST'97). (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Kenichiro Suzuki and Susumu Sugiyama: "Silicon IC Compatible LIGA MaskFabrication Process" Book of Abstracts of High Aspect Ratio Micro Structure Technology (HARMST'97). (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Ueno, M.Hosaka, Y.Zhang, O.Tabata, S.Konishi and S.Sugiyama: "Study on Fabrication of High Aspect Ratio Microparts Using the LIGA Process" Proceeding of the 1997 International Symposium on Micromechatronics and Human Science. 49-54 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] 上野 洋, 保坂 誠, 田畑 修, 小西 聡, 杉山 進: "SiCメンブレンを用いたLIGAプロセス用X線マスクの製作" 平成10年電気学会全国大会講演論文集[3]. 193 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Ueno, M.Hosaka, O.Tabata, S.Konishi and S.Sugiyama: "X-ray Mask with SiC Membrane for LIGA Process" Technical Digest of the 16th Sensor Symposium. 189-194 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Ryoji Kondo, Makoto Hosaka, Kenichiro Suzuki and Susumu Sugiyama: "Study on Fabrication of High Aspect Ratio Electrostatic Micro Actuators Using LIGA Process" Technical Digest of the 16th Sensor Symposium. 195-198 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] 近藤 亮史、保坂 誠、鈴木 健一郎、杉山 進: "LIGAプロセスによる静電マイクロアクチュエーター製作の検討" 日本機械学会ロボティクス・メカトロニクス講演会'98講演論文集. 1A1-7. 101-102 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Ryoji Kondo, Kenichiro Suzuki and Susumu Sugiyama: "Study on Fabrication of High Aspect Ratio Electrostatic Micra Actuators Using LIGA Process" Proceedings of the 1998 International Symposium on Micromechatronics and Human Science. 155-160 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] M.Hosaka, Y.Zhang, H.Ueno, Y.Inoue and S.Sugiyama: ""Study on fabrication of high aspect ratio PMMA microstructure using a compact SR beam line"" Memoirs of the Institute of Science & Engineering, Ritsumeikan University. No.55. 155-162 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] K.Suzuki and S.Sugiyama: ""Silicon IC compatible LIGA mask-fabrication process"" Microsystem Technologies. Vol.4, No.1. 7-11 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] S.Sugiyama, Y.Zhang, M,Hosaka, H.Ueno, O.Tabata, S.Konishi and R.Maeda: ""Study on fabrication of high aspect ratio MEMS microparts using a compact SR beamline"" Microsystem Technologies. Vol.4, No.2. 61-63 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] S.Sugiyama: ""Study on Fabrication of High Apsect Ratio Micromachines using a Compact SR Beam line"" Radiation & Industries. Vol.81. 25-31 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Ueno, M.Hosaka, O.Tabata, S.Konishi and S.Sugiyama: ""X-ray Mask with SiC Membrane for LIGA Process"" Tansactions of the IEE Japan. Vol.120-E. 229-235 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] S.Sugiyama, Y.Zhang, H.Ueno, M.Hosaka, T.Fujimoto, R.Maeda and T.Tanaka: ""A Compact SR Beamline for Fabrication of High Aspect Ratio MEMS Microparts"" The Seventh International Symposium on Micro Machine and Human Science, MHS '96, IEEE. 79-84 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] M.Hosaka, Y.Zhang, H.Ueno, Y.Inoue and S.Sugiyama: ""Study on Fabrication of High Apsect Ratio Micromachines using a Compact SR Beam line"" Technical Meeting on Micro Machines, IEE Japan. 31-35 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] M.Hosaka, Y.Zhang, Y.Inoue and S.Sugiyama: ""Study on High Aspect Ratio X-ray Lithography for Fabrication of MEMS"" Extended Abstracts (The 44th Spring Meeting 1997), The Japan Society of Applied Physics. No.2,30a-X-7. 630 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] K.Suzuki, H.Ueno, N.Nakamura and S.Sugiyama: ""An X-ray Mask with a Low-Stress Controlled Polysilicon Membrane in Use for High Aspect Ratio Pattern Lithography"" Technical Digest of the 15th Sensor Symposium. (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] K.Suzuki, H.Ueno, N.Nakamura and S.Sugiyama: ""An X-ray Mask with a Low-Stress Controlled Polysilicon Membrane in Use for High Aspect Ratio Pattern Lithography"" Technical Digest of the 15th Sensor Symposium. (1997)197-200

