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Thin-Film-Transistor and Its Layr-Structured Circuitry for Signal Prosessing Based on Probability

Research Project

Project/Area Number 08650406
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field 電子デバイス・機器工学
Research InstitutionKyusyu Institute of Technology

Principal Investigator

ASANO Tanemasa  Kyusyu Institute of Technology, Center for Microelectronic Systems, Professor, マイクロ化総合技術センター, 教授 (50126306)

Co-Investigator(Kenkyū-buntansha) TANAKA Koichiro  Kyusyu Institute of Technology, Center for Microelectronic Systems, Research Ass, マイクロ化総合技術センター, 助手 (40253570)
AOKI Satoshi  Kyusyu Institute of Technology, Center for Microelectronic Systems, Research Ass, マイクロ化総合技術センター, 助手 (40231758)
Project Period (FY) 1996 – 1997
Project Status Completed (Fiscal Year 1997)
Budget Amount *help
¥2,300,000 (Direct Cost: ¥2,300,000)
Fiscal Year 1997: ¥600,000 (Direct Cost: ¥600,000)
Fiscal Year 1996: ¥1,700,000 (Direct Cost: ¥1,700,000)
Keywordsthin film transistor / TFT / polycrystalline silicon / solid phase crystallization / solid phase recrytallization / FPGA / FPAA / mixed signal circuit / ディジタル混在回路 / デイジタル混在回路 / 固相結晶化 / 結晶化制御 / プラズマ処理 / 微小電子源 / シリコン / 異方性エッチング
Research Abstract

Thin-film-transistor tenhnology has investigated from the view points of material preparation and device structures. Thin films of polycrystaline silicon and field effect transistors have been investigated.
・In order to enhance the signal processing speed of thin-film-transistor cricuits, it is desirable to design and fabricate each transistor in a circuit in a single polycrystalline grain. In order to realize this ideal situation, it is necessary to control the position of crystal and the growth speed of the crystal grains. We have found (1) enhancement of nucleation rate of amorphous silicon, and (2) reduction of the grain growth rate by irradiation of amorphous silicon with ions of innert species. Using these phenomena, we have demonstarated the control of crystallization sites of polycrystalline silicon films.
・Thin-films transistors fabricated on the polycrystalline silicon film prepared using the above nucleation-controlled method have been verified to show about 3 times higher operation speed than those fabricated using the conventional method.
・It has been demonstrated that, using the nucleation control method, thin-film transistors can be shrinked down to 0.6 mum and circuits composed of these transistors can operate. A test oscilation circuit has been designed and fabricated, which operated at the frequency range of several MHz at supply voltage of 5 V.
Application of field programmable analog and digital ICs to implementation of pulse signal processing circuits has been investigated.
・It has been found that analog/digital mixed signal circuits can be realized by converting analog signals to digitl signals in field progarammable analog arrays (FPAAs) and jointing with field programmable gate arrays (FPGAs).
・Using FPAA and FPGA,voltage controlled oscilator, ADC,DAC,and countors has been implemented and impletation method has been established.

Report

(3 results)
  • 1997 Annual Research Report   Final Research Report Summary
  • 1996 Annual Research Report
  • Research Products

    (42 results)

All Other

All Publications (42 results)

