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Study on new stereo-lithography system with excimer laser

Research Project

Project/Area Number 09555218
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section展開研究
Research Field Material processing/treatments
Research InstitutionSaga University

Principal Investigator

SATOH Saburoh  Saga University, Sci.&Engg/Fac., Associate Professor, 理工学部, 助教授 (80264141)

Co-Investigator(Kenkyū-buntansha) GOTOH Tatsumi  BELTECHNO Co. Ltd., R&D Center, Director, R&Dセンター長
IHARA Satoshi  Saga University, Sci.&Engg/Fac., Research Associate, 理工学部, 助手 (90260728)
YAMABE Chobei  Saga University, Sci.&Engg/Fac., Professor, 理工学部, 教授 (30093082)
Project Period (FY) 1997 – 1999
Project Status Completed (Fiscal Year 1999)
Budget Amount *help
¥11,900,000 (Direct Cost: ¥11,900,000)
Fiscal Year 1999: ¥2,600,000 (Direct Cost: ¥2,600,000)
Fiscal Year 1998: ¥6,000,000 (Direct Cost: ¥6,000,000)
Fiscal Year 1997: ¥3,300,000 (Direct Cost: ¥3,300,000)
Keywordslaser stereo-lithography / excimer laser / reduction of operating time / beam homogenizer / ultraviolet light solidify resin / low cost type stereo-lithography / XeCl excimer lamp / N2 laser / 紫外線ファイバー / エキシマランプ / 硬化歪み / ビーム強度の均一化 / 光硬化 / 樹脂硬化量 / 3次元造形物
Research Abstract

In this study, we investigated a new type of laser stereo-lithography system with XeCl Excimer laser which wavelength was 308nm. In conventional systems, continuous wave Ar ion (351nm/364nm) and He-Cd (325nm) lasers were used as an ultraviolet (UV) light source, which functioned a small point pattern maker of 0.2mm in diameter. On the other hand, a new system proposed us with excimer laser could dramatically reduce the manufacturing time, because laser output power was high enough and beam size was bigger (10mm x 20mm) compare than the conventional ones. Therefore we also investigated a new technique, how to use the big size and high power excimer laser beam efficiently. Moreover we studied an excimer lamp for a low-cost UV light source.
For the laser stereo-lithography, XeCl excimer laser was adapted to improve the utilization efficiency of laser energy. Because of the beam uniformity was made better with a homogenizer, the quantity of hardened resin per laser energy was increased compare than that of without a homogenizer. With this method a simple 3D object was created, and it was proved that XeCl excimer laser was possible to apply for the stereo-lithography.
On the other hand, because of its excellent output efficiency, XeCl excimer lamp and N2 laser were one of a candidate of lower-cost stereo-lithography equipment, which allowed down sizing of the power supply and lamp head, and air-cooling. In view of this, attempts were made to develop special design cylindrical tubes with optical fiber system as the UV light source. Consequently, fiber transmission efficiency of excimer lamp was too low because of its high beam divergence. But the N2 laser was good enough to apply for the lower-cost stereo-lithography system.

Report

(4 results)
  • 1999 Annual Research Report   Final Research Report Summary
  • 1998 Annual Research Report
  • 1997 Annual Research Report
  • Research Products

    (32 results)

All Other

All Publications (32 results)

