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Study of Scattering Process in Tunnel-Device by Phonon Pulse.

Research Project

Project/Area Number 09044175
Research Category

Grant-in-Aid for international Scientific Research

Allocation TypeSingle-year Grants
SectionJoint Research
Research Field Electronic materials/Electric materials
Research InstitutionKyushu Institute of Technology

Principal Investigator

MIYASATO Tatsuro  Kyushu Inst.of Technol., Dept of Computor Science & Electronics, Professor, 情報工学部, 教授 (90029900)

Co-Investigator(Kenkyū-buntansha) KRIER Anthony  Lancaster Univ., Dept.of Phsics & Chemistry, Lecturer., 物理化学学部, 講師
JONES Brian K.  Lancaster Univ., Dept.of Phsics & Chemistry, Senior Lecturer., 物理化学学部, 上級講師
WIGMORE Keith  Lancaster Univ., Dept.of Phsics & Chemistry, Reader(Senior Lecturer)., 物理化学学部, 上級講師
SUN Yong  Kyushu Inst.of Technol., Dept of Computor Science & Electronics, Assistant Profe, 情報工学部, 助手 (60274560)
ASANO Tanemasa  Kyushu Inst.of Technol., Center for Microelectronic Systems, Professor, 教授 (50126306)
KRIER A.  Lancaster大学, 物理化学部, 講師
JONES R.K  Lancaster大学, 物理化学部, 上級講師
WIGMORE J.K  Lancaster大学, 物理化学部, 上級講師
Project Period (FY) 1997 – 1998
Project Status Completed (Fiscal Year 1998)
Budget Amount *help
¥3,900,000 (Direct Cost: ¥3,900,000)
Fiscal Year 1998: ¥1,800,000 (Direct Cost: ¥1,800,000)
Fiscal Year 1997: ¥2,100,000 (Direct Cost: ¥2,100,000)
KeywordsHeat-pulse / bolometer / decomlution / SiGe / tunneling-device / epitaxial-growth / 3C-SiC / break-through / トンネル電流 / 短いパルス / GaAs / GaAlAs系
Research Abstract

In the present research, the most important and indispensable technology which must be accomplished is the heat-pulse(phonon-pulse) technology with ultimate high resolution in space and time, and sensitivity. For this purpose, aluminium thin'films with granular structure deposited in oxygen gas atmosphere of about 5 X10^<-6> Torr were prepared, and these were used for both heater(phonon generator)and bolometer(receiver). For high space resolution, a photolithography technique was employed, namely the size of heater and bolometer was about 48*48 mu^2. To avoid the electromagnetic induction(break-through) caused by a very narrow(a few nano-sec.) pulse current, the heater and the bolometer were set vertically to each other, and micro coaxial-cable was used. The signal delay caused by finite heat and electric capacities were removed by numerical decoinbolution technique.
In the present investigation, it was made clear that a crystal deform at boundaries between Si base and SiGe films in a tunneling-device preparedi by MBE method gives rise to a large phonon scattering and a phonon mode conversion even by very thin regions less than 100 A.namely, this method is very sensitive and useful to investigate the crystal deform of small region.
Furthermore, to expand this investigation, an epitaxial growth of SiC film on-to Si base was carried out by means of hydrogen plasma sputtering method, and it was also made clear that 3C-SiC film was epitaxially grown onto Si wafer at a surprising low temperature, 800゚C, and then we would like to continue this in-vestigation using 3C-SiC films.

Report

(3 results)
  • 1998 Annual Research Report   Final Research Report Summary
  • 1997 Annual Research Report
  • Research Products

    (39 results)

All Other

All Publications (39 results)