  • [Publications] Y.Okada, K.Aoto, T.Asano: "Selective Solid-Phase Crystallization of Amorphous Si by Oxygen Plasma Treatment" Ext.Abs.1996 Int.Cont.Solid State Devices and Materials. 374-376 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] T.Asano, K.Aoto, Y.Okada: "Enhanced Solid-Phase Crystallization of Amorphous Si by Plasma Treatment Using Reactive Ion Etching" Jpn.J.Appl.Phys.36・3B. 428-432 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] T.Asano, J.Yasuda: "A New Self-Aligned Process for Fabrication of Microemitter Arrays using Selective Etching of Si." Dig.Papers 1996 Int.Microprocess Conf.250-251 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] T.Asano, J.Yasuda: "A New Self-Aligned Process for Fabrication of Microemitter Arrays Using Selective Etching of Silicon" Jpn.J.Appl.Phys.35・12B. 6632-6636 (1996)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] K.Higa, K.Nishii, and T.Asano: "Si field emitter arrays fabricated by anodization and transfer technique" Jpn.J.Appl.Phys. 36・12B. 7741-7744 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] K.Arita, M.Akamatsu, and T.Asano: "Supressing plasma induced degradation of gate oxideusing silicon-on-insulator structures" Jpn.J.Appl./Phys.37・3B. 253-256 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] M.Nishisaka and T.Asano: "Reduction of the floating-body effect in SOI-MOSFETs by using Schottky source/drain contacts" Jpn.J.Appl.Phys.37・3B. 248-252 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] 田中 康一郎、岡田 順二、平野 孝明、浅野 種正: "再構成型集積回路によるディジタル/アナログ混在回路の試作" 第6回FPGA/PLD Design Conference予稿集. (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] K.Makihira and T.Asano: "Improving the performance of double-gate thin-film-transistors using gate offset structru" Dig.Tech.Papers 1997 Int.Workshop on Active Matrix Liquid Crystal Displays,. 191-194 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] M.Nishisaka and T.Asano: "Reduction of the floating-body effect in SOI-MOSFETs by using Schottky source/drain contacts" Ext.Abs.1997 Int.Conf.Solid State Devices and Materials. 160-161 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] K.Arita, M.Akamatsu, and T.Asano: "Supressing plasma induced degradation of gate oxide by using silicon-on-insulator structures" Ext.Abs.1997 Int.Conf.Solid State Devices and Materials. 146-147 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] T.Asano, E.Shibata, D.Sasaguri, K.Makihira, and K.Higa: "Field emission from an ion irradiated photoresist" Jpn.J.Appl.Phys.36・6B. L818-L820 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] K.Higa, K.nishii, and T.Asano: "Single-crystal Si field emitter fabricated by anodization" Appl.Phys.Lett.71・7. 983-985 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] T.Asano, D.Sasaguri, E.Shibata, and K.Higa: "Ion beam modification of a photoresist and its application to field emitters" Jpn.J.Appl.Phys. 36・12B. 7749-7753 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] Y.Okadda, K.Aoto, and T.Asano: "Selective solid phase crystallization of amorphous Si by oxygen plasma treatment" Ext.Abs.1996 Int.Conf.Solid State Devices and Materials. 374-376 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] T.Asano, K.Aoto, and T.Asano: "Enhanced solid phase crystallization of amorphousi Si by plasma treatment using reactive ion etching" Jpn.J.Appl.Phys.Vol.36, No.3B. 428-432 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] T.Asano and J.Yasuda: "A new self-aligned process for fabrication of microemitter arrays using selestive etching of Si" Dig.Papers 1996 Int.Microprocess Conf.250-521 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] T.Asano and J.Yasuda: "A new self-aligned process for fabrication of microemitter arrays using selestive etching of silicon" Jpn.J.Appl.Phys.Vol.35, No.12B. 6632-6636 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] K.Makihira and T.Asano: "Improving the performance of double-gate thin-film transistors using gate offset structure" Dig.Tech.Papers 1997 Int.Workshop on Active Matrix Liquid Crystal Displays. 191-194 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] M.Nishisaka and T.Asano: "Reduction of the floating body effect in SOI MOSFET by using Schottky source/drain cotacts" Ext.Abs.1997 Int.Conf.Solid State Devices and Materials. 160-161 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] K.Arita, M.Akamatsu, and T.Asano: "Supressing plasma induced degradation of gate oxide by using silicon-on-insulator structures" Ext.Abs.1997 Int.Conf.Solid State Devices and Materials. 