  • [Publications] 横川、佐藤、山部他: "エキシマレーザを用いた光造形の基礎的研究"佐賀大学理工学部集報. Vol.26. 55-57 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 横川、佐藤、山部他: "エキシマレーザを用いたマスク方式光造形の検討"レーザー学会研究会報告 TM-97-46. 39-43 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 佐藤、猪原、山部他: "XeClエキシマレーザを用いたマスク方式光造形の検討(IV)"平成10年春季第45回応用物理関連連合講演会 講演予稿28a-W-8. No.3. 1041 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 佐藤、猪原、山部他: "XeClエキシマレーザ/ランプを用いた光造形装置の検討"第15回 ラピット・プロトタイピング シンポジウム 予稿集. 68-70 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] S.Satoh, C.Yamabe et al.: "A study on mask type Stereo-Lithography with XeCl Excimer Laser"the Review of Laser Engneering, Special Supplement for APLS '98. Vol. 26. 121-124 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] S.Satoh, C.Yamabe et al.: "Stereo-Lithography with XeCl excimer Laser/lamp"Proceedings of SPIE - High-Power Lasers in Manufacturing. Vol. 3888. 264-271 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] S.Satoh, C.Yamabe et al.: "Excimer Lamp Stereo-Lithpgraphy"Proceedings of SPIE - Laser Applications on Microelectronic and Optoelectronic Manufacturing V. Vol. 3933. 1-8 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] S.Satoh, C.Yamabe et al: "Stereo-Lithpgraphy with XeCl Excimer Lamp"Proceedings of 8th International conference on Rapid Prototyping. (in press). (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] K.Yokagawa, S.Satoh, C.Yamabe et al.: "Fundamental studies on stereo-lithography using excimer laser (in Japanese)"Reports of the Faculty of Science and Engineering Saga Univerisity. 26, No.1. 55-57 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] K.Yokagawa, S.Satoh, C.Yamabe et al.: "A study on mask type stereo-lithography with XeCl excimer laser (in Japanese)"Reports on Topical Meeting of The Laser Society of Japan. No. RTM-97-46. 39-43 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] S.Satoh, S.Ihara, C.Yamabe et al.: "A study on mask type stereo-lithography with XeCl excimer laser (IV) (in Japanese)"Extended Abstracts (The 45th Spring Meeting, 1998) ; The Japan Society of Applied Physics and Related Societies. No. 28a-W-8. 1041 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] S.Satoh, S.Ihara, C.Yamabe et al.: "A study on mask type stereo-lithography with excimer laser and/or lamp (in Japanese)"15th Rapid Prototyping Symposium ; Japan Society of Die and Mold Technology. 68-70 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] S.Satoh, C.Yamabe et al.: "A study on Mask type Stereo-Lithography with XeCl Excimer Laser"The review of Laser Engineering, Special Supplement for APLS'98. 26. 121-124 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] S.Satoh, C.Yamabe et al.: "Stereo-Lithography with XeCl Excimer Laser/lamp"Proceedings of SPIE-High-Power Laser in Manufacturing. 3888. 264-271 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] S.Satoh, C.Yamabe et al.: "Excimer Lamp Stereo-Lithography"Proceedings of SPIE-Laser Applications on Microelectronic and Opto-electronic Manufacturing V. 3933. 1-8 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] S.Satoh, C.Yamabe et al.: "Stereo-Lithography with XeCl Excimer Lamp"Proceedings of the 8th International Conference on Rapid Prototyping. (in press). (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 佐藤三郎,山部長兵衛 他: "XeClエキシマランプを用いた光造形の検討"第46回応用物理関係連合講演会 講演予稿集. 30p-C-21. 1180 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] S.Satoh,C.Yamabe etal: "Stereo-Lithography with XeCl Excimer Laser/lamp"Proceedings of SPIE-High-Power Lasers in Manufacturing. Vol.3888. 264-271 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] S.Satoh,C.Yamabe etal: "Excimer Lamp Stereo-Lithography"Proceeding of SPIE-Laser Applications on Microelectronic and Optoelectronic Manufacturing V. Vol.3933. 1-8 (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] 佐藤三郎,山部長兵衛 他: "XeClエキシマランプを用いた光造形の基礎研究"レーザー学会学術講演会第20回年次大会. 20pIV4. 112 (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] 佐藤三郎,横川一男他: "XeClエキシマレーザを用いたマスク方式光造形の検討(IV)" 第45回応用物理関係連合講演会 講演予稿集. No.3. 1041 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] S.Satoh,K.Yokogawa etal: "A Study on Mask Type Stereo-Lithography with XeCl Exeimer laser" The Review of Laser Engineering Special Supplement for APLA'98. Vol.26. 121-124 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] 佐藤三郎,山部長兵衛他: "XeClエキシマレーザ/ランプを用いた光造形装置の検討" 第15回ラピット・プロトタイピングシンポジウム予稿集. 68-70 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] 佐藤三郎,山部長兵衛他: "XeClエキシマレーザ/ランプを用いた光造形装置の検討" レーザー学会学術講演会第19回年次大会. 29aVI2. 93 (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] 佐藤 三郎 他4名: "エキシマレーザを用いた光造形の基礎的検討(VII)" 平成9年度電気関係学会九州支部連合大会 予稿 No.851. 401 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] 佐藤 三郎: "エキシマレーザを用いた光造形の研究" 産官学技術交流会 in北九州 予稿. 18 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] 横川 一男 他4名: "XeClエキシマレーザを用いたマスク方式光造形の検討" レーザー学会研究会報告 RTN-97-46. 39-43 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] 横川 一男 他4名: "エキシマレーザを用いた光造形の基礎的研究" 佐賀大学理工学部集報. 26(1). 55-57 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] 佐藤 三郎 他4名: "XeClエキシマレーザを用いたマスク方式光造形の検討" 第13回ラピット・プロトタイピングシンポジウム 予稿. 52-54 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] 横川 一男 他4名: "XeClエキシマレーザを用いたマスク方式光造形の検討" 応用物理学会九州支部大会 予稿 2Da-6. 178 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] 佐藤 三郎 他4名: "XeClエキシマレーザを用いたマスク方式光造形の検討" レーザー学会学術講演会第18回年次大会 予稿 23pIV10. 180 (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] 佐藤 三郎 他4名: "XeClエキシマレーザを用いたマスク方式光造形の検討(IV)" 平成10年春季応用物理学関係連合講演会 予稿 28a-W8. (1998)

    • Related Report
      1997 Annual Research Report

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Published: 1997-04-01   Modified: 2016-04-21  

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