  • [Publications] Y.Sun, T.Miyasato & J.K.Wigmore.: "Behavior of excess carbon in cubic SiC film characterized by infrared absorption measurement." J.Appl. Phys.in press. (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] T.Takase, Y.Sun & T.Miyasato.: "Saw attenuation in C_<60> thin films at transition temperature." Physica B.in press. (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] K.Kirimoto, K.Nobugai & T.Miyasato.: "Ultrasonic attenuation in yttria-stabilized zirconia." Physica B.in press. (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] T.Miyasato, Y.Sun & J.K.Wigmore.: "Growth and characterization of nanoscale 3C-SiC islands on Si substrates." J.Appl. Phys.in press. (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Y.Sun, T.Miyasato & N.Sonoda.: "Outdiffusion of the excess carbon in SiC films into Si substrate during the growth." J.Appl. Phys.Vol.84. 6451-6453 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Y.Sun and T.Miyasato.: "Plasma Etch Void Formed at the SiC Film/Si Substrate Interface." Jpn. J.Appl. Phys.Vol.37. 3238-3244 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] N.Sonoda, Y.Sun & T.Miyasato.: "Behaviors of Carbon at Initial Stages of SiC Film Grown on Thermally Oxidized Si Substrate." Jpn. J.Appl. Phys.Vol.36. L1641-L1644 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Y.Sun, T.Miyasato, J.K.Wigmore, N.Sonoda & Y.Watari.: "Characterization of 3C-SiC films grown on monocrystalline Si by reactive hydrogen sputtering." J.Appl. Phys.Vol.82. 2334-2341 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Y.Sun & T.Miyasato.: "Loss Behavior of Si Substrate during Growth of the SiC Films Prepared by Hydrogen Plasma Sputtering." Jpn. J.Appl. Phys.Vol.36. L1071-L1074 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Y.Sun, T.Miyasato & J.K.Wigmore.: "Possible Origin for (110) -oriented Growth of Grains in Hydrogenated Microcrystalline Silicon Films" Appl. Phys. Lett.Vol.70. 508-510 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] N.Sonoda, Y.Sun & T.Miyasato.: "Evidence for the Appearance of Carbon-Rich Layer at the Interface of SiC Film/Si Substrate." J.Vac. Sci. Technol. A.Vol.15. 18-20 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Y.Sun, T.Miyasato & J.K.Wigmore: "Behavior of excess carbon in cubic SiC film characterized by infrared absorption measurement." J.Appl.Phys.(in press). (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] T.Takase, Y.Sun & T.Miyasato: "Saw attenuation in C_<60> thin films at transition temperature." Physica B. (in press). (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] K.Kirimoto, K.Nobugai & T.Miyasato: "Ultrasonic attenuation in yttria-stabilized zirconia." Physica B. (in press). (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] T.Miyasato, Y.Sun & J.K.Wigmore: "Growth and characterization of nanoscale 3C-SiC islands on Si substrates." J.Appl.Phys.(in press). (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Y.Sun, T.Miyasato & N.Sonoda: "Outdiffusion of the excess carbon in SiC films into Si substrate during the growth" J.Appl.Phys.Vol.84. 6451-6453 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Y.Sun and T.Miyasato: "Plasma Etch Void Formed at the SiC Film/Si Substrate Interface." Jpn.J.Appl.Phys.Vol.37. 3238-3244 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] N.Sonoda, Y.Sun & T.Miyasato: "Behaviors of Carbon at Initial Stages of SiC Film Grown on Thermally Oxidized Si Substrate." Jpn.J.Appl.Phys.Vol.36. L1641-L1644 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Y.Sun, T.Miyasato, J.K.Wigmore, N.Sonoda & Y.Watari: "Characterization of 3C-SiC films grown on monocrystalline Si by reactive hydrogen sputtering." J.Appl.Phys.Vol.82. 2334-2341 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Y.Sun & T.Miyasato: "Loss Behavior of Si Substrate during Growth of the SiC Films prepared by Hydrogen Plasma Sputtering." Jpn.J.Appl.Phys.Vol.36. L1071-L1074 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Y.sun, T.Miyasato & J.K.Wigmore: "Possible Origin for (110)-Oriented Growth of Grains in Hydrogenated Microcrystalline Silicon Films." Appl.Phys.Lett.Vol.70. 508-510 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] N.Sonoda, Y.Sun & T.Miyasato: "Evidence for the Appearance of Carbon-Rich Layer at the Interface of SiC Film/Si Substrate." J.Vac.Sci.Technol.A.Vol.15. 18-20 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Y.Sun,T.Miyasato & J.K.Wigmore.: "Behavior of excess carbon in cubic SiC film characterized by infrared absorption measurement." J.Appl.Phys.in press. (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] T.Takase,Y.Sun & T.Miyasato.: "Saw attenuation in C_<60> thin films at transition temperature." Physica B.in press. (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] K.Kirimoto,K.Nobugai & T.Miyasato.: "Ultrasonic attenuation in yttria-stabilized zirconia." Physica B.in press. (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] T.Miyasato,Y.Sun & J.K.Wigmore.: "Growth and characterization of nanoscale 3C-SiC islands on Si substrates." J.Appl.Phys.in press. (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] Y.Sun,T.Miyasato & N.Sonoda.: "Outdiffusion of the excess carbon in SiC films into Si substrate during the growth." J.Appl.Phys.Vol.84. 6451-6453 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] Y.Sun and T.Miyasato.: "Plasma Etch Void Formed at the SiC Film/Si Substrate Interface." Jpn J.Appl.Phys.Vol.37. 3238-3244 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] N.Sonoda,Y.Sun & T.Miyasato.: "Behaviors of Carbon at Initial Stages of SiC Film Grown on Thermally Oxidized Si Substrate." Jpn J.Appl.Phys.Vol.36. L1641-L1644 (1997)