146-147 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] T.Asano, E.Shibata, D.Sasaguri, K.Makihira, and K.Higa: "Field emission from an ion irradeated photoresist" Jpn.J.Appl.Phys.Vol.36, No.6B. L818-L820 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] K.Higa, K.Nishii, and T.Asano: "Single-crystal Si field emitter fabricated by anodization" Appl.Phys.Lett.Vol.71, No.7. 983-985 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] T.Asano, D.Sasaguri, E.Shibata, and K.Higa: "Ion beam modification of a photoresist and its application to field emitters" Jpn.J.Appl.Phys.Vol.36, No.12B. 7749-7753 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] K.Higa, K.Nishii, and T.Asano: "Si field emitter arrays fabricated by anodization and transfer technique" Jpn.J.Appl.Phys.Vol.36, No.12B. 7741-7744 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] K.Arita, M.Akamatsu, and T.Asano: "Supressing pasma induced degradation of gate oxide using silicon-on-insulator structures" Jpn.J.Appl.Phys.Vol.37, No.3B. 253-256 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] M.Nishisaka and T.Asano: "Reduction of the floating body effect in SOI MOSFETs by using Schottky source/drain cotacts" Jpn.J.Appl.Phys.Vol.36, No.3B. 248-252 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] T.Tanaka, J.Okada, T.Hirano, and T.Asano: "Implementation of degital/analog mixed signal circuits using field programmable integrated circuits" Proc.6th FPGA/PLD Design Conference. (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] K.Makihira and T.Asano: "Improving the performance of double-gate thin -film-transistors using gate offset structrue" Dig.Tech.Papers 1997 Int.Workshop on Active Matrix Liquid Crystal Displays,. 191-194 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] M.Nishisaka and T.Asano: "Reduction of the floating-body effect in SOI-MOSFETs by using Schottky source/drain contacts" Ext.Abs.1997 Int.Conf.Solid State Devices and Materials. 160-161 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] K.Arita,M.Akamatsu,and T.Asano: "Supressing plasma induced degradation of gate oxide by using silicon-on-insulator structures" Ext.Abs.1997 Int.Conf.Solid State Devices and Materials. 146-147 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] T.Asano,E.Shibata,D.Sasaguri,K.Makihira,and K.Higa: "Field emission from an ion irradiated photoresist" Jpn.J.Appl.Phys.36・6B. L818-L820 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] K.Higa,K.Nishii,and T.Asano: "Single-crystal Si field emitter fabricated by anodization" Appl.Phys.Lett.71・7. 983-985 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] T.Asano,D.Sasaguri,E.Shibata,and K.Higa: "Ion beam modification of a photoresist and its application to field emitters" Jpn.J.Appl.Phys. 36・12B. 7749-7753 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] K.Higa,K.Nishii,and T.Asano: "Si field emitter arrays fabricated by anodization and transfer technique" Jpn.J.Appl.Phys. 36・12B. 7741-7744 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] K,Arita,M.Akamatsu,and T.Asano: "Supressing plasma induced degradation of gate oxide using silicon-on-insulator structures" Jpn.J.Appl.Phys. 37・3B. 253-256 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] M.Nishisaka and T.Asano: "Reduction of the floating-body effect in SOI-MOSFETs by using Schottky source/drain contacts" Jpn.J.Appl.Phys. 37・3B. 248-252 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] 田中康一郎、岡田順二、平野孝明、浅野種正: "再構成型集積回路によるデイジタル/アナログ混在回路の試作" 第6回FPGA/PLD Design Conference 予稿集. (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] Y.Okada,K.Aoto,T.Asano: "Selective Solid-Phase Crystallization of Amorphous Si by Oxygen Plasma Treatment" Ext.Abs.1996 Int.Conf.Solid State Devices and Materials. 374-376 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] T.Asano,K.Aoto,Y.Okada: "Enhanced Solid-Phase Crystallization of Amorphous Si by Plasma Treatment Using Reactive Ion Etching" Jpn.J.Appl.Phys.36・3B. 428-432 (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] T.Asano,J.Yasuda: "A New Self-Aligned Process for Fabrication of Microemitter Arrays using Selective Etching of Si." Dig.Papers 1996 Int.Microprocess Conf.250-251 (1996)

    • Related Report
      1996 Annual Research Report
  • [Publications] T.Asano,J.Yasuda: "A New Self-Aligned Process for Fabrication of Microemitter Arrays Using Selective Etching of Silicon" Jpn.J.Appl.Phys.35・12B. 6632-6636 (1996)

    • Related Report
      1996 Annual Research Report

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Published: 1996-04-01   Modified: 2016-04-21  

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