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Investigation of nano meter scale MOS transistors for integrated circuits

Research Project

Project/Area Number 09555107
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section展開研究
Research Field 電子デバイス・機器工学
Research InstitutionTOHOKU UNIVERSITY

Principal Investigator

MASUOKA Fujio  Research Institute of Electrical Communication, Tohoku University, Professor, 電気通信研究所, 教授 (50270822)

Co-Investigator(Kenkyū-buntansha) SAKURABA Hiroshi  Research Institute of Electrical Communication, Tohoku University, Research Associate, 電気通信研究所, 助手 (60241527)
ENDOH Tetsuo  Research Institute of Electrical Communication, Tohoku University, Assistant Professor, 電気通信研究所, 助教授 (00271990)
Project Period (FY) 1997 – 1999
Project Status Completed (Fiscal Year 1999)
Budget Amount *help
¥4,400,000 (Direct Cost: ¥4,400,000)
Fiscal Year 1999: ¥900,000 (Direct Cost: ¥900,000)
Fiscal Year 1998: ¥3,500,000 (Direct Cost: ¥3,500,000)
KeywordsThree-dimensional MOSFET / SGT / M-SGT / Flash memory / SGT Flash memory / M-SGTM-SGT
Research Abstract

(1) Proposal of a new three-dimensional MOS transistor structure and its operation principle.
A detailed analysis of the future-size SGT-type and M-SGT-type three-dimensional MOS transistor is given. The dependencies of operation characteristics on structural parameters and input voltage waveform are analyzed and summarized in a physical model of the future-size SGT-type and M-SGT-type three-dimensional MOS transistor. Accordingly, it is possible to evaluate quantitatively the main factors which limit operation speed, determine power consumption and packing density of the transistor structure.
(2) Proposal of a new circuit architecture and a new circuit layout for a three-dimensional MOS transistor
As a result, the operation speed and the power consumption of SGT and M-SGT type three dimensional MOS transistor can be evaluated quantitatively.
(3) Proposal of a three-dimensional Flash memory and the analysis of its operation mechanism
In this research we propose the Floating Channel type SGT (FC-SGT) Flash memory in order to achieve an increase in the packing density of flash memory devices. In FC-SGT Flash memory channel region is floating. By using two-dimensional device simulation, the transient dependence of the surface channel potential which determines the erase characteristics of the FC-SGT Flash memory device is clarified. As a result, FC-SGT Flash memory realizes bipolarity erase and program operation modes. Therefore the FC-SGT Flash memory achieves high packing density, low power consumption, high speed programming and highly reliable operation characteristics simultaneously. Especially, the program speed of the FC-SGT Flash memory is twice as high as the program speed of a conventional planar type Flash memory.

Report

(4 results)
  • 1999 Annual Research Report   Final Research Report Summary
  • 1998 Annual Research Report
  • 1997 Annual Research Report
  • Research Products

    (5 results)

All Other

All Publications (5 results)

  • [Publications] 遠藤哲郎: "Floating Channel Type SGT Flashメモリ"電子情報通信学会論文誌C-I. J82-C-I No.3. 134-135 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Tetsuo Endoh: "Floating Channel type SGT FLASH memory"The transactions of the institute of electronics, information and communication engineers. J82-C-I, No.3. 134-135 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 遠藤 哲郎: "Floating Channel Type SGT Flash メモリ"電子情報通信学会論文誌C-I. J82-C-I No.3. 134-135 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 遠藤 哲郎: "Floating Channel type SGT Flash メモリ(予定)" 電子情報通信学会論文誌C-II. J80-C-II. (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] 遠藤 哲郎: "Multi-SGTの高速動作に関する解析" 電子情報通信学会論文誌C-II. J82-C-II・No.8. 284-285 (1997)

    • Related Report
      1998 Annual Research Report

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Published: 1998-04-01   Modified: 2016-04-21  

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