    • Related Report
      1998 Annual Research Report
  • [Publications] Y.Sun,T.Miyasato,J.K.Wigmore,N.Sonoda & Y.Watari.: "Characterization of 3C-SiC films grown on monocrystalline Si by reactive hydrogen sputtering." J.Appl.Phys.Vol.82. 2334-2341 (1997)

    • Related Report
      1998 Annual Research Report
  • [Publications] Y.Sun & T.Miyasato.: "Loss Behavior of Si Substrate during Growth of the SiC Films Prepared by Hydrogen Plasma Sputtering." Jpn J.Appl.Phys.Vol.36. L1071-L1074 (1997)

    • Related Report
      1998 Annual Research Report
  • [Publications] Y.Sun,T.Miyasato & J.K.Wigmore.: "Possible Origin for(110)-Oriented Growth of Grains in Hydrogenated Microcrystalline Silicon Films." Appl.Phys.Lett.Vol.70. 508-510 (1997)

    • Related Report
      1998 Annual Research Report
  • [Publications] N.Sonoda,Y.Sun & T.Miyasato.: "Evidence for the Appearance of Carbon-Rich Layer at the Interface of SiC Film/Si Substrate." J.Vac.Sci.Technol.A.Vol.15. 18-20 (1997)

    • Related Report
      1998 Annual Research Report
  • [Publications] N.Sonoda, Y.Sun and T.Miyasato: "Behaviors of Carbon at Initial Stages of SiC Film Grown on Thermally Oxidized Si Substrato." Jpn.J.Appl.Phys.36. L1641-L1644 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] Y.Sun, T.Miyasato. J.K.Wigmore, N.Sonoda, Y.Wataru: "Cheracterization of 3C-SiC films grown on mono-crystalline Si by reactive hydrogen sputtering." J.Appl.Phys.82. 2334-2341 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] Y.Sun and T.Miyasato: "Loss Behavior of Si Substrate during Growth of the SiC Films Prepared by Hydrogen Plasma Souttering." Jpn.J.Appl.Phys.36. L1071-L1074 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] Y.Sun, T.Miyasato and J.K.Wigmore: "Possible Origin for (110) Oriented Growth of Grains in Hydrogen at ed Microciystalline Silicon Films." Appl.Phys.Lett.70. 508-510 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] A.G.Kozorezov.J.K.Wigmore and T.Miyasato: "Heat Pulse scattering from Rough,Surfaces with Longrange Irregularity." Physica.B. 219and220. 748-750 (1996)

    • Related Report
      1997 Annual Research Report
  • [Publications] A.G.Kozorezov.J.K.Wigmore and T.Miyasato: "Heat Pulse Sattering at Rough Surface : Reflection." J.Phys,: Condens.Matter.8. 1-14 (1996)

    • Related Report
      1997 Annual Research Report

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Published: 1997-04-01   Modified: 2016-04-21  

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