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Development of vacuum arc deposition system for fabricating AIN film available to electrical insulation film of power devices with high thermal conduction

Research Project

Project/Area Number 08555075
Research Category

Grant-in-Aid for Scientific Research (A)

Allocation TypeSingle-year Grants
Section展開研究
Research Field Electronic materials/Electric materials
Research InstitutionToyohashi University of Technology

Principal Investigator

SAKAKIBARA Tateki  Toyohashi University of Technology, Faculty of Engineering, Professor, 工学部, 教授 (10023243)

Co-Investigator(Kenkyū-buntansha) SUZUKI Yasuo  Nishin Electric Co., LTD., Dept.of Advanced Technology and Development, Chief, 先端技術研究開発部, 部長付
TAKIKAWA Hirofumi  Toyohashi University of Technology, Faculty of Engineering, Assiciate Professor, 工学部, 助教授 (90226952)
石井 孝也  日新電機(株), 研究開発本部, 研究員
Project Period (FY) 1996 – 1998
Project Status Completed (Fiscal Year 1998)
Budget Amount *help
¥13,200,000 (Direct Cost: ¥13,200,000)
Fiscal Year 1998: ¥2,200,000 (Direct Cost: ¥2,200,000)
Fiscal Year 1997: ¥2,700,000 (Direct Cost: ¥2,700,000)
Fiscal Year 1996: ¥8,300,000 (Direct Cost: ¥8,300,000)
Keywordsaluminum nitride film / vacuum arc deposition / droplet-free / optical properties / mechanical properties / crystalline orientation / mass analysis / ion energy distribution / 窒化アルミニウム / 真空アーク / アーク蒸着装置 / 酸化チタン膜 / 質量・イオンエネルギー分析 / 蒸着装置 / 放電維持
Research Abstract

In order to fabricate the AlN film, which exhibits high electrical insulation property with high thermal conduction and is available for of electric .power device, which is available for electric power devices, new reactive vacuum arc deposition system was developed, The system employed the shielded arc technology to filter the droplets, which has been fatal issue in vacuum arc deposition method. The following results were obtained through this research.
1. The films prepared by the shielded system were almost droplet-free, transparent in visual, and adhered well to the substrate, whereas the films prepared by the conventional system were non-transparent due to many droplets and easily peeled off.
2. Refractive index of the films prepared by the shielded system was 2.0 and extinction coefficient was less than 10^<-2> in visual and infrared region, showing super transparency.
3. The films deposited by the shielded system were much harder than boro-silicated galss.
4. Deposition rate of the shielded system was 1.5 time as high as that of Magnetron sputter.
5. The films prepared by the conventional system exhibits c-axis orientation. However, the films prepared by the shielded system shows a-axis orientation, which indicates these films could have higher resistance.
From above results, we concluded that the shielded reactive vacuum arc deposition system were available for fabricating AlN films with excellent optical and mechanical properties. Further investigations are required at the viewpoints of electrical and thermal properties.

Report

(4 results)
  • 1998 Annual Research Report   Final Research Report Summary
  • 1997 Annual Research Report
  • 1996 Annual Research Report
  • Research Products

    (39 results)

All Other

All Publications (39 results)

  • [Publications] T.Sasaoka: "Characteristics of TiO_2 film synthesized by vacuum arc deposition method" 3^<rd> Asia-Pacific Conference on Plasma Science & Technology. 1. 523-528 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] 滝川浩史: "中真空中におけるAl陰極N_2フロー真空アークの放電持続性に及ぼす電源の影響" 電気学会論文誌. 117-A. 660-664 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] 滝川浩史: "反応性真空アーク蒸着法によるアナターゼ型TiO_2膜の生成" 電気学会論文誌. 117-A. 866-872 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Takikawa: "Mass and Ion Energy Analysis of Vacuum Arc for TiN Film Deposition" 12^<th> International Conference on Gas Discharges and its Application. Vol.1. 330-333 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Takikawa: "TiN/Ti film formation by vacuum arc deposition with shield plate" Thin Solid Films. 316. 73-78 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] 滝川浩史: "反応性真空アーク蒸着法によって生成したアナターゼ型TiO_2膜の光学バンドギャップ" 電気学会論文誌. 118-A. 899-900 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] 宮野竜一: "真空アーク蒸着装置におけるドロップレット遮蔽板の電流-電圧特性" 電気学会論文誌. 119-A. 19-24 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] 滝川浩史: "Ti陰極N_2ガス導入真空アークプラズマの質量スペクトルおよびイオンエネルギー分布計測" 電気学会論文誌. 119-A. 183-189 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Takikawa: "Synthesis of a-axis oriented AlN film by a shielded reactive vacuum arc deposition method" 26^<th> International Conference on Metallurgical Coatings and Thin Films. (発表予定). (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Takikawa: "Properties of titanium oxide film prepared by reactive vacuum arc deposition" Thin Solid Films. (印刷中).

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Takikawa: "N_2 gas absorption in cathodic arc apparatus with an Al cathode under medium vacuum" IEEE Transactions of Plasma Science. (印刷中).