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] S.Sugiyama, Y.Zahng, M.Hosaka, H.Ueno, O.Tabata, S.Konishi and R.Maeda: "Study on fabrication of high aspect ratio MEMS microparts using a compact SR beamline" Microsystem Technologies. 4・2. 61-63 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] H.Ueno, M.Hosaka, O.Tabata, S.Konishi and S.Sugiyama: "X-ray Mask with SiC Membrane for LIGA Process" Technical Digest of the 16th Sensor Symposium. 189-194 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] R.Kondo, M.Hosaka, K.Suzuki and S.Sugiyama: "Study on Fabrication of High Aspect Ratio Electrostatic Micro Actuators Using LIGA Process" Technical Digest of 16th Sensor Symposium. 195-198 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] 近藤亮史, 保坂誠, 鈴木健一郎, 杉山進: "LIGAプロセスによる静電マイクロアクチュエーター製作の検討" 日本機械学会ロボティクス・メカトロニクス講演会'98講演論文集. IAIV1-7 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] R.Kondo, K.Suzuki and S.Sugiyama: "Study on Fabrication of High Aspect Ratio Electrostatic Micro Actuators Using LIGA Process" Proceedings of the International Symposium on Micromechatronics and Human Science. 155-160 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] 杉山進: "放射光によるマイクロマシニング技術" 第8回放射線利用総合シンポジウム資料集. 24-34 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] 保坂誠, 張延平, 上野洋, 井上泰伸, 杉山進: "小型ビームラインを用いたPMMAの高アスペクト比X線リソグラフィーの検討" 立命館大学理工学研究所紀要. No.5. 155-162 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] 上野洋, 保坂誠, 張延平, 田畑修, 杉山進: "LIGAプロセスを用いた高アスペクト比マイクロマシン製作の検討" 日本機械学会ロボティクス・メカトロニクス講演会 '97講演論文集. Vol.A. 101-102 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] S.Sugiyama, Y.Zhang, M.Hosaka, H.Ueno, O.Tabata, R.Maeda: "Study on Fabrication of High Aspect Ratio MEMS Microparts Using a Compact SR Beamline" Books of Abstrocts of High Aspect Ratio Micro Structure Technology. (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] H.Ueno, M.Hosaka, Y.Zhang, O.Tabata, S.Konishi, S.Sugiyama: "Study on Fabrication of High Aspect Ratio Microparts Using the LIGA Process" Proceeding of the 1997 International Symposium on Micromechatronics and Human Science. 49-54 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] 上野洋, 保坂誠, 田畑修, 小西聡, 杉山進: "SiCメンブレンを用いたLIGAプロセス用X線マスクの製作" 平成10年電気学会全国大会予稿集. (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] S.Sugiyama,Y.Zhang,H.Ueno,M.Hosaka,T.Fujimoto,R.Maeda,T.Tanaka: "A compact SR Beamline for Fabrication of High Aspect Ratio MEMS Microparts" Proceedings of the 7th International Symposium on Micro Machine and Human Science,IEEE. 79-84 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] 保坂誠,張延平,上野洋,井上泰伸,杉山進: "小型SR光ビームラインを用いた高アスペクト比マイクロマシン製作の検討" 電気学会マイクロマシン研究会資料. MM-97-6. 31-35 (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] 保坂誠,張延平,井上泰伸,杉山進: "MEMS用高アスペクト比X線リソグラフィーの研究" 1997年春季第44回応用物理学関係連合講演会予稿集. (1997)

    • Related Report
      1996 Annual Research Report

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Published: 1997-04-01   Modified: 2016-04-21  

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