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Research about the method of measuring the ultra thin film and the plasma reaction under film growth using optical waveguides

Research Project

Project/Area Number 09555132
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section展開研究
Research Field 計測・制御工学
Research InstitutionWaseda University

Principal Investigator

KATO Isamu  Waseda University, School of Science and Engineering, Professor, 理工学部, 教授 (80063775)

Project Period (FY) 1997 – 2000
Project Status Completed (Fiscal Year 2001)
Budget Amount *help
¥7,800,000 (Direct Cost: ¥7,800,000)
Fiscal Year 2000: ¥700,000 (Direct Cost: ¥700,000)
Fiscal Year 1999: ¥1,100,000 (Direct Cost: ¥1,100,000)
Fiscal Year 1998: ¥1,400,000 (Direct Cost: ¥1,400,000)
Fiscal Year 1997: ¥4,600,000 (Direct Cost: ¥4,600,000)
Keywordsplasma CVD / plasma measurement / Amorphous silicon / optical fiber sensor / near field optics / evanescent field / ultra thin film / "in situ" measurement / 光ファイバーセンサ / ブラズマ計測 / 光ファイバーセンサー
Research Abstract

The thin film of about 10 nm of thickness was made to deposit on the multimode optical fiber sensor of the structure which exposed the core using CVD equipment, and with time progress, transmitted light intensity with a wavelength of 685-800 nm became small, and was saturated in about about 600 seconds.
Moreover, in order to raise the sensitivity of a sensor, it is necessary to lengthen a sensor part or to make it thin. Then, the embedded type 3-dimensional waveguide with a 7micrometerx6micrometer core thinner than the former is used as a sensor and the optical physical-properties value of an a-Si : H film was measured. Consequently, the absorption spectrum with the same tendency as the case where a conventional optical fiber and conventional slab waveguide are used as a sensor was obtained. It carried out based on the absorption spectrum obtained here, and when asked for the optical energy band gap of the a-Si : H film made to deposit on a waveguide, the value about 1.70-1.72 [eV] was acquired irrespective of waveguide length. This is mostly in agreement with the value acquired by the conventional measuring method. Moreover, the measurement limit resulting from the amount of absorption becoming inadequate was a-Si : H thickness 50 [nm], when sensor length was set to 50 [mm] in the optical fiber of the diameter 110 im of a core. By the introduced measurement system, since it was a-Si : H thickness 3 [nm] when sensor length set to 50 [mm], improvement in large sensitivity is able to be aimed at. Since it is the 3-dimensional waveguide unlike slab waveguide, analysis by the finite element method with high accuracy is performed.

Report

(5 results)
  • 2001 Final Research Report Summary
  • 2000 Annual Research Report
  • 1999 Annual Research Report
  • 1998 Annual Research Report
  • 1997 Annual Research Report
  • Research Products

    (39 results)

All Other

All Publications (39 results)

  • [Publications] 加藤 勇 他: "2重管式同軸線路形MPCVD装置を用いて作製したa-Si : H/Si_3N_4多層膜の膜質とその光回路素子への応用"電子情報通信学会論文誌 C. Vol.J84-C. 245-250 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] 加藤 勇: "Film Quality Of a a-Si : H/Si3N4 Multilyer Films And Propagate Properties Of Optical Waveguides Using The Multilayer Films"第18回プラズマプロセッシング研究会 プロシーディングス. 428-429 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] 加藤 勇: "Dependence of PL Characteristics of a-Si : H Nanoball Films Fabricated By Double Tubed Coaxial Line Type MPCVD System On Substrate Position"第18回プラズマプロセッシング研究会 プロシーデイングス. 425-426 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] 加藤 勇: "Effect of Ar+ Ion Bombardment During Hydrogenated Amorphous Silicon Film Growth in Plasma Chemical Vapor Deposition System"Jpn.J.Appl.Phys.. Vol.3 No.9. 6404-6409 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] 加藤 勇: "Polarization Properties of a-Si : H/Si3N4 Mutilayers Optical Waveguides"第17回プラズマプロセッシング研究会プロシーデイングス. 243-246 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] 加藤 勇: "Dependence of PL Characteristics of a-Si : H Nanoball Films Fabricated by Double Tubed Coaxial Line Type MPCVD System on Ion Bombaedment Energy"第17回プラズマプロセッシング研究会プロシーディングス. 641-644 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] I.Kato et al.: "In situ Measurement of Optical Constant of Ultra Thin Films Using Optical Fiber Sensor"SPIE Proceedings. Vol.2997. (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] I.Kato et al.: "Refractive Index Measurement of Silicon Thin Films Using Optical Waveguides"Jpn.J.Appl.Phys.. Vol.36, No2. 920-925 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] I.Kato et al.: "In situ Measurement of Change of Ultra Thin Films In Elapsed Time Using ptical Fiber Sensor"Proceedings of ICRP-3/SPP-14. P1-33. 143-149 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] I. Kato et al: "Quality of a-Si : H/Si_3N_4 Multilayer Films Fabricated by Double Tubed Coaxial Line Type MPCVD System and Application of the Films to Optical Circuit Element"Denshi Joho Tsushin Gakkai Ronbunshi. Vol. J84-C No. 4. 245-250 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] I. Kato et al: "Film Quality Of a a-Si : H/Si3N4 Multilyer Films And Propagate Properties Of Optical Waveguides Using The Multilayer Films"Proceedings of The 18th Symposium on Plasma Processing. 428-429 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] I. Kato et al: "Dependence of PL Characteristics of a-Si : H Nanoball Films Fabricated By Double Tubed Coaxial Line Type MPCVD System On Substrate Position"Proceedings of The 18th Symposium on Plasma Processing. 425-426 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] I. Kato et al: "Effect of Ar+ Ion Bombardment During Hydrogeneted Amorphous Silicon Film Growth in Plasma Chemical Vapor Deposition System"Jpn. J. Appl. Phys. Vol. 3,No. 9. 245-250 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] I. Kato et al: "Polarization Properties of a-Si : H/Si3N4 Mutilayers Optical Waveguides"Proceedings of The 17th Symposium on Plasma Processing. 243-246 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] I. Kato et al: "Dependence of PL Characteristics of a-Si : H Nanoball Films Faricated by Double Tubed Coaxial Line Type MPCVD System on Ion Bombaedment Energy"Proceedings of The 17th Symposium on Plasma Proessing. 641-644 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] I. Kato et al: "In situ Measurement of Optical Constant of Ultra Thin Films Using Optical Fiber Sensor"SPIE Proceedings. Vol. 2997. (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] I. Kato et al: "Refractive Index Measurement of Silicon Thin Films Using Optical Waveguides"Jpn. J. Appl. Phys.. Vol. 36 No. 2. 920-925 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] I. Kato et al: "In situ Measurement of Change of Ultra Thin Films In Elapsed Time Using optical Fiber Sensor"Proceedings of ICRP-3/Spp-14. P1-33. 143-149 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] 加藤勇: "a-Si:H/Si_3N_4多層膜光導波路の偏光特性(III)"第48回応用物理学会関係連合講演予稿集. (発行予定). (2001)

    • Related Report
      2000 Annual Research Report
  • [Publications] 加藤勇: "DEPENDENCE OF PL CHARACTERISTICS OF a-Si : H NANOBALL FILMS FABRICATED BY DOUBLE TUBED COAXIAL LINE TYPE MPCVD SYSTEM ON SUBSTRATE POSITION"第18回プラズマプロセッシング研究会プロシーディングス. 425-425 (2001)

    • Related Report
      2000 Annual Research Report
  • [Publications] 加藤勇: "FILM QUALITY OF A a-Si : H/Si_3N_4 MULTILAYER FILMS AND PROPAGATE PROPERTIES OF OPTICAL WAVEGUIDES USING THE MULTILAYER FILMS"第18回プラズマプロセッシング研究会プロシーディングス. 427-427 (2001)

    • Related Report
      2000 Annual Research Report
  • [Publications] 加藤勇: "Si : H/Si_3N_4多層膜光導波路の偏光特性(II)"第61回応用物理学会学術講演会予稿集. 1026-1026 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] 加藤勇: "三次元光導波路を用いた半導体極薄膜の光学定数の測定(II)"第61回応用物理学会学術講演会予稿集. 873-873 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] 加藤勇: "EFFECT OF Ar^+ION BOMBARDMENT DURING HYDROGENATED AMORPHOUS SILICON FILM GROWTH IN PLASMA CHEMICAL VAPOR DEPOSITION SYSTEM"JPN.J.APPL.PHYS. 39. 6404-6409 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] 加藤 勇: "a-Si:H/Si_3N_4 多層膜光導波路の偏光特性"第47回応用物理学会関係連合講演会予稿集. (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] 加藤 勇: "三次元光導波路を用いた半導体極薄膜の光学定数の測定"第47回応用物理学会関係連合講演会予稿集. (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] 加藤 勇: "Polarization Properties of a -Si:H/Si_3N_4 Multilayers Optical Waaveguides"第17回プラズマプロセッシング研究会プロシ-ディングス. A2-6. 243-246 (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] 加藤 勇: "Dependence of PL Characterristics of a-Si:H Nanoball Films Fabricated by Double Tubed Coaxial Line Type MPCVD System on Ion Bombardment Energy"第17回プラズマプロセッシング研究会プロシ-ディングス. B6-7. 641 (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] 加藤 勇: "Photoluminescennce from a-Si:H Nanoball Films Fabricated by Double Tubed Coaxial Line Type Microwave Plasma CVD System"Proceedings of the Tenth International Workshop on the Phisics of Semiconductor Devices. II. 1107 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 加藤 勇: "Influnce of Hydrogenon on Losses in Silicon Oxynitride Planar Optical Waveguides"Proceedings of the Tenth International Workshop on the Phisics of Semiconductor Devices. I. 438 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] Isamu Kato: "Photo Luminescence from Si Films Fabricated by Double Tubed Coaxial Line Type Microwave Plasma Apparatus" International Conference on Reactive Plasmas and Symposium on Plasma Processing. 109-110 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] 加藤 勇: "二重管式同軸線路形MPCVD装置によるa-Si:H/SiN多層膜の作製" 第59回応用物理学会学術講演会予稿集. 2. 829-829 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] 加藤 勇: "二重管式同軸線路形MPCVD装置を用いて作製したSi発光材料の研究(III)" 第59回応用物理学会学術講演会予稿集. 2. 801-801 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] 加藤 勇: "二重管式同軸線路形MPCVD装置によるa-Si:H/SiN多層膜の作製(II)" 第46回応用物理学会関係連合講演会予稿集. (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] 加藤 勇: "二重管式同軸線路形MPCVD装置を用いて作製したSi発光材料の研究(IV)" 第46回応用物理学会関係連合講演会予稿集. (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] 加藤 勇: "二重管式同軸線路形MPCVD装置を用いたカーボン系薄膜の作成" 第46回応用物理学会関係連合講演会予稿集. (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] Isamu Kato: "Silicon Oxynitride Waveguide for Optoelectronic Integrade Circuits" Japanese Journal of Applied Physics.Vol.36. 6711-6713 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] 加藤 勇: "a-Si:H膜成長中のイオン衝撃効果" 第15回「プラズマプロセッシング研究会」プロシ-ディングス 応用物理学会. 15. 84-87 (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] 加藤 勇: "縦磁界印加MPCVDによるH_2/SiH_4プラズマを用いたa-Si:H膜の作製" 第15回「プラズマプロセッシング研究会」プロシ-ディングス 応用物理学会. 15. 406-409 (1998)

    • Related Report
      1997 Annual Research Report

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Published: 1997-04-01   Modified: 2016-04-21  

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