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] 滝川浩史: "反応性真空アーク蒸着法によるAlN膜の生成" プラズマ応用と複合機能材料. (発表予定). (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] T.Sasaoka, H.Matsuo, H.Takikawa, T.Sakakibara: "Characteristics of TiO_2 film synthesized by vacuum arc deposition method" 3^<rd> Asia-Pacific Conference on Plasma Science & Technology. 1. 523-528 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Takikawa, K.Tanaka, T.Sakakibara: "Influence of power supply on continuity of vacuum arc with Al cathode and N_2 flow under medium vacuum" Transactions of the Institute of Electrical Engineering of Japan. 117-A. 660-664 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Takikawa, T.Sasaoka, T.Sakakibara: "Synthesis of anatase TiO_2 film by reactive vacuum are deposition method" Transactions of the Institute of Electrical Engineering of Japan. 117-A. 866-872 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Takikawa, K.Manabe, T.Sakakibara: "Mass and ion energy analysis of vacuum are for TiN film deposition" 12^<th> International Conference on Gas Discharges and its Application. 1. 330-333 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Takikawa, K.Shinsako, T.Sakakibara: "TiN/Ti film formation by vacuum arc deposition with shield plate" Thin Solid Films. 316. 73-78 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Takikawa, T.Matsui, T.Sakakibara: "Optical bandgap of anatase TiO_2 film prepared by reactive vacuum arc deposition method" Transactions of the Institute of Electrical Engineering of Japan. 118-A. 899-900 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] R.Miyano, H.Takikawa, K.Manabe, K.Shinsako, T.Sakakibara: "Current-voltage characteristics of droplet shield plate in vacuum arc apparatus" Transactions of the Institute of Electrical Engineering of Japan. 119-A. 19-24 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Takikawa, R.Miyano, K.Manabe, T.Sakakibara: "Mass spectroscopy and ion energy distribution measurement in vacuum arc plasma with Ti cathode and N_2 gas flow" Transactions of the Institute of Electrical Engineering of Japan. 119-A. 183-189 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Takikawa, N.Kawakami, T.Sakakibara: "Synthesis of a-axis oriented AlN film by a shielded reactive vacuum arc deposition method" 26^<th> International Conference on Metallurgical Coatings and Thin Films. (to be presented). (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Takikawa, T.Matsui, T.Sakakibara, A.Bendavid, P.Martin: "Properties of titanium oxide film prepared by reactive vacuum arc deposition" Thin Solid Films. (in press). (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Takikawa, N.Kawakami, T.Sakakibara: "N_2 gas absorption in cathodic arc apparatus with an Al cathode under medium vacuum" IEEE Transactions of Plasma Science. (in press). (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Takikawa, N.Kawakami, T.Sakakibara: "AlN film prepared by reactive vacuum arc deposition" Proc.of the 8th meeting of Institute of Applied Plasma Science. (to be presented). (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Takikawa: "TiN/Ti film formation by vacuum arc deposition with shield plate" Thin Solid Films. 316. 73-78 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] 滝川浩史: "反応性真空アーク蒸着法によって生成したアナターゼ型TiO_2膜の光学バンドギャップ" 電気学会論文誌. 118-A. 899-900 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] 滝川浩史: "シールド型反応性真空アーク蒸着装置によるTiO2膜の生成" 電気学会研究会資料(放電研究会). ED-98-238. 65-70 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] 宮野竜一: "真空アーク蒸着装置におけるドロップレット遮蔽板の電流-電圧特性" 電気学会論文誌. 119-A. 19-24 (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] 滝川浩史: "Ti陰極N_2ガス導入真空アークプラズマの質量スペクトルおよびイオンエネルギー分布計測" 電気学会論文誌. 119-A. 183-189 (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] H.Takikawa: "Synthesis of a-axis oriented AIN film by a shielded reactive vacuum arc deposition method" 26^<th> International Conference on Metallurgical Coatings and Thin Films. (発表予定).

    • Related Report
      1998 Annual Research Report
  • [Publications] 滝川浩史: "窒化チタン膜生成用真空アークプラズマの質量・エネルギー分析" 電気学会研究会資料(放電研究会). ED-97-33. 53-58 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] 滝川浩史: "真空アークPVD法によるTiO_2膜の生成" プラズマ応用科学研究会研究講演会プロシ-ディング. 6. 47-50 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] 滝川浩史: "中真空におけるAl陰極N_2フロー真空アークの放電持続性に及ぼす電源" 電気学会論文誌A. 117-A・7. 660-664 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] Hirofumi Takikawa: "Moss and Ion Energy Analysis of Vacuum Arc for TiN Film" Proc. of the 62th International Conf. of Gas Discharges. 1. 330-333 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] 川上尚也: "中真空中のAl陰極アーク放電によるN_2ガスの吸着" 電気学会研究会資料(放電研究会). ED-97-116. 49-54 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] 田中邦泰: "Al陰極N_2/Ar,N_2/He混合ガス真空アークを用いたAlN膜の生成" 電気学会研究会資料(開閉保護・高電圧合同研究会). SP-96-24. 71-79 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] 田中邦泰: "Al陰極N_2ガスフロー中真空アーク放電の維持" 電気学会研究会資料(放電研究会). ED-96-246. 237-236 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] 滝川浩史: "窒化チタン膜生成用真空アークプラズマの質量・エネルギー分析" 電気学会研究会資料(放電研究会). ED-97-33. 53-58 (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] Hirofumi Takikawa: "Mass and Ion Energy Analysis of Vacuum Arc for TiN Film Deposition" 12^<th> International Conference on Gas Discharges and its Application. (発表予定). (1997)

    • Related Report
      1996 Annual Research Report

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Published: 1996-04-01   Modified: 2016-04-21  

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