• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to previous page

Development of STM operational in a plasma and its application to a control of plasma materials surface processing on an atomic scale

Research Project

Project/Area Number 09555215
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section展開研究
Research Field Material processing/treatments
Research InstitutionThe University of Tokyo

Principal Investigator

TERASHIMA Kazuo  The University of Tokyo, Faculty of Engineering, Department of Metallurgy and Materials Science, Assoc.Prof., 大学院・工学系研究科, 助教授 (30176911)

Project Period (FY) 1997 – 1998
Project Status Completed (Fiscal Year 1998)
Budget Amount *help
¥9,600,000 (Direct Cost: ¥9,600,000)
Fiscal Year 1998: ¥2,900,000 (Direct Cost: ¥2,900,000)
Fiscal Year 1997: ¥6,700,000 (Direct Cost: ¥6,700,000)
KeywordsPlasma environment / STM (scanning tunneling microscope) / plasma-solid surface interface / etching / atomic image / plasma surface processing / 格子像 / プラズマ-個体界面 / プラズマ材料表面プロセシング
Research Abstract

In this project, we performed the first attempt at the development of a scanning tunneling microscope (STM) for use under a plasma environment. The apparatus consists of an STM system and a radio-frequency (rf) (430MHz) plasma generation system housed in a vacuum chamber with a rotary pump. A special amplifier with a resolution of 10 femtoamp. up to 1kV is employed for tunneling current measurements. To prevent noise current from the plasma, the Pt-Ir probe tip is coated with epoxy grease and insulated glass using the sol-gel method except around its apex of about 3 mum. Under the conventional glow-plasma condition, the noise current from the plasma was deduced to be less than 0.1 nA during plasma exposure for 1800 sec. Using this apparatus, the step structure on a nanometer scale and atomic image of highly oriented pyrolytic graphite (HOPG) were obtained under rf, low-pressure (0.3 Tbrr) air glow plasma. We also discussed the role of the STM tip for successful, realistic "in situ" observation.

Report

(3 results)
  • 1998 Annual Research Report   Final Research Report Summary
  • 1997 Annual Research Report
  • Research Products

    (17 results)

All Other

All Publications (17 results)

  • [Publications] K.Terashima: "Scanning tunneling microscopy operating under a plasma environment" Thin Solid Films. (印刷中). (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] K.Terashima: "High rate deposition of thick epitaxial films by thermal plasma flash deposition" Pure & Appl.Chemistry. 70・6. 1193-1197 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] K. Terashima: "DEVEOPMENT OF A SCANNING MICROSCOPE OPERATIONAL UNDER A PLASMA ENVIRONMENT" Proc.J-C Bilatenl Sympo.on Adva.Materi.Eng.32-38 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Y.Takamura: "High RATE DEPOSITION OF YBCO FILMS BY HOT CLUSTER EPITAXY" J.Appl.Phys.84・9. 5084-5088 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] 服部伴之: "ホットクラスターエピタキシーによる高温超伝導体YBCO厚膜作製" 日本金属学会誌. 63・11. 68-73 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] N.Yamaguchi: "Scanning tanneling microscopy of YB_<a2> Cu_3O_<τ-x> clustor deposited by plasma flash eraporation method" J.Mater.Sci.Lett.17. 2067-2069 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] K.Terashima et al.: "Scanning tunneling microscopy operating Under a plasma environment" Thin Solid Films. (in press). (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] K.Terashima et al.: "DEVELOPMENT OF A SCANNING TUNNELING MICROSCOPE OPERATIONAL UNDER A PLASMAENVIRONMENT" Proc.J-C Bila.Sympo.Adva.Mater.ENG.32-38 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] T.Hattori et al.: "High-Tc YBCO Thick Film prepared by hot cluster Epitaxy" J.Met.Soc.Jpn.63. 68-73 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] K.Terashima et al.: "High rate deposition of thick epitaxial films By plasma flash deposition" Pure & Appl.Chem.70. 1193-1197 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Y.Takamura et al.: "HIGH RATE DEPOSITION OF YBCO FILMSBY HOT CLUSTER DEPOSITION" J.Appl.Phys.84. 5084-5088 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] N.Yamaguchi et al.: "Scanning tunneling microscopy of YBCO cluster Deposited by plasma flash evaporation method" J.Mater.Sci.Lett.17. 2067-2069 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] K.Terashima: "Scanning tunneling microscopy operating under a plasma ehuironmene" Thin Solid Films. (印刷中). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] K.Terashima: "HIGH RATE DEPOSITION OF THICK EPITAXIAL FILMS BY THERMAL PLASMA FLASH DEPOSITION" Pure and Applied Chemistry. 70/6. 1193-1197 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] Y.Takamura: "High RATE DEPOSITION OF YBCO FILMS BY HOT CLUSTER EPITAXY" J.Appl.Phys.84/9. 5084-5088 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] 服部 伴之: "ホットクラスターエピタキシーによる高温超伝導体YBCO厚膜作製" 日本金属学会誌. 63/1. 68-73 (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] Y.Takamura, K.Hayasaki, K.Terashima, T.Yoshida: "Claster size measurement using microtrench method in a thermal plasma flash evaporation process." J.Vac.Sci.Technol.B. Vol15,N3. 558-565 (1997)

    • Related Report
      1997 Annual Research Report

URL: 

Published: 1997-04-01   Modified: 2016-04-21  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi